FR2287710A1 - Materiau photosensible formateur d'image positive - Google Patents

Materiau photosensible formateur d'image positive

Info

Publication number
FR2287710A1
FR2287710A1 FR7530947A FR7530947A FR2287710A1 FR 2287710 A1 FR2287710 A1 FR 2287710A1 FR 7530947 A FR7530947 A FR 7530947A FR 7530947 A FR7530947 A FR 7530947A FR 2287710 A1 FR2287710 A1 FR 2287710A1
Authority
FR
France
Prior art keywords
image forming
photosensitive material
positive image
material positive
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7530947A
Other languages
English (en)
Other versions
FR2287710B1 (fr
Inventor
Tadao Toyama
Masayuki Iwasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of FR2287710A1 publication Critical patent/FR2287710A1/fr
Application granted granted Critical
Publication of FR2287710B1 publication Critical patent/FR2287710B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
FR7530947A 1974-10-09 1975-10-09 Materiau photosensible formateur d'image positive Granted FR2287710A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11690774A JPS5143125A (ja) 1974-10-09 1974-10-09 Kankoseifukushazairyo

Publications (2)

Publication Number Publication Date
FR2287710A1 true FR2287710A1 (fr) 1976-05-07
FR2287710B1 FR2287710B1 (fr) 1981-07-31

Family

ID=14698583

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7530947A Granted FR2287710A1 (fr) 1974-10-09 1975-10-09 Materiau photosensible formateur d'image positive

Country Status (4)

Country Link
JP (1) JPS5143125A (fr)
DE (1) DE2545327A1 (fr)
FR (1) FR2287710A1 (fr)
GB (1) GB1520466A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
FR2861014A1 (fr) * 2003-10-20 2005-04-22 Atofina Structures multicouches polyamide/polyurethande pour articles decores

Also Published As

Publication number Publication date
GB1520466A (en) 1978-08-09
FR2287710B1 (fr) 1981-07-31
JPS5143125A (ja) 1976-04-13
DE2545327A1 (de) 1976-04-22

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Legal Events

Date Code Title Description
ST Notification of lapse