DE2433382C2 - Vorrichtung zur Aufdampfung von dünnen Schichten unter Vakuum - Google Patents

Vorrichtung zur Aufdampfung von dünnen Schichten unter Vakuum

Info

Publication number
DE2433382C2
DE2433382C2 DE2433382A DE2433382A DE2433382C2 DE 2433382 C2 DE2433382 C2 DE 2433382C2 DE 2433382 A DE2433382 A DE 2433382A DE 2433382 A DE2433382 A DE 2433382A DE 2433382 C2 DE2433382 C2 DE 2433382C2
Authority
DE
Germany
Prior art keywords
housing
cavity
cylinder
hollow body
under vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2433382A
Other languages
German (de)
English (en)
Other versions
DE2433382A1 (de
Inventor
Jean van Prof. Beersel Cakenberghe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Original Assignee
Compagnie Industrielle de Telecommunication CIT Alcatel SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Compagnie Industrielle de Telecommunication CIT Alcatel SA filed Critical Compagnie Industrielle de Telecommunication CIT Alcatel SA
Publication of DE2433382A1 publication Critical patent/DE2433382A1/de
Application granted granted Critical
Publication of DE2433382C2 publication Critical patent/DE2433382C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE2433382A 1973-07-13 1974-07-11 Vorrichtung zur Aufdampfung von dünnen Schichten unter Vakuum Expired DE2433382C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7325855A FR2236963B1 (enExample) 1973-07-13 1973-07-13

Publications (2)

Publication Number Publication Date
DE2433382A1 DE2433382A1 (de) 1975-01-30
DE2433382C2 true DE2433382C2 (de) 1982-08-19

Family

ID=9122584

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2433382A Expired DE2433382C2 (de) 1973-07-13 1974-07-11 Vorrichtung zur Aufdampfung von dünnen Schichten unter Vakuum

Country Status (9)

Country Link
US (1) US3886896A (enExample)
JP (1) JPS5039288A (enExample)
BE (1) BE816798A (enExample)
CH (1) CH584294A5 (enExample)
DE (1) DE2433382C2 (enExample)
FR (1) FR2236963B1 (enExample)
GB (1) GB1442515A (enExample)
IT (1) IT1016580B (enExample)
NL (1) NL7409415A (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2290126A1 (fr) * 1974-10-31 1976-05-28 Anvar Perfectionnements apportes aux dispositifs d'excitation, par des ondes hf, d'une colonne de gaz enfermee dans une enveloppe
FR2456787A1 (fr) * 1979-05-18 1980-12-12 Thomson Csf Dispositif hyperfrequence pour le depot de films minces sur des solides
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS5863399A (ja) * 1981-10-14 1983-04-15 Nitto Boseki Co Ltd 新規なプラスミン測定用基質
US4466380A (en) * 1983-01-10 1984-08-21 Xerox Corporation Plasma deposition apparatus for photoconductive drums
US5216330A (en) * 1992-01-14 1993-06-01 Honeywell Inc. Ion beam gun
USRE40963E1 (en) * 1993-01-12 2009-11-10 Tokyo Electron Limited Method for plasma processing by shaping an induced electric field
US6136140A (en) * 1993-01-12 2000-10-24 Tokyo Electron Limited Plasma processing apparatus
KR100238627B1 (ko) * 1993-01-12 2000-01-15 히가시 데쓰로 플라즈마 처리장치
JP3553688B2 (ja) * 1995-05-10 2004-08-11 アネルバ株式会社 プラズマ処理装置及びプラズマ処理方法
US5630880A (en) * 1996-03-07 1997-05-20 Eastlund; Bernard J. Method and apparatus for a large volume plasma processor that can utilize any feedstock material
JP2004535595A (ja) * 2001-04-12 2004-11-25 オムニガイド コミュニケーションズ インコーポレイテッド 高屈折率コントラストの光導波路および用途
EP1567893A4 (en) * 2002-11-22 2007-09-19 Omniguide Inc DIELECTRIC WAVEGUIDE AND METHOD FOR PRODUCING THE SAME
CN101233598B (zh) * 2005-05-04 2013-05-01 奥尔利康贸易股份公司（特吕巴赫） 用于等离子体处理设备的等离子体增强器
JP4405973B2 (ja) * 2006-01-17 2010-01-27 キヤノンアネルバ株式会社 薄膜作製装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH417118A (de) * 1961-11-23 1966-07-15 Ciba Geigy Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl
US3264508A (en) * 1962-06-27 1966-08-02 Lai William Plasma torch
GB1160895A (en) * 1965-08-25 1969-08-06 Rank Xerox Ltd Coating Surfaces by Vapour Deposition
US3736175A (en) * 1972-06-02 1973-05-29 Du Pont Vacuum coating method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NICHTS-ERMITTELT

Also Published As

Publication number Publication date
NL7409415A (nl) 1975-01-15
JPS5039288A (enExample) 1975-04-11
FR2236963A1 (enExample) 1975-02-07
FR2236963B1 (enExample) 1977-02-18
CH584294A5 (enExample) 1977-01-31
IT1016580B (it) 1977-06-20
BE816798A (fr) 1974-12-27
GB1442515A (en) 1976-07-14
US3886896A (en) 1975-06-03
DE2433382A1 (de) 1975-01-30

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8339 Ceased/non-payment of the annual fee