DE3579235D1 - Halbleiteranordnung und einrichtung. - Google Patents

Halbleiteranordnung und einrichtung.

Info

Publication number
DE3579235D1
DE3579235D1 DE8585902502T DE3579235T DE3579235D1 DE 3579235 D1 DE3579235 D1 DE 3579235D1 DE 8585902502 T DE8585902502 T DE 8585902502T DE 3579235 T DE3579235 T DE 3579235T DE 3579235 D1 DE3579235 D1 DE 3579235D1
Authority
DE
Germany
Prior art keywords
semiconductor arrangement
semiconductor
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585902502T
Other languages
English (en)
Inventor
Petrus Remmerie
Den Bossche Jozef Van
De Pol Frans Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent NV
Original Assignee
Alcatel NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel NV filed Critical Alcatel NV
Application granted granted Critical
Publication of DE3579235D1 publication Critical patent/DE3579235D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/744Gate-turn-off devices
    • H01L29/745Gate-turn-off devices with turn-off by field effect
    • H01L29/7455Gate-turn-off devices with turn-off by field effect produced by an insulated gate structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/747Bidirectional devices, e.g. triacs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/74Thyristor-type devices, e.g. having four-zone regenerative action
    • H01L29/749Thyristor-type devices, e.g. having four-zone regenerative action with turn-on by field effect

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Thyristors (AREA)
  • Bipolar Transistors (AREA)
  • Electronic Switches (AREA)
DE8585902502T 1984-05-02 1985-05-01 Halbleiteranordnung und einrichtung. Expired - Lifetime DE3579235D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP84200608 1984-05-02
PCT/EP1985/000193 WO1985005224A1 (en) 1984-05-02 1985-05-01 Semiconductor device and arrangement

Publications (1)

Publication Number Publication Date
DE3579235D1 true DE3579235D1 (de) 1990-09-20

Family

ID=8192437

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585902502T Expired - Lifetime DE3579235D1 (de) 1984-05-02 1985-05-01 Halbleiteranordnung und einrichtung.

Country Status (11)

Country Link
US (1) US4779125A (de)
EP (1) EP0210173B1 (de)
JP (1) JPS62501111A (de)
BE (1) BE903709A (de)
BR (1) BR8507182A (de)
DE (1) DE3579235D1 (de)
HU (1) HUT42204A (de)
MA (1) MA20423A1 (de)
PT (1) PT80385A (de)
WO (1) WO1985005224A1 (de)
ZA (1) ZA853266B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5241210A (en) * 1987-02-26 1993-08-31 Kabushiki Kaisha Toshiba High breakdown voltage semiconductor device
US5438220A (en) * 1987-02-26 1995-08-01 Kabushiki Kaisha Toshiba High breakdown voltage semiconductor device
SE468731B (sv) * 1991-07-17 1993-03-08 Asea Brown Boveri Slaeckbart tyristorsystem
GB2267996B (en) * 1992-06-01 1996-04-17 Fuji Electric Co Ltd Semiconductor device
JPH07297409A (ja) * 1994-03-02 1995-11-10 Toyota Motor Corp 電界効果型半導体装置
CN104969355B (zh) * 2013-01-30 2018-02-13 密克罗奇普技术公司 Esd自我保护及含该保护的lin总线驱动器的dmos半导体装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR897772A (fr) * 1938-12-01 1945-03-30 Ig Farbenindustrie Ag Procédé pour dédoubler des hydrocarbures huileux ou pour hydrogéner sous pression des charbons, goudrons ou huiles minérales
US3394037A (en) * 1965-05-28 1968-07-23 Motorola Inc Method of making a semiconductor device by masking and diffusion
SE392783B (sv) * 1975-06-19 1977-04-18 Asea Ab Halvledaranordning innefattande en tyristor och en felteffekttransistordel
US4115797A (en) * 1976-10-04 1978-09-19 Fairchild Camera And Instrument Corporation Integrated injection logic with heavily doped injector base self-aligned with injector emitter and collector
JPS5478092A (en) * 1977-12-05 1979-06-21 Hitachi Ltd Lateral semiconductor device
US4199774A (en) * 1978-09-18 1980-04-22 The Board Of Trustees Of The Leland Stanford Junior University Monolithic semiconductor switching device
US4586073A (en) * 1978-12-20 1986-04-29 At&T Bell Laboratories High voltage junction solid-state switch
US4213067A (en) * 1978-12-22 1980-07-15 Eaton Corporation Integrated gate turn-off device with non-regenerative power portion and lateral regenerative portion having split emission path
IE55992B1 (en) * 1982-04-05 1991-03-13 Gen Electric Insulated gate rectifier with improved current-carrying capability
EP0091686B1 (de) * 1982-04-12 1989-06-28 General Electric Company Halbleiteranordnung mit diffundierter Zone mit reduzierter Länge und Verfahren zur Herstellung dieser Zone
US4574209A (en) * 1982-06-21 1986-03-04 Eaton Corporation Split gate EFET and circuitry
US4443931A (en) * 1982-06-28 1984-04-24 General Electric Company Method of fabricating a semiconductor device with a base region having a deep portion
JPS59105354A (ja) * 1982-12-09 1984-06-18 Toshiba Corp 半導体装置
EP0111803B1 (de) * 1982-12-13 1989-03-01 General Electric Company Laterale Gleichrichter mit isoliertem Gate
SE435436B (sv) * 1983-02-16 1984-09-24 Asea Ab Tvapoligt overstromsskydd
JPS59184560A (ja) * 1983-03-31 1984-10-19 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 半導体接点構造体
BE897772A (fr) * 1983-09-19 1984-03-19 Itt Ind Belgium Contacts electroniques et dispositifs associes

Also Published As

Publication number Publication date
HUT42204A (en) 1987-06-29
EP0210173B1 (de) 1990-08-16
JPS62501111A (ja) 1987-04-30
BE903709A (nl) 1986-05-26
ZA853266B (en) 1985-12-24
PT80385A (en) 1985-06-01
US4779125A (en) 1988-10-18
BR8507182A (pt) 1987-04-22
EP0210173A1 (de) 1987-02-04
MA20423A1 (fr) 1985-12-31
WO1985005224A1 (en) 1985-11-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee