DE2543009A1 - Bildaufzeichnungsmaterial und verfahren zum herstellen von bildern unter anwendung desselben - Google Patents

Bildaufzeichnungsmaterial und verfahren zum herstellen von bildern unter anwendung desselben

Info

Publication number
DE2543009A1
DE2543009A1 DE19752543009 DE2543009A DE2543009A1 DE 2543009 A1 DE2543009 A1 DE 2543009A1 DE 19752543009 DE19752543009 DE 19752543009 DE 2543009 A DE2543009 A DE 2543009A DE 2543009 A1 DE2543009 A1 DE 2543009A1
Authority
DE
Germany
Prior art keywords
group
general formula
polyvinyl butyral
parts
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19752543009
Other languages
German (de)
English (en)
Inventor
Saitama Asaka
Eiichi Hasegawa
Chiaki Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2543009A1 publication Critical patent/DE2543009A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
DE19752543009 1974-09-27 1975-09-26 Bildaufzeichnungsmaterial und verfahren zum herstellen von bildern unter anwendung desselben Withdrawn DE2543009A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49111171A JPS5139025A (US06265458-20010724-C00056.png) 1974-09-27 1974-09-27

Publications (1)

Publication Number Publication Date
DE2543009A1 true DE2543009A1 (de) 1976-04-15

Family

ID=14554270

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752543009 Withdrawn DE2543009A1 (de) 1974-09-27 1975-09-26 Bildaufzeichnungsmaterial und verfahren zum herstellen von bildern unter anwendung desselben

Country Status (4)

Country Link
US (1) US4058398A (US06265458-20010724-C00056.png)
JP (1) JPS5139025A (US06265458-20010724-C00056.png)
DE (1) DE2543009A1 (US06265458-20010724-C00056.png)
GB (1) GB1510496A (US06265458-20010724-C00056.png)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928323B2 (ja) * 1976-08-12 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS5928326B2 (ja) * 1976-12-02 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS53120905A (en) * 1977-03-29 1978-10-21 Dainippon Printing Co Ltd Method of producing lithographic printing plate
JPS5391803A (en) * 1977-01-18 1978-08-12 Dainippon Printing Co Ltd Method of producing lithographic printing plate
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
JPS59140446A (ja) * 1983-01-31 1984-08-11 Sekisui Chem Co Ltd 画像形成用材料
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
DE3333450A1 (de) * 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
US5776655A (en) * 1996-03-11 1998-07-07 Eastman Kodak Company Peel-developable lithographic printing plate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5148516B2 (US06265458-20010724-C00056.png) * 1973-02-07 1976-12-21

Also Published As

Publication number Publication date
GB1510496A (en) 1978-05-10
JPS5139025A (US06265458-20010724-C00056.png) 1976-04-01
US4058398A (en) 1977-11-15

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee