DE3136465A1 - Vorrichtung und verfahren zum bedampfen von substraten - Google Patents
Vorrichtung und verfahren zum bedampfen von substratenInfo
- Publication number
- DE3136465A1 DE3136465A1 DE19813136465 DE3136465A DE3136465A1 DE 3136465 A1 DE3136465 A1 DE 3136465A1 DE 19813136465 DE19813136465 DE 19813136465 DE 3136465 A DE3136465 A DE 3136465A DE 3136465 A1 DE3136465 A1 DE 3136465A1
- Authority
- DE
- Germany
- Prior art keywords
- metal
- crucible
- electron beam
- zro2
- appliance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 9
- 238000000034 method Methods 0.000 title claims description 4
- 239000011248 coating agent Substances 0.000 title abstract description 3
- 238000000576 coating method Methods 0.000 title abstract description 3
- 230000008021 deposition Effects 0.000 title abstract 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 25
- 238000010894 electron beam technology Methods 0.000 claims abstract description 18
- 239000000919 ceramic Substances 0.000 claims abstract description 9
- 238000007740 vapor deposition Methods 0.000 claims description 9
- 239000000155 melt Substances 0.000 claims description 5
- 239000011888 foil Substances 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 230000008020 evaporation Effects 0.000 abstract description 8
- 238000001704 evaporation Methods 0.000 abstract description 8
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 4
- -1 by vapour deposition Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19813136465 DE3136465A1 (de) | 1981-09-15 | 1981-09-15 | Vorrichtung und verfahren zum bedampfen von substraten |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19813136465 DE3136465A1 (de) | 1981-09-15 | 1981-09-15 | Vorrichtung und verfahren zum bedampfen von substraten |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3136465A1 true DE3136465A1 (de) | 1983-03-31 |
DE3136465C2 DE3136465C2 (enrdf_load_stackoverflow) | 1989-12-28 |
Family
ID=6141644
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19813136465 Granted DE3136465A1 (de) | 1981-09-15 | 1981-09-15 | Vorrichtung und verfahren zum bedampfen von substraten |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE3136465A1 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3420246A1 (de) * | 1984-05-30 | 1985-12-05 | Leybold-Heraeus GmbH, 5000 Köln | Verdampfertiegel fuer vakuum-aufdampfanlagen |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB995609A (en) * | 1960-09-12 | 1965-06-23 | Edwards High Vacuum Int Ltd | Improvements in or relating to the vaporization of metals |
GB1003845A (en) * | 1962-05-03 | 1965-09-08 | G V Planer Ltd | Improvements in or relating to heating by means of electron beams |
GB1094562A (en) * | 1964-03-24 | 1967-12-13 | Mullard Ltd | Improvements in and relating to evaporation apparatus |
GB1273336A (en) * | 1969-03-13 | 1972-05-10 | United Aircraft Corp | Apparatus for applying a uniform coating of a metallic alloy to a substrate |
-
1981
- 1981-09-15 DE DE19813136465 patent/DE3136465A1/de active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB995609A (en) * | 1960-09-12 | 1965-06-23 | Edwards High Vacuum Int Ltd | Improvements in or relating to the vaporization of metals |
GB1003845A (en) * | 1962-05-03 | 1965-09-08 | G V Planer Ltd | Improvements in or relating to heating by means of electron beams |
GB1094562A (en) * | 1964-03-24 | 1967-12-13 | Mullard Ltd | Improvements in and relating to evaporation apparatus |
GB1273336A (en) * | 1969-03-13 | 1972-05-10 | United Aircraft Corp | Apparatus for applying a uniform coating of a metallic alloy to a substrate |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3420246A1 (de) * | 1984-05-30 | 1985-12-05 | Leybold-Heraeus GmbH, 5000 Köln | Verdampfertiegel fuer vakuum-aufdampfanlagen |
Also Published As
Publication number | Publication date |
---|---|
DE3136465C2 (enrdf_load_stackoverflow) | 1989-12-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8363 | Opposition against the patent | ||
8339 | Ceased/non-payment of the annual fee |