DE2854605A1 - Verfahren und schaltungsanordnung zum optimieren des elektrolytischen polierens - Google Patents
Verfahren und schaltungsanordnung zum optimieren des elektrolytischen polierensInfo
- Publication number
- DE2854605A1 DE2854605A1 DE19782854605 DE2854605A DE2854605A1 DE 2854605 A1 DE2854605 A1 DE 2854605A1 DE 19782854605 DE19782854605 DE 19782854605 DE 2854605 A DE2854605 A DE 2854605A DE 2854605 A1 DE2854605 A1 DE 2854605A1
- Authority
- DE
- Germany
- Prior art keywords
- bath
- polishing
- concentration
- anode
- phosphoric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims description 71
- 238000000034 method Methods 0.000 title claims description 33
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 20
- 230000000737 periodic effect Effects 0.000 claims description 14
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 10
- 238000005868 electrolysis reaction Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 claims description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 claims description 5
- -1 fluoride ions Chemical class 0.000 claims description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 239000011775 sodium fluoride Substances 0.000 claims description 2
- 235000013024 sodium fluoride Nutrition 0.000 claims description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 2
- 235000011152 sodium sulphate Nutrition 0.000 claims description 2
- 235000002906 tartaric acid Nutrition 0.000 claims description 2
- 239000011975 tartaric acid Substances 0.000 claims description 2
- 229910000365 copper sulfate Inorganic materials 0.000 claims 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims 1
- 238000011536 re-plating Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 13
- 238000009713 electroplating Methods 0.000 description 9
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 8
- 239000010956 nickel silver Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 240000004808 Saccharomyces cerevisiae Species 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| HU78LA932A HU178066B (en) | 1978-03-22 | 1978-03-22 | Process and circuit arrangement for optimum control of electrolytic polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2854605A1 true DE2854605A1 (de) | 1979-09-27 |
| DE2854605C2 DE2854605C2 (enrdf_load_stackoverflow) | 1988-12-22 |
Family
ID=10998246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19782854605 Granted DE2854605A1 (de) | 1978-03-22 | 1978-12-18 | Verfahren und schaltungsanordnung zum optimieren des elektrolytischen polierens |
Country Status (6)
| Country | Link |
|---|---|
| AT (1) | AT358893B (enrdf_load_stackoverflow) |
| DE (1) | DE2854605A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2420581A1 (enrdf_load_stackoverflow) |
| GB (1) | GB2017150B (enrdf_load_stackoverflow) |
| HU (1) | HU178066B (enrdf_load_stackoverflow) |
| IT (1) | IT1110670B (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0139958B1 (de) * | 1983-08-23 | 1986-11-05 | BBC Aktiengesellschaft Brown, Boveri & Cie. | Verfahren zum elektrolytischen Polieren eines Werkstücks aus einer Legierung auf Nickel-, Kobalt- oder Eisenbasis |
| ES2172479B1 (es) * | 2001-03-13 | 2003-12-16 | Fundacion Cidetec | Proceso de electrodeposicion de metales y rectificador para dicho proceso. |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3939053A (en) * | 1972-09-15 | 1976-02-17 | Siemens Aktiengesellschaft | Apparatus for the electrolytic polishing of niobium structures |
| GB1427394A (en) * | 1973-04-13 | 1976-03-10 | Politechnika Warszawska | Method for the continuous electropolishing of elements made of copper or an alloy of copper |
-
1978
- 1978-03-22 HU HU78LA932A patent/HU178066B/hu not_active IP Right Cessation
- 1978-11-07 AT AT796478A patent/AT358893B/de not_active IP Right Cessation
- 1978-12-08 FR FR7834572A patent/FR2420581A1/fr active Granted
- 1978-12-18 DE DE19782854605 patent/DE2854605A1/de active Granted
-
1979
- 1979-01-03 GB GB7900176A patent/GB2017150B/en not_active Expired
- 1979-01-23 IT IT19538/79A patent/IT1110670B/it active
Non-Patent Citations (1)
| Title |
|---|
| NICHTS ERMITTELT * |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2017150A (en) | 1979-10-03 |
| ATA796478A (de) | 1980-02-15 |
| FR2420581B1 (enrdf_load_stackoverflow) | 1983-08-26 |
| IT1110670B (it) | 1985-12-23 |
| DE2854605C2 (enrdf_load_stackoverflow) | 1988-12-22 |
| GB2017150B (en) | 1982-08-25 |
| FR2420581A1 (fr) | 1979-10-19 |
| HU178066B (en) | 1982-02-28 |
| IT7919538A0 (it) | 1979-01-23 |
| AT358893B (de) | 1980-10-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |