GB1427394A - Method for the continuous electropolishing of elements made of copper or an alloy of copper - Google Patents
Method for the continuous electropolishing of elements made of copper or an alloy of copperInfo
- Publication number
- GB1427394A GB1427394A GB1801573A GB1801573A GB1427394A GB 1427394 A GB1427394 A GB 1427394A GB 1801573 A GB1801573 A GB 1801573A GB 1801573 A GB1801573 A GB 1801573A GB 1427394 A GB1427394 A GB 1427394A
- Authority
- GB
- United Kingdom
- Prior art keywords
- bath
- copper
- electropolishing
- alloy
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
1427394 Electropolishing copper or copper alloy POLITECHNIKA WARSZAWSKA 13 April 1973 18015/73 Heading C7B In a method for the continuous electropolishing of an element made of Cu or an alloy of Cu (e.g. a beryllium bronze wire or a Cu wire), the element is passed through first and second baths containing the same solution; namely a solution containing H 3 PO 4 having a concentration of 75 to 90 wt per cent, and Cu ions having a concentration of 0À05 to 2 gram-ions/litre, and an addition of one or more organic compounds (such as aliphatic alcohols, tertiary aliphatic amines, and/or alkyl ammonium compounds). In the first bath there may or may not be a current density on the element. In the second bath a voltage of between 1À5 and 2À5 volts is applied between the element (as anode) and a cathode. The first bath solution has a constant temperature of 70‹ to 100‹C and the second bath solution has a temperature of 10‹ to 30‹C at the 'inlet' increasing to 60‹ to 140 C at the 'outlet'. The inlet and outlet are the points at which the element enters and leaves the second bath. The electropolishing may be carried out using a constant potential or a constant current.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1801573A GB1427394A (en) | 1973-04-13 | 1973-04-13 | Method for the continuous electropolishing of elements made of copper or an alloy of copper |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1801573A GB1427394A (en) | 1973-04-13 | 1973-04-13 | Method for the continuous electropolishing of elements made of copper or an alloy of copper |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1427394A true GB1427394A (en) | 1976-03-10 |
Family
ID=10105177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1801573A Expired GB1427394A (en) | 1973-04-13 | 1973-04-13 | Method for the continuous electropolishing of elements made of copper or an alloy of copper |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1427394A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2420581A1 (en) * | 1978-03-22 | 1979-10-19 | Latszereszeti Eszkoezoek Gyara | METHOD AND CIRCUIT FOR THE OPTIMUM CONTROL OF ELECTROLYTIC POLISHING |
-
1973
- 1973-04-13 GB GB1801573A patent/GB1427394A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2420581A1 (en) * | 1978-03-22 | 1979-10-19 | Latszereszeti Eszkoezoek Gyara | METHOD AND CIRCUIT FOR THE OPTIMUM CONTROL OF ELECTROLYTIC POLISHING |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |