DE2918446C2 - - Google Patents
Info
- Publication number
- DE2918446C2 DE2918446C2 DE2918446A DE2918446A DE2918446C2 DE 2918446 C2 DE2918446 C2 DE 2918446C2 DE 2918446 A DE2918446 A DE 2918446A DE 2918446 A DE2918446 A DE 2918446A DE 2918446 C2 DE2918446 C2 DE 2918446C2
- Authority
- DE
- Germany
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NLAANVRAGE7805138,A NL182924C (nl) | 1978-05-12 | 1978-05-12 | Inrichting voor het implanteren van ionen in een trefplaat. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2918446A1 DE2918446A1 (de) | 1979-11-15 |
DE2918446C2 true DE2918446C2 (de) | 1987-03-12 |
Family
ID=19830823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19792918446 Granted DE2918446A1 (de) | 1978-05-12 | 1979-05-08 | Verfahren und vorrichtung zum implantieren von ionen in eine auftreffplatte |
Country Status (6)
Country | Link |
---|---|
US (1) | US4260897A (de) |
JP (1) | JPS54158861A (de) |
DE (1) | DE2918446A1 (de) |
FR (1) | FR2425721B1 (de) |
GB (1) | GB2020896B (de) |
NL (1) | NL182924C (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2942045A1 (de) * | 1979-10-17 | 1981-04-30 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur gleichmaessigen ausleuchtung von flaechen mittels eines strahles |
FR2475069A1 (fr) * | 1980-02-01 | 1981-08-07 | Commissariat Energie Atomique | Procede de dopage rapide de semi-conducteurs |
US4283631A (en) * | 1980-02-22 | 1981-08-11 | Varian Associates, Inc. | Bean scanning and method of use for ion implantation |
JPS5842152A (ja) * | 1981-09-08 | 1983-03-11 | Akashi Seisakusho Co Ltd | 走査荷電粒子線による試料のアニール加熱装置 |
EP0077417B1 (de) * | 1981-10-21 | 1987-01-07 | DR.-ING. RUDOLF HELL GmbH | Hochkonstanter Strahlerzeuger für geladene Teilchen |
US4449051A (en) * | 1982-02-16 | 1984-05-15 | Varian Associates, Inc. | Dose compensation by differential pattern scanning |
US4421988A (en) * | 1982-02-18 | 1983-12-20 | Varian Associates, Inc. | Beam scanning method and apparatus for ion implantation |
DE3502902A1 (de) * | 1984-01-31 | 1985-08-08 | Futaba Denshi Kogyo K.K., Mobara, Chiba | Ionenstrahl-aufdampfvorrichtung |
JPS62109445U (de) * | 1985-12-27 | 1987-07-13 | ||
US4700068A (en) * | 1986-01-31 | 1987-10-13 | Hughes Aircraft Company | Apparatus and method for spatially characterizing and controlling a particle beam |
JP2699170B2 (ja) * | 1986-04-09 | 1998-01-19 | イクリプス・イオン・テクノロジー・インコーポレイテッド | イオンビーム走査方法および装置 |
JPS62295347A (ja) * | 1986-04-09 | 1987-12-22 | イクリプス・イオン・テクノロジ−・インコ−ポレイテツド | イオンビ−ム高速平行走査装置 |
US4980562A (en) * | 1986-04-09 | 1990-12-25 | Varian Associates, Inc. | Method and apparatus for high efficiency scanning in an ion implanter |
US4751393A (en) * | 1986-05-16 | 1988-06-14 | Varian Associates, Inc. | Dose measurement and uniformity monitoring system for ion implantation |
US4745281A (en) * | 1986-08-25 | 1988-05-17 | Eclipse Ion Technology, Inc. | Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field |
US5481116A (en) * | 1994-06-10 | 1996-01-02 | Ibis Technology Corporation | Magnetic system and method for uniformly scanning heavy ion beams |
US5438203A (en) * | 1994-06-10 | 1995-08-01 | Nissin Electric Company | System and method for unipolar magnetic scanning of heavy ion beams |
US5672879A (en) * | 1995-06-12 | 1997-09-30 | Glavish; Hilton F. | System and method for producing superimposed static and time-varying magnetic fields |
US5981961A (en) * | 1996-03-15 | 1999-11-09 | Applied Materials, Inc. | Apparatus and method for improved scanning efficiency in an ion implanter |
GB2382716B (en) * | 1998-07-21 | 2003-09-03 | Applied Materials Inc | Ion Implantation Beam Monitor |
US6677599B2 (en) * | 2000-03-27 | 2004-01-13 | Applied Materials, Inc. | System and method for uniformly implanting a wafer with an ion beam |
KR100815635B1 (ko) | 2000-05-15 | 2008-03-20 | 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. | 작업편에 이온을 주입하기 위한 방법 및 이온 주입 장치 |
AU2001270133A1 (en) | 2000-06-22 | 2002-01-02 | Proteros, Llc | Ion implantation uniformity correction using beam current control |
US7282427B1 (en) | 2006-05-04 | 2007-10-16 | Applied Materials, Inc. | Method of implanting a substrate and an ion implanter for performing the method |
US7355188B2 (en) * | 2005-05-24 | 2008-04-08 | Varian Semiconductor Equipment Associates, Inc. | Technique for uniformity tuning in an ion implanter system |
US7176470B1 (en) | 2005-12-22 | 2007-02-13 | Varian Semiconductor Equipment Associates, Inc. | Technique for high-efficiency ion implantation |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH447408A (de) * | 1965-02-23 | 1967-11-30 | Hermsdorf Keramik Veb | Verfahren für eine programmgesteuerte Bearbeitung von Dünnschichtbauelementen der Elektrotechnik mittels eines einen Ladungsträgerstrahl erzeugenden Gerätes |
US3569757A (en) * | 1968-10-04 | 1971-03-09 | Houghes Aircraft Co | Acceleration system for implanting ions in specimen |
US3585397A (en) * | 1968-10-04 | 1971-06-15 | Hughes Aircraft Co | Programmed fine ion implantation beam system |
JPS4822393B1 (de) * | 1969-02-20 | 1973-07-05 | ||
US3588717A (en) * | 1969-06-23 | 1971-06-28 | Kev Electronics Corp | Beam scanner with deflection plate capacitance feedback for producing linear deflection |
DE1946931A1 (de) * | 1969-09-17 | 1971-03-18 | Gen Electric | Verfahren zum Pruefen von Schaltungen und Vorrichtung zur Ausfuehrung des Verfahrens |
US3662102A (en) * | 1970-09-15 | 1972-05-09 | Us Navy | Bi-directional television scan system |
FR2181467B1 (de) * | 1972-04-25 | 1974-07-26 | Thomson Csf | |
NL7416395A (nl) * | 1974-12-17 | 1976-06-21 | Philips Nv | Elektronenmikroskoop. |
US3956635A (en) * | 1975-06-13 | 1976-05-11 | International Business Machines Corporation | Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns |
-
1978
- 1978-05-12 NL NLAANVRAGE7805138,A patent/NL182924C/xx not_active IP Right Cessation
-
1979
- 1979-05-07 US US06/036,942 patent/US4260897A/en not_active Expired - Lifetime
- 1979-05-08 DE DE19792918446 patent/DE2918446A1/de active Granted
- 1979-05-09 GB GB7916014A patent/GB2020896B/en not_active Expired
- 1979-05-09 JP JP5685579A patent/JPS54158861A/ja active Pending
- 1979-05-11 FR FR7912055A patent/FR2425721B1/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL7805138A (nl) | 1979-11-14 |
DE2918446A1 (de) | 1979-11-15 |
FR2425721B1 (fr) | 1985-10-31 |
GB2020896A (en) | 1979-11-21 |
NL182924C (nl) | 1988-06-01 |
NL182924B (nl) | 1988-01-04 |
US4260897A (en) | 1981-04-07 |
GB2020896B (en) | 1982-09-15 |
FR2425721A1 (fr) | 1979-12-07 |
JPS54158861A (en) | 1979-12-15 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |