DE3485863D1 - Halbleitervorrichtung mit einem lichtwellenleiter und verfahren zur herstellung einer solchen vorrichtung. - Google Patents

Halbleitervorrichtung mit einem lichtwellenleiter und verfahren zur herstellung einer solchen vorrichtung.

Info

Publication number
DE3485863D1
DE3485863D1 DE8484200940T DE3485863T DE3485863D1 DE 3485863 D1 DE3485863 D1 DE 3485863D1 DE 8484200940 T DE8484200940 T DE 8484200940T DE 3485863 T DE3485863 T DE 3485863T DE 3485863 D1 DE3485863 D1 DE 3485863D1
Authority
DE
Germany
Prior art keywords
producing
semiconductor device
lightwave guide
lightwave
guide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8484200940T
Other languages
English (en)
Other versions
DE3485863T2 (de
Inventor
Marco Erman
Nakita Vodjdani
Jean-Bernard Theeten
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Alsthom Recherche SA
Original Assignee
Alcatel Alsthom Recherche SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel Alsthom Recherche SA filed Critical Alcatel Alsthom Recherche SA
Application granted granted Critical
Publication of DE3485863D1 publication Critical patent/DE3485863D1/de
Publication of DE3485863T2 publication Critical patent/DE3485863T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/125—Bends, branchings or intersections
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/131—Integrated optical circuits characterised by the manufacturing method by using epitaxial growth
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/30—Optical coupling means for use between fibre and thin-film device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02387—Group 13/15 materials
    • H01L21/02395—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02455—Group 13/15 materials
    • H01L21/02463—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02494—Structure
    • H01L21/02496—Layer structure
    • H01L21/02505—Layer structure consisting of more than two layers
    • H01L21/02507—Alternating layers, e.g. superlattice
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/02546—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02639—Preparation of substrate for selective deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02647—Lateral overgrowth
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/544—Solar cells from Group III-V materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Semiconductor Lasers (AREA)
DE8484200940T 1983-07-01 1984-06-29 Halbleitervorrichtung mit einem lichtwellenleiter und verfahren zur herstellung einer solchen vorrichtung. Expired - Fee Related DE3485863T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8311007A FR2548220B1 (fr) 1983-07-01 1983-07-01 Guide d'onde lumineuse sur materiau semi-conducteur

Publications (2)

Publication Number Publication Date
DE3485863D1 true DE3485863D1 (de) 1992-09-17
DE3485863T2 DE3485863T2 (de) 1993-03-04

Family

ID=9290423

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484200940T Expired - Fee Related DE3485863T2 (de) 1983-07-01 1984-06-29 Halbleitervorrichtung mit einem lichtwellenleiter und verfahren zur herstellung einer solchen vorrichtung.

Country Status (5)

Country Link
US (1) US4652077A (de)
EP (1) EP0130650B1 (de)
JP (1) JPS6022105A (de)
DE (1) DE3485863T2 (de)
FR (1) FR2548220B1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5159700A (en) * 1984-01-16 1992-10-27 Texas Instruments Incorporated Substrate with optical communication systems between chips mounted thereon and monolithic integration of optical I/O on silicon substrates
JPS61198212A (ja) * 1985-02-28 1986-09-02 Tokyo Inst Of Technol 光回路機能素子
FR2584825B1 (fr) * 1985-07-11 1987-10-09 Labo Electronique Physique Structure separatrice, element de commutation optique incluant de telles structures et matrice de commutation optique formee de ces elements de commutation
JPS6330209A (ja) * 1986-07-25 1988-02-08 Marubeni Kk アラミツド繊維補強複合材及びその製造法
JPS63119218A (ja) * 1986-11-07 1988-05-23 Canon Inc 半導体基材とその製造方法
CA1331950C (en) * 1987-03-26 1994-09-13 Hiroyuki Tokunaga Iii - v group compound crystal article and process for producing the same
US5281283A (en) * 1987-03-26 1994-01-25 Canon Kabushiki Kaisha Group III-V compound crystal article using selective epitaxial growth
US4762382A (en) * 1987-06-29 1988-08-09 Honeywell Inc. Optical interconnect circuit for GaAs optoelectronics and Si VLSI/VHSIC
US4866291A (en) * 1987-06-30 1989-09-12 Canon Kabushiki Kaisha Photosensor with charge storage unit and switch unit formed on a single-crystal semiconductor film
JPH01220492A (ja) * 1988-02-26 1989-09-04 Mitsubishi Electric Corp 半導体レーザ装置及びその製造方法
DE68913419T2 (de) * 1988-03-25 1994-06-01 Thomson Csf Herstellungsverfahren von feldemissions-elektronenquellen und anwendung zur herstellung von emitter-matrizen.
FR2644287B1 (fr) * 1989-03-10 1996-01-26 Thomson Csf Procede de realisation de sources d'electrons du type a emission de champ et dispositifs realises a partir desdites sources
US5253319A (en) * 1992-02-24 1993-10-12 Corning Incorporated Planar optical waveguides with planar optical elements
US5987196A (en) * 1997-11-06 1999-11-16 Micron Technology, Inc. Semiconductor structure having an optical signal path in a substrate and method for forming the same

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3425879A (en) * 1965-10-24 1969-02-04 Texas Instruments Inc Method of making shaped epitaxial deposits
US3746908A (en) * 1970-08-03 1973-07-17 Gen Electric Solid state light sensitive storage array
FR2168936B1 (de) * 1972-01-27 1977-04-01 Labo Electronique Physique
US3986200A (en) * 1974-01-02 1976-10-12 Signetics Corporation Semiconductor structure and method
US3984173A (en) * 1974-04-08 1976-10-05 Texas Instruments Incorporated Waveguides for integrated optics
US3900863A (en) * 1974-05-13 1975-08-19 Westinghouse Electric Corp Light-emitting diode which generates light in three dimensions
GB1530323A (en) * 1975-12-22 1978-10-25 Standard Telephones Cables Ltd Semiconductor waveguide structures
US4116530A (en) * 1976-07-29 1978-09-26 Texas Instruments Incorporated Optical waveguides grown by selective liquid phase epitaxy
US4099305A (en) * 1977-03-14 1978-07-11 Bell Telephone Laboratories, Incorporated Fabrication of mesa devices by MBE growth over channeled substrates
JPS54107354A (en) * 1978-02-10 1979-08-23 Nec Corp Semiconductor multilayer thin film optical guide and production of the same
JPS5512907A (en) * 1978-07-13 1980-01-29 Nec Corp Light waveguide
DE2928479A1 (de) * 1979-07-14 1981-01-15 Wickmann Werke Ag Gehaeuse fuer elektrische bauelemente
US4518219A (en) * 1980-01-25 1985-05-21 Massachusetts Institute Of Technology Optical guided wave devices employing semiconductor-insulator structures
US4420873A (en) * 1980-01-25 1983-12-20 Massachusetts Institute Of Technology Optical guided wave devices employing semiconductor-insulator structures
US4359260A (en) * 1980-06-25 1982-11-16 Bell Telephone Laboratories, Incorporated Optical polarizer
US4585299A (en) * 1983-07-19 1986-04-29 Fairchild Semiconductor Corporation Process for fabricating optical wave-guiding components and components made by the process
US4581742A (en) * 1984-04-10 1986-04-08 Rca Corporation Semiconductor laser having a non-absorbing passive region with beam guiding

Also Published As

Publication number Publication date
EP0130650B1 (de) 1992-08-12
US4652077A (en) 1987-03-24
EP0130650A1 (de) 1985-01-09
DE3485863T2 (de) 1993-03-04
FR2548220B1 (fr) 1987-07-31
FR2548220A1 (fr) 1985-01-04
JPS6022105A (ja) 1985-02-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee