FR2181467B1 - - Google Patents

Info

Publication number
FR2181467B1
FR2181467B1 FR727214639A FR7214639A FR2181467B1 FR 2181467 B1 FR2181467 B1 FR 2181467B1 FR 727214639 A FR727214639 A FR 727214639A FR 7214639 A FR7214639 A FR 7214639A FR 2181467 B1 FR2181467 B1 FR 2181467B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR727214639A
Other languages
French (fr)
Other versions
FR2181467A1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR727214639A priority Critical patent/FR2181467B1/fr
Priority to US350719A priority patent/US3864597A/en
Priority to GB1944873A priority patent/GB1396209A/en
Priority to JP48046324A priority patent/JPS5218958B2/ja
Priority to DE2320888A priority patent/DE2320888C3/de
Publication of FR2181467A1 publication Critical patent/FR2181467A1/fr
Application granted granted Critical
Publication of FR2181467B1 publication Critical patent/FR2181467B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70—Arrangements for deflecting ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/825—Apparatus per se, device per se, or process of making or operating same
    • Y10S505/872—Magnetic field shield

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Particle Accelerators (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
FR727214639A 1972-04-25 1972-04-25 Expired FR2181467B1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR727214639A FR2181467B1 (de) 1972-04-25 1972-04-25
US350719A US3864597A (en) 1972-04-25 1973-04-13 Device for increasing the accuracy of addressing an electron beam striking a target
GB1944873A GB1396209A (en) 1972-04-25 1973-04-24 Devices for increasing the accuracy of addressing an electrn beam striking a target
JP48046324A JPS5218958B2 (de) 1972-04-25 1973-04-25
DE2320888A DE2320888C3 (de) 1972-04-25 1973-04-25 Verfahren zum Einstellen des Auftreffpunktes eines Elektronenstrahls auf einer Zielfläche und Vorrichtung zur Durchführung des Verfahrens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR727214639A FR2181467B1 (de) 1972-04-25 1972-04-25

Publications (2)

Publication Number Publication Date
FR2181467A1 FR2181467A1 (de) 1973-12-07
FR2181467B1 true FR2181467B1 (de) 1974-07-26

Family

ID=9097484

Family Applications (1)

Application Number Title Priority Date Filing Date
FR727214639A Expired FR2181467B1 (de) 1972-04-25 1972-04-25

Country Status (5)

Country Link
US (1) US3864597A (de)
JP (1) JPS5218958B2 (de)
DE (1) DE2320888C3 (de)
FR (1) FR2181467B1 (de)
GB (1) GB1396209A (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5186357A (ja) * 1975-01-27 1976-07-28 Nippon Electron Optics Lab Denshisenichisetsuteihohooyobisoreojitsushiserusochi
NL182924C (nl) * 1978-05-12 1988-06-01 Philips Nv Inrichting voor het implanteren van ionen in een trefplaat.
DE2831602A1 (de) * 1978-07-19 1980-02-07 Leybold Heraeus Gmbh & Co Kg Vorrichtung zur erfassung von strahlparametern eines periodisch ueber eine zielflaeche gefuehrten, fokussierten ladungstraegerstrahls und messverfahren unter verwendung der vorrichtung
JPS5548949A (en) * 1978-10-02 1980-04-08 Jones Geraint A C Scribing device and method
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
JPS5621321A (en) * 1979-07-27 1981-02-27 Fujitsu Ltd Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
JPS5633830A (en) * 1979-08-29 1981-04-04 Fujitsu Ltd Detecting method for mark positioning by electron beam
JPS6068692U (ja) * 1983-10-14 1985-05-15 横河電機株式会社 回路ユニツト収納機構
JPS60201626A (ja) * 1984-03-27 1985-10-12 Canon Inc 位置合わせ装置
US4677296A (en) * 1984-09-24 1987-06-30 Siemens Aktiengesellschaft Apparatus and method for measuring lengths in a scanning particle microscope
US4721842A (en) * 1986-08-29 1988-01-26 Ferranti Sciaky, Inc. Beam position correction device
WO1996000978A1 (en) * 1994-06-28 1996-01-11 Leica Cambridge Ltd. Electron beam lithography machine

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1171461A (en) * 1965-09-23 1969-11-19 Ass Elect Ind Improvements relating to the Focussing of Microscopes
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns
US3699304A (en) * 1969-12-15 1972-10-17 Ibm Electron beam deflection control method and apparatus

Also Published As

Publication number Publication date
DE2320888A1 (de) 1973-11-08
US3864597A (en) 1975-02-04
DE2320888C3 (de) 1979-10-25
DE2320888B2 (de) 1979-02-22
GB1396209A (en) 1975-06-04
JPS4954999A (de) 1974-05-28
FR2181467A1 (de) 1973-12-07
JPS5218958B2 (de) 1977-05-25

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Legal Events

Date Code Title Description
ST Notification of lapse