DE2726813C2 - Verfahren zur Herstellung eines mit einem Muster versehenen Substrats - Google Patents

Verfahren zur Herstellung eines mit einem Muster versehenen Substrats

Info

Publication number
DE2726813C2
DE2726813C2 DE2726813A DE2726813A DE2726813C2 DE 2726813 C2 DE2726813 C2 DE 2726813C2 DE 2726813 A DE2726813 A DE 2726813A DE 2726813 A DE2726813 A DE 2726813A DE 2726813 C2 DE2726813 C2 DE 2726813C2
Authority
DE
Germany
Prior art keywords
photoresist
layer
plasma
substrate
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2726813A
Other languages
German (de)
English (en)
Other versions
DE2726813A1 (de
Inventor
Henry Guenther Phoenix Ariz. Hughes
Jed V. Mesa Ariz. Keller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of DE2726813A1 publication Critical patent/DE2726813A1/de
Application granted granted Critical
Publication of DE2726813C2 publication Critical patent/DE2726813C2/de
Expired legal-status Critical Current

Links

Classifications

    • H10P50/287—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
DE2726813A 1976-06-17 1977-06-14 Verfahren zur Herstellung eines mit einem Muster versehenen Substrats Expired DE2726813C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69730376A 1976-06-17 1976-06-17

Publications (2)

Publication Number Publication Date
DE2726813A1 DE2726813A1 (de) 1977-12-29
DE2726813C2 true DE2726813C2 (de) 1984-02-23

Family

ID=24800591

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2726813A Expired DE2726813C2 (de) 1976-06-17 1977-06-14 Verfahren zur Herstellung eines mit einem Muster versehenen Substrats

Country Status (2)

Country Link
JP (1) JPS52155531A (cg-RX-API-DMAC10.html)
DE (1) DE2726813C2 (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3913434A1 (de) * 1989-04-24 1990-10-25 Siemens Ag Trockenwickelbares resistsystem

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4187331A (en) * 1978-08-24 1980-02-05 International Business Machines Corp. Fluorine plasma resist image hardening
JPS5565365A (en) * 1978-11-07 1980-05-16 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method
JPS5569265A (en) * 1978-11-15 1980-05-24 Hitachi Ltd Pattern-forming method
US4232110A (en) * 1979-03-12 1980-11-04 Bell Telephone Laboratories, Incorporated Solid state devices formed by differential plasma etching of resists
US4278753A (en) 1980-02-25 1981-07-14 Horizons Research Incorporated Plasma developable photoresist composition with polyvinyl formal binder
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development
DE3015469A1 (de) * 1980-04-22 1981-10-29 Dai Nippon Printing Co., Ltd. Flachdruckplatte fuer trocken-flachdruck und verfahren zur herstellung derselben
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
JPS585735A (ja) * 1981-06-01 1983-01-13 Daikin Ind Ltd 基板上にパタ−ンが形成されたレジスト被膜を製造する方法
JPS582025A (ja) * 1981-06-29 1983-01-07 Fujitsu Ltd パタ−ン形成方法
JPS5860537A (ja) * 1981-10-07 1983-04-11 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法
JPS58117539A (ja) * 1981-12-30 1983-07-13 Tokyo Denshi Kagaku Kabushiki 乾式現像の終点検知方法
US4497891A (en) * 1983-10-25 1985-02-05 International Business Machines Corporation Dry-developed, negative working electron resist system
EP0465064B1 (en) * 1990-06-29 1998-12-09 Fujitsu Limited Process for forming patterns

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3705055A (en) * 1970-09-18 1972-12-05 Western Electric Co Method of descumming photoresist patterns
JPS5226274B2 (cg-RX-API-DMAC10.html) * 1973-01-25 1977-07-13
JPS52376B2 (cg-RX-API-DMAC10.html) * 1973-12-10 1977-01-07
JPS5151938A (en) * 1974-10-31 1976-05-07 Tokyo Ohka Kogyo Co Ltd Fuotorejisutono kaikahoho
US3920483A (en) * 1974-11-25 1975-11-18 Ibm Method of ion implantation through a photoresist mask
JPS5272175A (en) * 1975-12-12 1977-06-16 Mitsubishi Electric Corp Mask patterning of resist meterial

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3913434A1 (de) * 1989-04-24 1990-10-25 Siemens Ag Trockenwickelbares resistsystem

Also Published As

Publication number Publication date
JPS5712138B2 (cg-RX-API-DMAC10.html) 1982-03-09
JPS52155531A (en) 1977-12-24
DE2726813A1 (de) 1977-12-29

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8125 Change of the main classification

Ipc: G03F 7/00

8126 Change of the secondary classification

Ipc: H01L 21/306

8128 New person/name/address of the agent

Representative=s name: GRUENECKER, A., DIPL.-ING. KINKELDEY, H., DIPL.-IN

D2 Grant after examination
8363 Opposition against the patent
8365 Fully valid after opposition proceedings
8380 Miscellaneous part iii

Free format text: ES ERFOLGT NEUDRUCK DER PATENTSCHRIFT NACH AUFRECHTERHALTUNG

8339 Ceased/non-payment of the annual fee