DE2736867C2 - Reproduktionsmaterial, insbesondere Abbildungsfilm zur Verwendung im graphischen Gewerbe, sowie Verfahren zu dessen Herstellung - Google Patents
Reproduktionsmaterial, insbesondere Abbildungsfilm zur Verwendung im graphischen Gewerbe, sowie Verfahren zu dessen HerstellungInfo
- Publication number
- DE2736867C2 DE2736867C2 DE2736867A DE2736867A DE2736867C2 DE 2736867 C2 DE2736867 C2 DE 2736867C2 DE 2736867 A DE2736867 A DE 2736867A DE 2736867 A DE2736867 A DE 2736867A DE 2736867 C2 DE2736867 C2 DE 2736867C2
- Authority
- DE
- Germany
- Prior art keywords
- layer
- bismuth
- film
- anchoring
- optical density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title claims description 74
- 238000003384 imaging method Methods 0.000 title claims description 21
- 238000000034 method Methods 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 title description 11
- 239000010410 layer Substances 0.000 claims description 160
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 105
- 229910052797 bismuth Inorganic materials 0.000 claims description 99
- 230000003287 optical effect Effects 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 24
- 238000004873 anchoring Methods 0.000 claims description 17
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 229910001152 Bi alloy Inorganic materials 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 239000002985 plastic film Substances 0.000 claims description 3
- 239000012298 atmosphere Substances 0.000 claims description 2
- 229910000416 bismuth oxide Inorganic materials 0.000 claims description 2
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000011229 interlayer Substances 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000010408 film Substances 0.000 description 138
- 229910052709 silver Inorganic materials 0.000 description 27
- 239000004332 silver Substances 0.000 description 27
- 239000000243 solution Substances 0.000 description 23
- 239000000839 emulsion Substances 0.000 description 22
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 20
- 238000005530 etching Methods 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- -1 silver halide Chemical class 0.000 description 13
- 238000000576 coating method Methods 0.000 description 11
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 9
- 229910052736 halogen Inorganic materials 0.000 description 9
- 150000002367 halogens Chemical class 0.000 description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 229920003023 plastic Polymers 0.000 description 8
- 239000004033 plastic Substances 0.000 description 8
- 150000004820 halides Chemical class 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 150000008049 diazo compounds Chemical class 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- 238000001465 metallisation Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 239000004348 Glyceryl diacetate Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 235000019443 glyceryl diacetate Nutrition 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 239000011118 polyvinyl acetate Substances 0.000 description 3
- 229920002689 polyvinyl acetate Polymers 0.000 description 3
- 238000005549 size reduction Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 229910052714 tellurium Inorganic materials 0.000 description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000000852 azido group Chemical group *N=[N+]=[N-] 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 229920001195 polyisoprene Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000003039 volatile agent Substances 0.000 description 2
- BCNMNYUNSFNSSG-UHFFFAOYSA-N (4-azidophenyl)-phenylmethanone Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C(=O)C1=CC=CC=C1 BCNMNYUNSFNSSG-UHFFFAOYSA-N 0.000 description 1
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- ZRUOTKQBVMWMDK-UHFFFAOYSA-N 2-hydroxy-6-methylbenzaldehyde Chemical compound CC1=CC=CC(O)=C1C=O ZRUOTKQBVMWMDK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- XHPWRTXYJFNZAW-UHFFFAOYSA-N [[4-[2-(4-diazonioimino-2-sulfocyclohexa-2,5-dien-1-ylidene)ethylidene]-3-sulfocyclohexa-2,5-dien-1-ylidene]hydrazinylidene]azanide Chemical compound OS(=O)(=O)C1=CC(N=[N+]=[N-])=CC=C1C=CC1=CC=C(N=[N+]=[N-])C=C1S(O)(=O)=O XHPWRTXYJFNZAW-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229920002457 flexible plastic Polymers 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000011086 glassine Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-M hydrogensulfate Chemical compound OS([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000011104 metalized film Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000006199 nebulizer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical class [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 230000002165 photosensitisation Effects 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229920005613 synthetic organic polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000008207 working material Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/724,993 US4138262A (en) | 1976-09-20 | 1976-09-20 | Imaging film comprising bismuth image-forming layer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2736867A1 DE2736867A1 (de) | 1978-03-23 |
| DE2736867C2 true DE2736867C2 (de) | 1986-11-06 |
Family
ID=24912697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2736867A Expired DE2736867C2 (de) | 1976-09-20 | 1977-08-16 | Reproduktionsmaterial, insbesondere Abbildungsfilm zur Verwendung im graphischen Gewerbe, sowie Verfahren zu dessen Herstellung |
Country Status (9)
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5644095Y2 (US07413550-20080819-C00001.png) * | 1973-07-20 | 1981-10-15 | ||
| US4396643A (en) * | 1981-06-29 | 1983-08-02 | Minnesota Mining And Manufacturing Company | Radiation absorbing surfaces |
| US4582111A (en) * | 1981-06-29 | 1986-04-15 | Minnesota Mining And Manufacturing Company | Radiation absorbing surfaces |
| US4761300A (en) * | 1983-06-29 | 1988-08-02 | Stauffer Chemical Company | Method of vacuum depostion of pnictide films on a substrate using a pnictide bubbler and a sputterer |
| US4584261A (en) * | 1984-07-27 | 1986-04-22 | E. I. Du Pont De Nemours And Company | Process for etching nonphotosensitive layer under washoff photopolymer layer |
| US4567129A (en) * | 1984-07-27 | 1986-01-28 | E. I. Du Pont De Nemours And Company | Process for image formation utilizing chemically soluble pigments |
| US5237447A (en) * | 1992-08-27 | 1993-08-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Alkali metal for ultraviolet band-pass filter |
| US5429715A (en) * | 1993-11-01 | 1995-07-04 | Xerox Corporation | Method for rendering imaging member substrates non-reflective |
| US6287673B1 (en) | 1998-03-03 | 2001-09-11 | Acktar Ltd. | Method for producing high surface area foil electrodes |
| AT511241B1 (de) * | 2011-04-14 | 2013-02-15 | Univ Wien Tech | Verfahren zur herstellung dreidimensionaler strukturen |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE657273C (de) * | 1933-08-29 | 1938-03-01 | Heidenhain Johannes Dr | Verfahren zum Herstellen von Kopiervorlagen |
| US3262825A (en) * | 1961-12-29 | 1966-07-26 | Bell Telephone Labor Inc | Method for etching crystals of group iii(a)-v(a) compounds and etchant used therefor |
| US3317409A (en) * | 1963-04-16 | 1967-05-02 | Minnesota Mining & Mfg | Electrolytic electrophotography |
| US3393070A (en) * | 1965-03-01 | 1968-07-16 | Xerox Corp | Xerographic plate with electric field regulating layer |
| DE1622386A1 (de) * | 1967-11-28 | 1970-12-23 | Telefunken Patent | Verfahren zum Herstellen einer Photomaske |
| US3707372A (en) * | 1968-02-19 | 1972-12-26 | Teeg Research Inc | Electromagnetic radiation sensitive elements |
| US3674492A (en) * | 1970-12-09 | 1972-07-04 | Bell Telephone Labor Inc | Laminar photomask |
| JPS4845775A (US07413550-20080819-C00001.png) * | 1971-10-13 | 1973-06-29 | ||
| US4379827A (en) * | 1971-12-08 | 1983-04-12 | Energy Conversion Devices, Inc. | Imaging structure with tellurium metal film and energy sensitive material thereon |
| US3925079A (en) * | 1972-06-16 | 1975-12-09 | Richard W F Hager | Decorative article and method of making same |
| US3815354A (en) * | 1973-01-02 | 1974-06-11 | Cal Tex Semiconductor | Electronic watch |
| DE2306278A1 (de) * | 1973-02-08 | 1974-08-15 | Agfa Gevaert Ag | Kameraempfindliche photomasken |
| JPS5821257B2 (ja) * | 1974-04-25 | 1983-04-28 | 富士写真フイルム株式会社 | キンゾクガゾウケイセイザイリヨウ |
| GB1516687A (en) * | 1974-10-17 | 1978-07-05 | Energy Conversion Devices Inc | Imaging method |
| JPS51108749A (ja) * | 1975-03-20 | 1976-09-27 | Tokyo Shibaura Electric Co | Denatsuseigyokahenritokukairo |
| FR2340995A1 (fr) * | 1976-02-16 | 1977-09-09 | Fuji Photo Film Co Ltd | Procede de fabrication d'un materiau en feuille comportant une couche metallique deposee sous vide, et procede de fabrication d'un materiau d'enregistrement |
| GB1566802A (en) * | 1976-06-02 | 1980-05-08 | Agfa Gevaert | Photosensitive imaging material |
| JPS5617876A (en) * | 1979-07-18 | 1981-02-20 | Mitsubishi Electric Corp | Elevator group controller |
-
1976
- 1976-09-20 US US05/724,993 patent/US4138262A/en not_active Expired - Lifetime
-
1977
- 1977-08-16 DE DE2736867A patent/DE2736867C2/de not_active Expired
- 1977-08-24 GB GB35487/77A patent/GB1560325A/en not_active Expired
- 1977-09-09 IT IT27429/77A patent/IT1086357B/it active
- 1977-09-16 FR FR7728013A patent/FR2365144A1/fr active Granted
- 1977-09-16 BE BE180967A patent/BE858777A/xx not_active IP Right Cessation
- 1977-09-20 CA CA287,081A patent/CA1096684A/en not_active Expired
- 1977-09-20 JP JP11229077A patent/JPS5339117A/ja active Granted
- 1977-09-20 AU AU28938/77A patent/AU509936B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2736867A1 (de) | 1978-03-23 |
| US4138262A (en) | 1979-02-06 |
| JPS6224778B2 (US07413550-20080819-C00001.png) | 1987-05-29 |
| FR2365144B1 (US07413550-20080819-C00001.png) | 1985-03-08 |
| AU509936B2 (en) | 1980-05-29 |
| JPS5339117A (en) | 1978-04-10 |
| FR2365144A1 (fr) | 1978-04-14 |
| AU2893877A (en) | 1979-03-29 |
| GB1560325A (en) | 1980-02-06 |
| BE858777A (fr) | 1978-01-16 |
| CA1096684A (en) | 1981-03-03 |
| IT1086357B (it) | 1985-05-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2518451C2 (de) | Aufzeichnungsmaterial zur Erzeugung von Metallbildern | |
| EP0105421B1 (de) | Lichtempfindliches Schichtübertragungsmaterial und Verfahren zur Herstellung einer Photoresistschablone | |
| DE2830622C2 (de) | Aufzeichnungsmaterial und Verfahren zur Herstellung von Reliefbildern unter Verwendung dieses Aufzeichnungsmaterials | |
| EP0326977B1 (de) | Flächenförmiges lichtempfindliches Aufzeichnungsmaterial | |
| DE3334993C2 (US07413550-20080819-C00001.png) | ||
| DE2706633A1 (de) | Lichtempfindliche harzmasse und anwendung derselben als material zur ausbildung eines metallbildes | |
| DE2736867C2 (de) | Reproduktionsmaterial, insbesondere Abbildungsfilm zur Verwendung im graphischen Gewerbe, sowie Verfahren zu dessen Herstellung | |
| DE2202360C3 (de) | Photographisches Aufzeichnungsmaterial zur Herstellung von Zwischenoriginalen und Verfahren zur Herstellung von Zwischenoriginalen und Lichtmasken | |
| DE2638710C2 (de) | Vorsensibilisierte Druckplatte | |
| DE2149056C3 (de) | Verfahren zur Reproduktion von Bildern | |
| DE2036585A1 (de) | Photopolymensierbares Kopiermaterial | |
| DE2620961A1 (de) | Metallbild-erzeugendes material | |
| DE3601827C2 (US07413550-20080819-C00001.png) | ||
| DE2658422A1 (de) | Negativ-trockenresistfilm und verfahren zu seiner herstellung | |
| DE2413154A1 (de) | Verfahren und konstruktion zur herstellung von abbildungen (abbildungsmaterial) | |
| DE2106574A1 (de) | Lichtempfindliches Laminat | |
| DE2716422A1 (de) | Trockensystemelement zur bildherstellung | |
| EP0294665A2 (de) | Verfahren zur Herstellung eines Mehrfarbenbilds | |
| DE2214924A1 (de) | Diffusionsübertragungsbildempfangsmaterialien | |
| DE2712864A1 (de) | Vorsensibilisiertes system zur entnahme positiver abzuege | |
| DE2259768C2 (de) | Abbildungsmaterial, seine Verwendung sowie Verfahren zur Herstellung einer Abbildung | |
| DE2928221A1 (de) | Verfahren zur herstellung eines photohaertbaren schichtstoffs | |
| US4271257A (en) | Imaging film of bismuth or bismuth alloy | |
| DE1671630A1 (de) | Schablonentraeger fuer Siebdruck | |
| DE2239018A1 (de) | Beschichtete materialien |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8128 | New person/name/address of the agent |
Representative=s name: MUELLER, H., DIPL.-ING., PAT.-ANW., 8000 MUENCHEN |
|
| 8125 | Change of the main classification |
Ipc: G03F 7/10 |
|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |