DE3306999C2 - - Google Patents

Info

Publication number
DE3306999C2
DE3306999C2 DE3306999A DE3306999A DE3306999C2 DE 3306999 C2 DE3306999 C2 DE 3306999C2 DE 3306999 A DE3306999 A DE 3306999A DE 3306999 A DE3306999 A DE 3306999A DE 3306999 C2 DE3306999 C2 DE 3306999C2
Authority
DE
Germany
Prior art keywords
temperature
wafer
holding plate
frame
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3306999A
Other languages
German (de)
English (en)
Other versions
DE3306999A1 (de
Inventor
Herbert E. Eschen Li Mayer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Perkin Elmer Censor Anstalt
Original Assignee
Perkin Elmer Censor Anstalt
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/363,860 external-priority patent/US4432635A/en
Application filed by Perkin Elmer Censor Anstalt filed Critical Perkin Elmer Censor Anstalt
Publication of DE3306999A1 publication Critical patent/DE3306999A1/de
Application granted granted Critical
Publication of DE3306999C2 publication Critical patent/DE3306999C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0432—Apparatus for thermal treatment mainly by conduction
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00—Machines, plants or systems, using electric or magnetic effects
    • F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE19833306999 1982-03-31 1983-02-28 Einrichtung zum festhalten eines werkstueckes Granted DE3306999A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/363,860 US4432635A (en) 1979-12-20 1982-03-31 Temperature-controlled support for semiconductor wafer

Publications (2)

Publication Number Publication Date
DE3306999A1 DE3306999A1 (de) 1983-10-06
DE3306999C2 true DE3306999C2 (https=) 1988-11-17

Family

ID=23432040

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19833306999 Granted DE3306999A1 (de) 1982-03-31 1983-02-28 Einrichtung zum festhalten eines werkstueckes

Country Status (2)

Country Link
JP (1) JPS58178536A (https=)
DE (1) DE3306999A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4127133A1 (de) * 1991-08-02 1993-02-18 Smc Kk Ansaugstutzen fuer werkstuecke
US6005226A (en) * 1997-11-24 1999-12-21 Steag-Rtp Systems Rapid thermal processing (RTP) system with gas driven rotating substrate

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3608783A1 (de) * 1986-03-15 1987-09-17 Telefunken Electronic Gmbh Gasphasen-epitaxieverfahren und vorrichtung zu seiner durchfuehrung
US5231291A (en) * 1989-08-01 1993-07-27 Canon Kabushiki Kaisha Wafer table and exposure apparatus with the same
JP2737010B2 (ja) * 1989-08-01 1998-04-08 キヤノン株式会社 露光装置
JP2625310B2 (ja) * 1991-01-08 1997-07-02 シマテク，インコーポレイテッド シリコンウェハーの製造方法および装置
JP2507478Y2 (ja) * 1991-06-26 1996-08-14 株式会社エンヤシステム ウエ―ハ反転貼付装置
DE19700839C2 (de) * 1997-01-13 2000-06-08 Siemens Ag Chuckanordnung
JP2004505443A (ja) 2000-07-10 2004-02-19 テンプトロニック　コーポレイション 交互配置された加熱および冷却要素と交換可能な上面アセンブリと硬膜層表面とをもつ熱プレートを有するウェーハチャック
KR101866719B1 (ko) 2010-12-20 2018-06-11 에베 그룹 에. 탈너 게엠베하 웨이퍼의 장착을 위한 수용 수단

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD127137B1 (de) * 1976-08-17 1979-11-28 Elektromat Veb Vorrichtung zum kompensieren der waermeeinwirkung an justier- und belichtungseinrichtungen
US4139051A (en) * 1976-09-07 1979-02-13 Rockwell International Corporation Method and apparatus for thermally stabilizing workpieces
JPS5473578A (en) * 1977-11-24 1979-06-12 Toshiba Corp Pattern exposure method of semiconductor substrate and pattern exposure apparatus
US4202623A (en) * 1979-01-08 1980-05-13 The Perkin-Elmer Corporation Temperature compensated alignment system
JPS5626437A (en) * 1979-08-13 1981-03-14 Chiyou Lsi Gijutsu Kenkyu Kumiai Wafer supporting base

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4127133A1 (de) * 1991-08-02 1993-02-18 Smc Kk Ansaugstutzen fuer werkstuecke
US6005226A (en) * 1997-11-24 1999-12-21 Steag-Rtp Systems Rapid thermal processing (RTP) system with gas driven rotating substrate

Also Published As

Publication number Publication date
JPS58178536A (ja) 1983-10-19
DE3306999A1 (de) 1983-10-06
JPH0363218B2 (https=) 1991-09-30

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8128 New person/name/address of the agent

Representative=s name: HENKEL, G., DR.PHIL. FEILER, L., DR.RER.NAT. HAENZ

8127 New person/name/address of the applicant

Owner name: PERKIN-ELMER CENSOR ANSTALT, VADUZ, LI

D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: DERZEIT KEIN VERTRETER BESTELLT

8339 Ceased/non-payment of the annual fee