AT347975B - Lichtempfindliches kopiermaterial - Google Patents

Lichtempfindliches kopiermaterial

Info

Publication number
AT347975B
AT347975B AT793076A AT793076A AT347975B AT 347975 B AT347975 B AT 347975B AT 793076 A AT793076 A AT 793076A AT 793076 A AT793076 A AT 793076A AT 347975 B AT347975 B AT 347975B
Authority
AT
Austria
Prior art keywords
light
copy material
sensitive copy
sensitive
copy
Prior art date
Application number
AT793076A
Other languages
English (en)
Other versions
ATA793076A (de
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ATA793076A publication Critical patent/ATA793076A/de
Application granted granted Critical
Publication of AT347975B publication Critical patent/AT347975B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/54—Diazonium salts or diazo anhydrides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/56—Diazo sulfonates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
AT793076A 1975-10-25 1976-10-25 Lichtempfindliches kopiermaterial AT347975B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2547905A DE2547905C2 (de) 1975-10-25 1975-10-25 Lichtempfindliches Aufzeichnungsmaterial

Publications (2)

Publication Number Publication Date
ATA793076A ATA793076A (de) 1978-06-15
AT347975B true AT347975B (de) 1979-01-25

Family

ID=5960129

Family Applications (1)

Application Number Title Priority Date Filing Date
AT793076A AT347975B (de) 1975-10-25 1976-10-25 Lichtempfindliches kopiermaterial

Country Status (14)

Country Link
US (1) US4594306A (de)
JP (1) JPS6011344B2 (de)
AT (1) AT347975B (de)
AU (1) AU516170B2 (de)
BE (1) BE847585A (de)
BR (1) BR7607084A (de)
CA (1) CA1075066A (de)
DE (1) DE2547905C2 (de)
ES (1) ES452647A1 (de)
FR (1) FR2328985A1 (de)
GB (1) GB1561438A (de)
IT (1) IT1073923B (de)
NL (1) NL186722C (de)
SE (1) SE416245B (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
DE3039926A1 (de) 1980-10-23 1982-05-27 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
JPS57118238A (en) * 1981-01-16 1982-07-23 Konishiroku Photo Ind Co Ltd Positive type photosensitive composition
US4460674A (en) * 1981-01-16 1984-07-17 Konishiroku Photo Industry Co., Ltd. Posi-type quinone diazide photosensitive composition with sensitizer therefor
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS58134631A (ja) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd 感光性組成物
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
JPS60163043A (ja) * 1984-02-06 1985-08-24 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
DE3569703D1 (en) * 1984-01-17 1989-06-01 Fuji Photo Film Co Ltd Presensitized plate having an anodized aluminum base with an improved hydrophilic layer
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
DE3421471A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende 1,2-naphthochinondiazidverbindungen und reproduktionsmaterialien, die diese verbindungen enthalten
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
JPS61141441A (ja) * 1984-12-14 1986-06-28 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
DE3513779A1 (de) * 1985-04-17 1986-10-23 Merck Patent Gmbh, 6100 Darmstadt Stabilisierte loesungen strahlungsvernetzbarer polymervorstufen hochwaermebestaendiger polymere
US4650745A (en) * 1985-06-04 1987-03-17 Philip A. Hunt Chemical Corporation Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development
US4626492A (en) * 1985-06-04 1986-12-02 Olin Hunt Specialty Products, Inc. Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
JPH01501176A (ja) * 1986-10-20 1989-04-20 マクダーミッド，インコーポレーテッド 像反転可能なシステム及びプロセス
JPS63178228A (ja) * 1987-01-20 1988-07-22 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US4818658A (en) * 1987-04-17 1989-04-04 Shipley Company Inc. Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
JPH0814696B2 (ja) * 1987-09-17 1996-02-14 富士写真フイルム株式会社 感光性樹脂組成物
EP0345305A4 (en) * 1987-12-10 1991-10-02 Macdermid Incorporated Image-reversible dry-film photoresists
DE3811040A1 (de) * 1988-03-31 1989-10-19 Ciba Geigy Ag Im nahen uv hochaufloesende positiv-fotoresists
US5219701A (en) * 1988-03-31 1993-06-15 Ciba-Geigy Corporation Positive photoresist containing 1,2-naphthoquinone-diazide-5-sulfonyl tris ester of 1,3,5-trihydroxybenzene and aromatic hydroxy compound sensitizer
US5164279A (en) * 1988-06-06 1992-11-17 Shipley Company Inc. Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol
US4983492A (en) * 1988-06-06 1991-01-08 Shipley Company Inc. Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
WO1990013058A1 (en) * 1989-04-27 1990-11-01 Olin Hunt Specialty Products Inc. Hexahydroxybenzophenone compounds as sensitivity enhancers for radiation sensitive mixtures
US5100768A (en) * 1989-05-09 1992-03-31 Kabushiki Kaisha Toshiba Photosensitive composition
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
KR0184870B1 (ko) * 1990-02-20 1999-04-01 아사구라 다기오 감방사선성 수지 조성물
JPH0450851A (ja) * 1990-06-14 1992-02-19 Sumitomo Chem Co Ltd ポジ型感放射線性レジスト組成物
US5434031A (en) * 1992-11-18 1995-07-18 Tokyo Ohka Kogyo Co., Ltd. Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive
US5635328A (en) * 1993-08-21 1997-06-03 Konica Corporation Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound
DE4401940A1 (de) * 1994-01-24 1995-07-27 Hoechst Ag Positiv arbeitendes Aufzeichnungsmaterial mit verbesserter Entwickelbarkeit
JP2542800B2 (ja) * 1995-05-29 1996-10-09 東京応化工業株式会社 半導体デバイス用レジストパタ―ンの製造方法
US6457413B1 (en) * 2000-05-26 2002-10-01 Agfa-Gevaert Computer-to-plate by ink jet
JP2003119344A (ja) 2001-10-12 2003-04-23 Shin Etsu Chem Co Ltd ハイブリッド化合物、レジスト材料及びパターン形成方法
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
EP2284005B1 (de) 2009-08-10 2012-05-02 Eastman Kodak Company Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78025C (de) * 1951-02-02
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
GB772517A (en) * 1954-02-06 1957-04-17 Kalle & Co Ag Improvements in or relating to photo-mechanical reproduction
NL129161C (de) * 1959-01-14
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
BE593836A (de) * 1959-08-05
NL255348A (de) * 1959-08-29
US3130040A (en) 1960-03-21 1964-04-21 Westinghouse Electric Corp Dendritic seed crystals having a critical spacing between three interior twin planes
NL280959A (de) 1961-07-28
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3827908A (en) * 1972-12-11 1974-08-06 Ibm Method for improving photoresist adherence
JPS49127615A (de) * 1973-04-07 1974-12-06
US4009033A (en) * 1975-09-22 1977-02-22 International Business Machines Corporation High speed positive photoresist composition

Also Published As

Publication number Publication date
ES452647A1 (es) 1983-07-01
NL186722B (nl) 1990-09-03
BE847585A (fr) 1977-04-22
DE2547905C2 (de) 1985-11-21
ATA793076A (de) 1978-06-15
BR7607084A (pt) 1977-09-13
CA1075066A (en) 1980-04-08
JPS5254503A (en) 1977-05-04
DE2547905A1 (de) 1977-04-28
SE416245B (sv) 1980-12-08
FR2328985B1 (de) 1981-06-19
US4594306A (en) 1986-06-10
GB1561438A (en) 1980-02-20
NL7611732A (nl) 1977-04-27
SE7611776L (sv) 1977-04-26
FR2328985A1 (fr) 1977-05-20
NL186722C (nl) 1991-02-01
IT1073923B (it) 1985-04-17
JPS6011344B2 (ja) 1985-03-25
AU1896176A (en) 1978-05-04
AU516170B2 (en) 1981-05-21

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee