DE283874C - - Google Patents

Info

Publication number
DE283874C
DE283874C DENDAT283874D DE283874DA DE283874C DE 283874 C DE283874 C DE 283874C DE NDAT283874 D DENDAT283874 D DE NDAT283874D DE 283874D A DE283874D A DE 283874DA DE 283874 C DE283874 C DE 283874C
Authority
DE
Germany
Prior art keywords
wheel
lamp
tooth
short
equivalent resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DENDAT283874D
Other languages
German (de)
English (en)
Publication of DE283874C publication Critical patent/DE283874C/de
Active legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B31/00Electric arc lamps
    • H05B31/0042Mounting; Connecting
    • H05B31/0054Short circuit devices for arc lamps

Landscapes

  • Lighting Device Outwards From Vehicle And Optical Signal (AREA)
DENDAT283874D Active DE283874C (OSRAM)

Publications (1)

Publication Number Publication Date
DE283874C true DE283874C (OSRAM)

Family

ID=539412

Family Applications (1)

Application Number Title Priority Date Filing Date
DENDAT283874D Active DE283874C (OSRAM)

Country Status (1)

Country Link
DE (1) DE283874C (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5476547A (en) * 1989-09-26 1995-12-19 Canon Kabushiki Kaisha Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5476547A (en) * 1989-09-26 1995-12-19 Canon Kabushiki Kaisha Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation

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