DE3541559A1 - Hartmaske fuer photolithographische prozesse - Google Patents
Hartmaske fuer photolithographische prozesseInfo
- Publication number
- DE3541559A1 DE3541559A1 DE19853541559 DE3541559A DE3541559A1 DE 3541559 A1 DE3541559 A1 DE 3541559A1 DE 19853541559 DE19853541559 DE 19853541559 DE 3541559 A DE3541559 A DE 3541559A DE 3541559 A1 DE3541559 A1 DE 3541559A1
- Authority
- DE
- Germany
- Prior art keywords
- glass
- production
- mask
- hard mask
- photolithographic processes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000006089 photosensitive glass Substances 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 239000011521 glass Substances 0.000 claims description 13
- 238000000137 annealing Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 14
- 238000005530 etching Methods 0.000 abstract description 4
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003678 scratch resistant effect Effects 0.000 description 2
- 239000006090 Foturan Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19853541559 DE3541559A1 (de) | 1985-11-25 | 1985-11-25 | Hartmaske fuer photolithographische prozesse |
| CH432086A CH670007A5 (enrdf_load_stackoverflow) | 1985-11-25 | 1986-10-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19853541559 DE3541559A1 (de) | 1985-11-25 | 1985-11-25 | Hartmaske fuer photolithographische prozesse |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3541559A1 true DE3541559A1 (de) | 1987-05-27 |
Family
ID=6286725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19853541559 Withdrawn DE3541559A1 (de) | 1985-11-25 | 1985-11-25 | Hartmaske fuer photolithographische prozesse |
Country Status (2)
| Country | Link |
|---|---|
| CH (1) | CH670007A5 (enrdf_load_stackoverflow) |
| DE (1) | DE3541559A1 (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008021952A3 (en) * | 2006-08-11 | 2008-08-21 | Battelle Memorial Institute | Patterning compositions, masks, and methods |
| US7626185B2 (en) | 2006-08-11 | 2009-12-01 | Battelle Memorial Institute | Patterning compositions, masks, and methods |
-
1985
- 1985-11-25 DE DE19853541559 patent/DE3541559A1/de not_active Withdrawn
-
1986
- 1986-10-31 CH CH432086A patent/CH670007A5/de not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008021952A3 (en) * | 2006-08-11 | 2008-08-21 | Battelle Memorial Institute | Patterning compositions, masks, and methods |
| US7626185B2 (en) | 2006-08-11 | 2009-12-01 | Battelle Memorial Institute | Patterning compositions, masks, and methods |
Also Published As
| Publication number | Publication date |
|---|---|
| CH670007A5 (enrdf_load_stackoverflow) | 1989-04-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |