DE2918446C2 - Vorrichtung zum Implantieren von Ionen in eine Auftreffplatte - Google Patents

Vorrichtung zum Implantieren von Ionen in eine Auftreffplatte

Info

Publication number
DE2918446C2
DE2918446C2 DE2918446A DE2918446A DE2918446C2 DE 2918446 C2 DE2918446 C2 DE 2918446C2 DE 2918446 A DE2918446 A DE 2918446A DE 2918446 A DE2918446 A DE 2918446A DE 2918446 C2 DE2918446 C2 DE 2918446C2
Authority
DE
Germany
Prior art keywords
voltage
deflection plates
control system
counter circuit
impact plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2918446A
Other languages
German (de)
English (en)
Other versions
DE2918446A1 (de
Inventor
Pieter Amsterdam Bakker
Rudolf Simon Leiden Kuit
Jarig Amsterdam Politiek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of DE2918446A1 publication Critical patent/DE2918446A1/de
Application granted granted Critical
Publication of DE2918446C2 publication Critical patent/DE2918446C2/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
DE2918446A 1978-05-12 1979-05-08 Vorrichtung zum Implantieren von Ionen in eine Auftreffplatte Expired DE2918446C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NLAANVRAGE7805138,A NL182924C (nl) 1978-05-12 1978-05-12 Inrichting voor het implanteren van ionen in een trefplaat.

Publications (2)

Publication Number Publication Date
DE2918446A1 DE2918446A1 (de) 1979-11-15
DE2918446C2 true DE2918446C2 (de) 1987-03-12

Family

ID=19830823

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2918446A Expired DE2918446C2 (de) 1978-05-12 1979-05-08 Vorrichtung zum Implantieren von Ionen in eine Auftreffplatte

Country Status (6)

Country Link
US (1) US4260897A (US07922777-20110412-C00004.png)
JP (1) JPS54158861A (US07922777-20110412-C00004.png)
DE (1) DE2918446C2 (US07922777-20110412-C00004.png)
FR (1) FR2425721B1 (US07922777-20110412-C00004.png)
GB (1) GB2020896B (US07922777-20110412-C00004.png)
NL (1) NL182924C (US07922777-20110412-C00004.png)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2942045A1 (de) * 1979-10-17 1981-04-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zur gleichmaessigen ausleuchtung von flaechen mittels eines strahles
FR2475069A1 (fr) * 1980-02-01 1981-08-07 Commissariat Energie Atomique Procede de dopage rapide de semi-conducteurs
US4283631A (en) * 1980-02-22 1981-08-11 Varian Associates, Inc. Bean scanning and method of use for ion implantation
JPS5842152A (ja) * 1981-09-08 1983-03-11 Akashi Seisakusho Co Ltd 走査荷電粒子線による試料のアニール加熱装置
DE3175821D1 (en) * 1981-10-21 1987-02-12 Hell Rudolf Dr Ing Gmbh Highly stabilized beam generator for charged particles
US4449051A (en) * 1982-02-16 1984-05-15 Varian Associates, Inc. Dose compensation by differential pattern scanning
US4421988A (en) * 1982-02-18 1983-12-20 Varian Associates, Inc. Beam scanning method and apparatus for ion implantation
DE3502902A1 (de) * 1984-01-31 1985-08-08 Futaba Denshi Kogyo K.K., Mobara, Chiba Ionenstrahl-aufdampfvorrichtung
JPS62109445U (US07922777-20110412-C00004.png) * 1985-12-27 1987-07-13
US4700068A (en) * 1986-01-31 1987-10-13 Hughes Aircraft Company Apparatus and method for spatially characterizing and controlling a particle beam
DE3752358T2 (de) * 1986-04-09 2003-03-27 Varian Semiconductor Equipment Associates Inc., Gloucester Ionenstrahlabtastverfahren und vorrichtung
US4980562A (en) * 1986-04-09 1990-12-25 Varian Associates, Inc. Method and apparatus for high efficiency scanning in an ion implanter
JPS62295347A (ja) * 1986-04-09 1987-12-22 イクリプス・イオン・テクノロジ−・インコ−ポレイテツド イオンビ−ム高速平行走査装置
US4751393A (en) * 1986-05-16 1988-06-14 Varian Associates, Inc. Dose measurement and uniformity monitoring system for ion implantation
US4745281A (en) * 1986-08-25 1988-05-17 Eclipse Ion Technology, Inc. Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field
US5481116A (en) * 1994-06-10 1996-01-02 Ibis Technology Corporation Magnetic system and method for uniformly scanning heavy ion beams
US5438203A (en) * 1994-06-10 1995-08-01 Nissin Electric Company System and method for unipolar magnetic scanning of heavy ion beams
US5672879A (en) * 1995-06-12 1997-09-30 Glavish; Hilton F. System and method for producing superimposed static and time-varying magnetic fields
US5981961A (en) * 1996-03-15 1999-11-09 Applied Materials, Inc. Apparatus and method for improved scanning efficiency in an ion implanter
GB2382717B (en) * 1998-07-21 2003-09-03 Applied Materials Inc Ion Implantation Beam Monitor
US6677599B2 (en) * 2000-03-27 2004-01-13 Applied Materials, Inc. System and method for uniformly implanting a wafer with an ion beam
JP5072163B2 (ja) 2000-05-15 2012-11-14 バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド 高能率走査イオン注入器
AU2001270133A1 (en) 2000-06-22 2002-01-02 Proteros, Llc Ion implantation uniformity correction using beam current control
US7282427B1 (en) 2006-05-04 2007-10-16 Applied Materials, Inc. Method of implanting a substrate and an ion implanter for performing the method
US7355188B2 (en) * 2005-05-24 2008-04-08 Varian Semiconductor Equipment Associates, Inc. Technique for uniformity tuning in an ion implanter system
US7176470B1 (en) 2005-12-22 2007-02-13 Varian Semiconductor Equipment Associates, Inc. Technique for high-efficiency ion implantation

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH447408A (de) * 1965-02-23 1967-11-30 Hermsdorf Keramik Veb Verfahren für eine programmgesteuerte Bearbeitung von Dünnschichtbauelementen der Elektrotechnik mittels eines einen Ladungsträgerstrahl erzeugenden Gerätes
US3585397A (en) * 1968-10-04 1971-06-15 Hughes Aircraft Co Programmed fine ion implantation beam system
US3569757A (en) * 1968-10-04 1971-03-09 Houghes Aircraft Co Acceleration system for implanting ions in specimen
JPS4822393B1 (US07922777-20110412-C00004.png) * 1969-02-20 1973-07-05
US3588717A (en) * 1969-06-23 1971-06-28 Kev Electronics Corp Beam scanner with deflection plate capacitance feedback for producing linear deflection
DE1946931A1 (de) * 1969-09-17 1971-03-18 Gen Electric Verfahren zum Pruefen von Schaltungen und Vorrichtung zur Ausfuehrung des Verfahrens
US3662102A (en) * 1970-09-15 1972-05-09 Us Navy Bi-directional television scan system
FR2181467B1 (US07922777-20110412-C00004.png) * 1972-04-25 1974-07-26 Thomson Csf
NL7416395A (nl) * 1974-12-17 1976-06-21 Philips Nv Elektronenmikroskoop.
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns

Also Published As

Publication number Publication date
JPS54158861A (en) 1979-12-15
GB2020896B (en) 1982-09-15
FR2425721B1 (fr) 1985-10-31
NL182924B (nl) 1988-01-04
NL7805138A (nl) 1979-11-14
US4260897A (en) 1981-04-07
GB2020896A (en) 1979-11-21
DE2918446A1 (de) 1979-11-15
FR2425721A1 (fr) 1979-12-07
NL182924C (nl) 1988-06-01

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee