FR2181467B1 - - Google Patents
Info
- Publication number
- FR2181467B1 FR2181467B1 FR727214639A FR7214639A FR2181467B1 FR 2181467 B1 FR2181467 B1 FR 2181467B1 FR 727214639 A FR727214639 A FR 727214639A FR 7214639 A FR7214639 A FR 7214639A FR 2181467 B1 FR2181467 B1 FR 2181467B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/70—Arrangements for deflecting ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/825—Apparatus per se, device per se, or process of making or operating same
- Y10S505/872—Magnetic field shield
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Particle Accelerators (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR727214639A FR2181467B1 (de) | 1972-04-25 | 1972-04-25 | |
US350719A US3864597A (en) | 1972-04-25 | 1973-04-13 | Device for increasing the accuracy of addressing an electron beam striking a target |
GB1944873A GB1396209A (en) | 1972-04-25 | 1973-04-24 | Devices for increasing the accuracy of addressing an electrn beam striking a target |
JP48046324A JPS5218958B2 (de) | 1972-04-25 | 1973-04-25 | |
DE2320888A DE2320888C3 (de) | 1972-04-25 | 1973-04-25 | Verfahren zum Einstellen des Auftreffpunktes eines Elektronenstrahls auf einer Zielfläche und Vorrichtung zur Durchführung des Verfahrens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR727214639A FR2181467B1 (de) | 1972-04-25 | 1972-04-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2181467A1 FR2181467A1 (de) | 1973-12-07 |
FR2181467B1 true FR2181467B1 (de) | 1974-07-26 |
Family
ID=9097484
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR727214639A Expired FR2181467B1 (de) | 1972-04-25 | 1972-04-25 |
Country Status (5)
Country | Link |
---|---|
US (1) | US3864597A (de) |
JP (1) | JPS5218958B2 (de) |
DE (1) | DE2320888C3 (de) |
FR (1) | FR2181467B1 (de) |
GB (1) | GB1396209A (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5186357A (ja) * | 1975-01-27 | 1976-07-28 | Nippon Electron Optics Lab | Denshisenichisetsuteihohooyobisoreojitsushiserusochi |
NL182924C (nl) * | 1978-05-12 | 1988-06-01 | Philips Nv | Inrichting voor het implanteren van ionen in een trefplaat. |
DE2831602A1 (de) * | 1978-07-19 | 1980-02-07 | Leybold Heraeus Gmbh & Co Kg | Vorrichtung zur erfassung von strahlparametern eines periodisch ueber eine zielflaeche gefuehrten, fokussierten ladungstraegerstrahls und messverfahren unter verwendung der vorrichtung |
JPS5548949A (en) * | 1978-10-02 | 1980-04-08 | Jones Geraint A C | Scribing device and method |
US4243866A (en) * | 1979-01-11 | 1981-01-06 | International Business Machines Corporation | Method and apparatus for forming a variable size electron beam |
JPS5621321A (en) * | 1979-07-27 | 1981-02-27 | Fujitsu Ltd | Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus |
JPS5633830A (en) * | 1979-08-29 | 1981-04-04 | Fujitsu Ltd | Detecting method for mark positioning by electron beam |
JPS6068692U (ja) * | 1983-10-14 | 1985-05-15 | 横河電機株式会社 | 回路ユニツト収納機構 |
JPS60201626A (ja) * | 1984-03-27 | 1985-10-12 | Canon Inc | 位置合わせ装置 |
US4677296A (en) * | 1984-09-24 | 1987-06-30 | Siemens Aktiengesellschaft | Apparatus and method for measuring lengths in a scanning particle microscope |
US4721842A (en) * | 1986-08-29 | 1988-01-26 | Ferranti Sciaky, Inc. | Beam position correction device |
JPH10502210A (ja) * | 1994-06-28 | 1998-02-24 | ライカ リトグラフィー システムズ リミテッド | 電子ビームリトグラフ機械 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1171461A (en) * | 1965-09-23 | 1969-11-19 | Ass Elect Ind | Improvements relating to the Focussing of Microscopes |
US3547074A (en) * | 1967-04-13 | 1970-12-15 | Block Engineering | Apparatus for forming microelements |
US3491236A (en) * | 1967-09-28 | 1970-01-20 | Gen Electric | Electron beam fabrication of microelectronic circuit patterns |
US3699304A (en) * | 1969-12-15 | 1972-10-17 | Ibm | Electron beam deflection control method and apparatus |
-
1972
- 1972-04-25 FR FR727214639A patent/FR2181467B1/fr not_active Expired
-
1973
- 1973-04-13 US US350719A patent/US3864597A/en not_active Expired - Lifetime
- 1973-04-24 GB GB1944873A patent/GB1396209A/en not_active Expired
- 1973-04-25 JP JP48046324A patent/JPS5218958B2/ja not_active Expired
- 1973-04-25 DE DE2320888A patent/DE2320888C3/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1396209A (en) | 1975-06-04 |
JPS4954999A (de) | 1974-05-28 |
FR2181467A1 (de) | 1973-12-07 |
US3864597A (en) | 1975-02-04 |
DE2320888A1 (de) | 1973-11-08 |
DE2320888B2 (de) | 1979-02-22 |
JPS5218958B2 (de) | 1977-05-25 |
DE2320888C3 (de) | 1979-10-25 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |