DE2426687A1 - Verfahren und vorrichtung fuer vakuumverdampfungsplattierung - Google Patents
Verfahren und vorrichtung fuer vakuumverdampfungsplattierungInfo
- Publication number
- DE2426687A1 DE2426687A1 DE19742426687 DE2426687A DE2426687A1 DE 2426687 A1 DE2426687 A1 DE 2426687A1 DE 19742426687 DE19742426687 DE 19742426687 DE 2426687 A DE2426687 A DE 2426687A DE 2426687 A1 DE2426687 A1 DE 2426687A1
- Authority
- DE
- Germany
- Prior art keywords
- heating
- substance
- evaporator
- evaporated
- heating element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 12
- 238000007738 vacuum evaporation Methods 0.000 title claims description 8
- 238000007747 plating Methods 0.000 title claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 49
- 239000000126 substance Substances 0.000 claims description 33
- 238000001704 evaporation Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 11
- 229910052714 tellurium Inorganic materials 0.000 claims description 11
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 11
- 230000005855 radiation Effects 0.000 claims description 7
- 239000011669 selenium Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 230000005284 excitation Effects 0.000 claims description 2
- 230000008016 vaporization Effects 0.000 claims 2
- 230000004913 activation Effects 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 238000004508 fractional distillation Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 241001465754 Metazoa Species 0.000 description 1
- MMOXZBCLCQITDF-UHFFFAOYSA-N N,N-diethyl-m-toluamide Chemical compound CCN(CC)C(=O)C1=CC=CC(C)=C1 MMOXZBCLCQITDF-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48061799A JPS5234039B2 (enrdf_load_stackoverflow) | 1973-06-04 | 1973-06-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2426687A1 true DE2426687A1 (de) | 1974-12-19 |
Family
ID=13181497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19742426687 Pending DE2426687A1 (de) | 1973-06-04 | 1974-06-01 | Verfahren und vorrichtung fuer vakuumverdampfungsplattierung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3927638A (enrdf_load_stackoverflow) |
| JP (1) | JPS5234039B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2426687A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2232077B1 (enrdf_load_stackoverflow) |
| NL (1) | NL7407523A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0499124A3 (en) * | 1991-02-14 | 1995-01-04 | 4P Verpackungen Ronsberg Gmbh | Line evaporator |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5943873A (ja) * | 1982-09-04 | 1984-03-12 | Konishiroku Photo Ind Co Ltd | 蒸発材料収容器 |
| JPS6286155A (ja) * | 1985-10-11 | 1987-04-20 | Mitsubishi Electric Corp | 溶融物質の蒸気噴出装置 |
| US5182567A (en) * | 1990-10-12 | 1993-01-26 | Custom Metallizing Services, Inc. | Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means |
| JP3508484B2 (ja) * | 1997-07-14 | 2004-03-22 | 松下電器産業株式会社 | 機能性薄膜の形成方法及び形成装置 |
| JP4593008B2 (ja) * | 2001-05-23 | 2010-12-08 | キヤノンアネルバ株式会社 | 蒸着源並びにそれを用いた薄膜形成方法及び形成装置 |
| JP2005029895A (ja) * | 2003-07-04 | 2005-02-03 | Agfa Gevaert Nv | 蒸着装置 |
| US7431807B2 (en) * | 2005-01-07 | 2008-10-07 | Universal Display Corporation | Evaporation method using infrared guiding heater |
| EP1978563A3 (en) * | 2007-03-23 | 2012-10-24 | FUJIFILM Corporation | Radiation detector and method for producing photoconductive layer for recording thereof |
| WO2012029260A1 (ja) * | 2010-09-01 | 2012-03-08 | シャープ株式会社 | 蒸着セル及びこれを備えた真空蒸着装置 |
| EP4396394A1 (en) * | 2021-09-01 | 2024-07-10 | Entegris, Inc. | Vaporizer assembly |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3057282A (en) * | 1959-04-06 | 1962-10-09 | Eastman Kodak Co | Fluid treating device for sheet or strip materials |
| GB1172230A (en) * | 1965-12-16 | 1969-11-26 | Matsushita Electronics Corp | A Method of Manufacturing Semiconductor Device |
| US3634647A (en) * | 1967-07-14 | 1972-01-11 | Ernest Brock Dale Jr | Evaporation of multicomponent alloys |
| US3515852A (en) * | 1967-08-10 | 1970-06-02 | Sylvania Electric Prod | Metal-evaporating source |
| US3655429A (en) * | 1969-04-16 | 1972-04-11 | Westinghouse Electric Corp | Method of forming thin insulating films particularly for piezoelectric transducers |
-
1973
- 1973-06-04 JP JP48061799A patent/JPS5234039B2/ja not_active Expired
-
1974
- 1974-04-11 US US459955A patent/US3927638A/en not_active Expired - Lifetime
- 1974-06-01 DE DE19742426687 patent/DE2426687A1/de active Pending
- 1974-06-04 NL NL7407523A patent/NL7407523A/xx not_active Application Discontinuation
- 1974-06-04 FR FR7419236A patent/FR2232077B1/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0499124A3 (en) * | 1991-02-14 | 1995-01-04 | 4P Verpackungen Ronsberg Gmbh | Line evaporator |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2232077A1 (enrdf_load_stackoverflow) | 1974-12-27 |
| JPS5234039B2 (enrdf_load_stackoverflow) | 1977-09-01 |
| US3927638A (en) | 1975-12-23 |
| JPS5010288A (enrdf_load_stackoverflow) | 1975-02-01 |
| NL7407523A (enrdf_load_stackoverflow) | 1974-12-06 |
| FR2232077B1 (enrdf_load_stackoverflow) | 1977-03-11 |
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