DE2919841A1 - Verfahren zur phototechnischen herstellung von reliefstrukturen - Google Patents
Verfahren zur phototechnischen herstellung von reliefstrukturenInfo
- Publication number
- DE2919841A1 DE2919841A1 DE19792919841 DE2919841A DE2919841A1 DE 2919841 A1 DE2919841 A1 DE 2919841A1 DE 19792919841 DE19792919841 DE 19792919841 DE 2919841 A DE2919841 A DE 2919841A DE 2919841 A1 DE2919841 A1 DE 2919841A1
- Authority
- DE
- Germany
- Prior art keywords
- relief structures
- weight
- parts
- phototechnical
- photoinitiators
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- -1 aromatic azidomaleinimides Chemical class 0.000 claims abstract description 12
- 229920000642 polymer Polymers 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 150000001540 azides Chemical class 0.000 claims abstract description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 claims description 22
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 2
- LAWLRVWBGMRMDD-UHFFFAOYSA-N n-diazo-2,5-dioxopyrrole-3-sulfonamide Chemical class [N-]=[N+]=NS(=O)(=O)C1=CC(=O)NC1=O LAWLRVWBGMRMDD-UHFFFAOYSA-N 0.000 claims 1
- 239000003999 initiator Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 239000004020 conductor Substances 0.000 abstract description 2
- 239000011810 insulating material Substances 0.000 abstract description 2
- 238000002360 preparation method Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 238000011161 development Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000004641 Diallyl-phthalate Substances 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 239000012704 polymeric precursor Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- VYARIHBGJYPRFF-UHFFFAOYSA-N n-diazo-2,5-dioxo-4-phenylpyrrole-3-sulfonamide Chemical compound O=C1NC(=O)C(S(=O)(=O)N=[N+]=[N-])=C1C1=CC=CC=C1 VYARIHBGJYPRFF-UHFFFAOYSA-N 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000013034 phenoxy resin Substances 0.000 description 2
- 229920006287 phenoxy resin Polymers 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 229920001195 polyisoprene Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- WOGITNXCNOTRLK-VOTSOKGWSA-N (e)-3-phenylprop-2-enoyl chloride Chemical compound ClC(=O)\C=C\C1=CC=CC=C1 WOGITNXCNOTRLK-VOTSOKGWSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- YTPSFXZMJKMUJE-UHFFFAOYSA-N 2-tert-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(C(C)(C)C)=CC=C3C(=O)C2=C1 YTPSFXZMJKMUJE-UHFFFAOYSA-N 0.000 description 1
- OAEDCMRTYKUJHI-UHFFFAOYSA-N 3-(4-azidophenyl)pyrrole-2,5-dione Chemical compound N(=[N+]=[N-])C1=CC=C(C=C1)C=1C(=O)NC(C=1)=O OAEDCMRTYKUJHI-UHFFFAOYSA-N 0.000 description 1
- YTGSFYXKUIXCIY-UHFFFAOYSA-N 3-azidopyrrole-2,5-dione Chemical class N(=[N+]=[N-])C=1C(=O)NC(C1)=O YTGSFYXKUIXCIY-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- GAZZTULIUXRAAI-UHFFFAOYSA-N [2,3-bis(diethylamino)phenyl]-phenylmethanone Chemical compound CCN(CC)C1=CC=CC(C(=O)C=2C=CC=CC=2)=C1N(CC)CC GAZZTULIUXRAAI-UHFFFAOYSA-N 0.000 description 1
- RVWADWOERKNWRY-UHFFFAOYSA-N [2-(dimethylamino)phenyl]-phenylmethanone Chemical compound CN(C)C1=CC=CC=C1C(=O)C1=CC=CC=C1 RVWADWOERKNWRY-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 229930188620 butyrolactone Natural products 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004870 electrical engineering Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- YEJRWHAVMIAJKC-UHFFFAOYSA-N gamma-butyrolactone Natural products O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- RPDJEKMSFIRVII-UHFFFAOYSA-N oxomethylidenehydrazine Chemical compound NN=C=O RPDJEKMSFIRVII-UHFFFAOYSA-N 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Steroid Compounds (AREA)
- Formation Of Insulating Films (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792919841 DE2919841A1 (de) | 1979-05-16 | 1979-05-16 | Verfahren zur phototechnischen herstellung von reliefstrukturen |
| AT80102259T ATE14634T1 (de) | 1979-05-16 | 1980-04-25 | Verfahren zur phototechnischen herstellung von reliefstrukturen. |
| DE8080102259T DE3070917D1 (en) | 1979-05-16 | 1980-04-25 | Process for the phototechnical production of relief structures |
| EP80102259A EP0019122B1 (de) | 1979-05-16 | 1980-04-25 | Verfahren zur phototechnischen Herstellung von Reliefstrukturen |
| US06/148,129 US4287294A (en) | 1979-05-16 | 1980-05-09 | Method for the preparation of relief structures by phototechniques |
| JP6517580A JPS55159435A (en) | 1979-05-16 | 1980-05-16 | Method of optically producing relief structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792919841 DE2919841A1 (de) | 1979-05-16 | 1979-05-16 | Verfahren zur phototechnischen herstellung von reliefstrukturen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2919841A1 true DE2919841A1 (de) | 1980-11-20 |
Family
ID=6070909
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19792919841 Withdrawn DE2919841A1 (de) | 1979-05-16 | 1979-05-16 | Verfahren zur phototechnischen herstellung von reliefstrukturen |
| DE8080102259T Expired DE3070917D1 (en) | 1979-05-16 | 1980-04-25 | Process for the phototechnical production of relief structures |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8080102259T Expired DE3070917D1 (en) | 1979-05-16 | 1980-04-25 | Process for the phototechnical production of relief structures |
Country Status (5)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3342851A1 (de) * | 1983-11-26 | 1985-06-05 | Merck Patent Gmbh, 6100 Darmstadt | Fotolacke |
| DE4328839A1 (de) * | 1993-08-27 | 1995-07-27 | Basf Lacke & Farben | Durch Einwirkung von Strahlung vernetzende Gemische sowie Verfahren zur phototechnischen Herstellung von Reliefstrukturen |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5744143A (en) * | 1980-08-29 | 1982-03-12 | Tokyo Ohka Kogyo Co Ltd | Composition and method for forming micropattern |
| US4556625A (en) * | 1982-07-09 | 1985-12-03 | Armstrong World Industries, Inc. | Development of a colored image on a cellulosic material with monosulfonyl azides |
| US4548891A (en) * | 1983-02-11 | 1985-10-22 | Ciba Geigy Corporation | Photopolymerizable compositions containing prepolymers with olefin double bonds and titanium metallocene photoinitiators |
| US4656116A (en) * | 1983-10-12 | 1987-04-07 | Ciba-Geigy Corporation | Radiation-sensitive coating composition |
| US4571375A (en) * | 1983-10-24 | 1986-02-18 | Benedikt George M | Ring-opened polynorbornene negative photoresist with bisazide |
| US4622284A (en) * | 1984-03-01 | 1986-11-11 | Digital Recording Corporation | Process of using metal azide recording media with laser |
| DE3660339D1 (en) * | 1985-01-15 | 1988-07-28 | Merck Patent Gmbh | Photoresist compositions with enhanced sensitivity using polyamide esters |
| US4830953A (en) * | 1986-08-18 | 1989-05-16 | Ciba-Geigy Corporation | Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating |
| US5270431A (en) * | 1987-07-23 | 1993-12-14 | Basf Aktiengesellschaft | Preparation of oligomeric or polymeric radiation-reactive intermediates for solvent-structured layers |
| DE3833438A1 (de) * | 1988-10-01 | 1990-04-05 | Basf Ag | Strahlungsempfindliche gemische und deren verwendung |
| DE3833437A1 (de) * | 1988-10-01 | 1990-04-05 | Basf Ag | Strahlungsempfindliche gemische und deren verwendung |
| DE4217688A1 (de) * | 1992-05-29 | 1993-12-02 | Basf Lacke & Farben | Durch Einwirkung von Strahlung vernetzendes Gemisch und dessen Verwendung zur Herstellung hochtemperaturbeständiger Reliefstrukturen |
| US6034150A (en) | 1996-08-23 | 2000-03-07 | University Of Southern Mississippi | Polymerization processes using aliphatic maleimides |
| US20040235976A1 (en) * | 1996-08-23 | 2004-11-25 | Hoyle Charles E. | Polymerization processes using alphatic maleimides |
| AU7597598A (en) * | 1997-05-27 | 1998-12-30 | First Chemical Corporation | Aromatic maleimides and their use as photoinitiators |
| ATE333114T1 (de) | 1998-01-30 | 2006-08-15 | Albemarle Corp | Maleimide enthaltende fotopolymerisierbare zusammensetzungen und verfahren zu deren verwendung |
| EP3066151A1 (en) | 2013-11-07 | 2016-09-14 | Akzo Nobel Chemicals International B.V. | Process for modifying ethylene-based polymers and copolymers |
| TR201802165T4 (tr) | 2013-11-07 | 2018-03-21 | Akzo Nobel Chemicals Int Bv | Polimerleri modifiye etmek için proses. |
| JP6208867B2 (ja) | 2013-11-07 | 2017-10-04 | アクゾ ノーベル ケミカルズ インターナショナル ベスローテン フエンノートシャップＡｋｚｏ Ｎｏｂｅｌ Ｃｈｅｍｉｃａｌｓ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｂ．Ｖ． | 環状カルボナートアジド |
| WO2016170018A1 (en) | 2015-04-24 | 2016-10-27 | Akzo Nobel Chemicals International B.V. | Process for modifying polymers |
| JP2018513257A (ja) | 2015-04-24 | 2018-05-24 | アクゾ ノーベル ケミカルズ インターナショナル ベスローテン フエンノートシャップＡｋｚｏ Ｎｏｂｅｌ Ｃｈｅｍｉｃａｌｓ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｂ．Ｖ． | ポリマーを官能化する方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3485732A (en) * | 1966-03-02 | 1969-12-23 | Ppg Industries Inc | Highly radiation-sensitive telomerized polyesters |
| US3475176A (en) * | 1966-09-06 | 1969-10-28 | Eastman Kodak Co | Azide sensitized photosensitive prepolymer compositions |
| US3979426A (en) * | 1971-08-12 | 1976-09-07 | Ppg Industries, Inc. | Radiation-sensitive diacrylates |
| NL177718C (nl) * | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
| US3871930A (en) * | 1973-12-19 | 1975-03-18 | Texas Instruments Inc | Method of etching films made of polyimide based polymers |
| USRE30186E (en) | 1974-08-02 | 1980-01-08 | Siemens Aktiengesellschaft | Method for the preparation of relief structures |
| DE2437348B2 (de) * | 1974-08-02 | 1976-10-07 | Ausscheidung in: 24 62 105 | Verfahren zur herstellung von reliefstrukturen |
-
1979
- 1979-05-16 DE DE19792919841 patent/DE2919841A1/de not_active Withdrawn
-
1980
- 1980-04-25 AT AT80102259T patent/ATE14634T1/de not_active IP Right Cessation
- 1980-04-25 EP EP80102259A patent/EP0019122B1/de not_active Expired
- 1980-04-25 DE DE8080102259T patent/DE3070917D1/de not_active Expired
- 1980-05-09 US US06/148,129 patent/US4287294A/en not_active Expired - Lifetime
- 1980-05-16 JP JP6517580A patent/JPS55159435A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3342851A1 (de) * | 1983-11-26 | 1985-06-05 | Merck Patent Gmbh, 6100 Darmstadt | Fotolacke |
| DE4328839A1 (de) * | 1993-08-27 | 1995-07-27 | Basf Lacke & Farben | Durch Einwirkung von Strahlung vernetzende Gemische sowie Verfahren zur phototechnischen Herstellung von Reliefstrukturen |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55159435A (en) | 1980-12-11 |
| EP0019122A2 (de) | 1980-11-26 |
| ATE14634T1 (de) | 1985-08-15 |
| DE3070917D1 (en) | 1985-09-05 |
| EP0019122B1 (de) | 1985-07-31 |
| US4287294A (en) | 1981-09-01 |
| JPS6364770B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-12-13 |
| EP0019122A3 (en) | 1981-05-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8141 | Disposal/no request for examination |