DE259062C - - Google Patents

Info

Publication number
DE259062C
DE259062C DENDAT259062D DE259062DA DE259062C DE 259062 C DE259062 C DE 259062C DE NDAT259062 D DENDAT259062 D DE NDAT259062D DE 259062D A DE259062D A DE 259062DA DE 259062 C DE259062 C DE 259062C
Authority
DE
Germany
Prior art keywords
tracks
rope
ropes
wire ropes
suspension railway
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DENDAT259062D
Other languages
German (de)
English (en)
Publication of DE259062C publication Critical patent/DE259062C/de
Active legal-status Critical Current

Links

Classifications

    • EFIXED CONSTRUCTIONS
    • E01CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01BPERMANENT WAY; PERMANENT-WAY TOOLS; MACHINES FOR MAKING RAILWAYS OF ALL KINDS
    • E01B25/00Tracks for special kinds of railways
    • E01B25/16Tracks for aerial rope railways with a stationary rope

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Ropes Or Cables (AREA)
DENDAT259062D Active DE259062C (enrdf_load_stackoverflow)

Publications (1)

Publication Number Publication Date
DE259062C true DE259062C (enrdf_load_stackoverflow)

Family

ID=516829

Family Applications (1)

Application Number Title Priority Date Filing Date
DENDAT259062D Active DE259062C (enrdf_load_stackoverflow)

Country Status (1)

Country Link
DE (1) DE259062C (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6699356B2 (en) 2001-08-17 2004-03-02 Applied Materials, Inc. Method and apparatus for chemical-mechanical jet etching of semiconductor structures

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6699356B2 (en) 2001-08-17 2004-03-02 Applied Materials, Inc. Method and apparatus for chemical-mechanical jet etching of semiconductor structures
US7037854B2 (en) 2001-08-17 2006-05-02 Applied Materials, Inc. Method for chemical-mechanical jet etching of semiconductor structures

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