GB1520466A - Photo sensitive image-forming materials - Google Patents

Photo sensitive image-forming materials

Info

Publication number
GB1520466A
GB1520466A GB4110975A GB4110975A GB1520466A GB 1520466 A GB1520466 A GB 1520466A GB 4110975 A GB4110975 A GB 4110975A GB 4110975 A GB4110975 A GB 4110975A GB 1520466 A GB1520466 A GB 1520466A
Authority
GB
United Kingdom
Prior art keywords
acid
contain
sulphonic acid
alkali
diazidostilbene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4110975A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB1520466A publication Critical patent/GB1520466A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Abstract

1520466 Photo-sensitive azide materials FUJI PHOTO FILM CO Ltd 7 Oct 1975 [9 Oct 1974] 41109/75 Heading G2C A positive working material has a photosensitive layer rendered alkali soluble on exposure and comprising (i) a polyamide and (ii) an azide having at least one alkali-solubilizing group e.g. SO 2 H, CO 2 H, OH, and being present in an amount of 3 to 30 parts by weight per 100 parts of the polyamide. Arylazides are preferred e.g. 4-azidobenzene carboxylic or sulphonic acid, 4-azidophenol, 4, 4'-diazidostilbene-2, 2', disulphonic acid; 4, 4'- diazidobenzalacetophenone-2-sulphonic acid, 4, 4'-diazidostilbene-α-carboxylic acid, 1-(4-azido- 2-hydroxyphenyl)-5- (4-azido-2-sulphophenyl) - pentane-3-oxo-1, 4 diene and 4-azidobenzalacetophenone-2-sulphonic acid. The polyamides are preferably nylons e.g. homo- or co-polymers of caprolactam, or of the hexamethylene diamine salt of adipic or sebacic acid. The layer can also contain dyes and fillers, may be coated on a plastics or metal support e.g. Al or Al alloy, and may be overcoated with a further photosensitive layer containing an o-quinone diazide which is also rendered alkali soluble on exposure. At least one of the two layers may contain a silane coupling agent to improve adhesion e.g. γ glycidoxypropyltrimethoxysilane or #- (3, 4-epoxycyclohexyl) -ethyl-trimethoxysilane. The alkali developer which removes the exposed areas is an aqueous solution of KOH; NaOH; sodium or potassium silicate or carbonate; or tert-sodium or tert-potassium phosphate. The developer may also contain an organic solvent e.g. o-propyl alcohol and a wetting agent.
GB4110975A 1974-10-09 1975-10-07 Photo sensitive image-forming materials Expired GB1520466A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11690774A JPS5143125A (en) 1974-10-09 1974-10-09 KANKOSEIFUKUSHAZAIRYO

Publications (1)

Publication Number Publication Date
GB1520466A true GB1520466A (en) 1978-08-09

Family

ID=14698583

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4110975A Expired GB1520466A (en) 1974-10-09 1975-10-07 Photo sensitive image-forming materials

Country Status (4)

Country Link
JP (1) JPS5143125A (en)
DE (1) DE2545327A1 (en)
FR (1) FR2287710A1 (en)
GB (1) GB1520466A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154330A (en) * 1984-02-13 1985-09-04 British Telecomm Fabrication of semiconductor devices
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
EP1527873B1 (en) * 2003-10-20 2019-08-21 Arkema France Multilayers of polyamide/polyurethane for decorated articles

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS561044A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154330A (en) * 1984-02-13 1985-09-04 British Telecomm Fabrication of semiconductor devices
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
EP1527873B1 (en) * 2003-10-20 2019-08-21 Arkema France Multilayers of polyamide/polyurethane for decorated articles

Also Published As

Publication number Publication date
FR2287710B1 (en) 1981-07-31
FR2287710A1 (en) 1976-05-07
DE2545327A1 (en) 1976-04-22
JPS5143125A (en) 1976-04-13

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19941007