DE2545327A1 - Lichtempfindliches bilderzeugungselement - Google Patents

Lichtempfindliches bilderzeugungselement

Info

Publication number
DE2545327A1
DE2545327A1 DE19752545327 DE2545327A DE2545327A1 DE 2545327 A1 DE2545327 A1 DE 2545327A1 DE 19752545327 DE19752545327 DE 19752545327 DE 2545327 A DE2545327 A DE 2545327A DE 2545327 A1 DE2545327 A1 DE 2545327A1
Authority
DE
Germany
Prior art keywords
imaging element
photosensitive
element according
azide
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752545327
Other languages
German (de)
English (en)
Inventor
Masayuki Iwasaki
Tadao Toyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2545327A1 publication Critical patent/DE2545327A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE19752545327 1974-10-09 1975-10-09 Lichtempfindliches bilderzeugungselement Withdrawn DE2545327A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11690774A JPS5143125A (ja) 1974-10-09 1974-10-09 Kankoseifukushazairyo

Publications (1)

Publication Number Publication Date
DE2545327A1 true DE2545327A1 (de) 1976-04-22

Family

ID=14698583

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752545327 Withdrawn DE2545327A1 (de) 1974-10-09 1975-10-09 Lichtempfindliches bilderzeugungselement

Country Status (4)

Country Link
JP (1) JPS5143125A (fr)
DE (1) DE2545327A1 (fr)
FR (1) FR2287710A1 (fr)
GB (1) GB1520466A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0021718A1 (fr) * 1979-06-16 1981-01-07 Konica Corporation Produit de condensation photosensible, compositions photosensibles et plaques lithographiques contenant ce produit de condensation

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
FR2861014A1 (fr) * 2003-10-20 2005-04-22 Atofina Structures multicouches polyamide/polyurethande pour articles decores

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0021718A1 (fr) * 1979-06-16 1981-01-07 Konica Corporation Produit de condensation photosensible, compositions photosensibles et plaques lithographiques contenant ce produit de condensation

Also Published As

Publication number Publication date
JPS5143125A (ja) 1976-04-13
FR2287710B1 (fr) 1981-07-31
GB1520466A (en) 1978-08-09
FR2287710A1 (fr) 1976-05-07

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee