JPS5234039B2 - - Google Patents

Info

Publication number
JPS5234039B2
JPS5234039B2 JP48061799A JP6179973A JPS5234039B2 JP S5234039 B2 JPS5234039 B2 JP S5234039B2 JP 48061799 A JP48061799 A JP 48061799A JP 6179973 A JP6179973 A JP 6179973A JP S5234039 B2 JPS5234039 B2 JP S5234039B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48061799A
Other versions
JPS5010288A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP48061799A priority Critical patent/JPS5234039B2/ja
Priority to US459955A priority patent/US3927638A/en
Priority to DE19742426687 priority patent/DE2426687A1/de
Priority to NL7407523A priority patent/NL7407523A/xx
Priority to FR7419236A priority patent/FR2232077B1/fr
Publication of JPS5010288A publication Critical patent/JPS5010288A/ja
Publication of JPS5234039B2 publication Critical patent/JPS5234039B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP48061799A 1973-06-04 1973-06-04 Expired JPS5234039B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP48061799A JPS5234039B2 (ja) 1973-06-04 1973-06-04
US459955A US3927638A (en) 1973-06-04 1974-04-11 Vacuum evaporation plating apparatus
DE19742426687 DE2426687A1 (de) 1973-06-04 1974-06-01 Verfahren und vorrichtung fuer vakuumverdampfungsplattierung
NL7407523A NL7407523A (ja) 1973-06-04 1974-06-04
FR7419236A FR2232077B1 (ja) 1973-06-04 1974-06-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48061799A JPS5234039B2 (ja) 1973-06-04 1973-06-04

Publications (2)

Publication Number Publication Date
JPS5010288A JPS5010288A (ja) 1975-02-01
JPS5234039B2 true JPS5234039B2 (ja) 1977-09-01

Family

ID=13181497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48061799A Expired JPS5234039B2 (ja) 1973-06-04 1973-06-04

Country Status (5)

Country Link
US (1) US3927638A (ja)
JP (1) JPS5234039B2 (ja)
DE (1) DE2426687A1 (ja)
FR (1) FR2232077B1 (ja)
NL (1) NL7407523A (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943873A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発材料収容器
JPS6286155A (ja) * 1985-10-11 1987-04-20 Mitsubishi Electric Corp 溶融物質の蒸気噴出装置
US5182567A (en) * 1990-10-12 1993-01-26 Custom Metallizing Services, Inc. Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means
DE4104415C1 (ja) * 1991-02-14 1992-06-04 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De
JP3508484B2 (ja) * 1997-07-14 2004-03-22 松下電器産業株式会社 機能性薄膜の形成方法及び形成装置
JP4593008B2 (ja) * 2001-05-23 2010-12-08 キヤノンアネルバ株式会社 蒸着源並びにそれを用いた薄膜形成方法及び形成装置
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
US7431807B2 (en) * 2005-01-07 2008-10-07 Universal Display Corporation Evaporation method using infrared guiding heater
EP1978563A3 (en) * 2007-03-23 2012-10-24 FUJIFILM Corporation Radiation detector and method for producing photoconductive layer for recording thereof
US20130160712A1 (en) * 2010-09-01 2013-06-27 Sharp Kabushiki Kaisha Evaporation cell and vacuum deposition system the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3057282A (en) * 1959-04-06 1962-10-09 Eastman Kodak Co Fluid treating device for sheet or strip materials
US3519479A (en) * 1965-12-16 1970-07-07 Matsushita Electronics Corp Method of manufacturing semiconductor device
US3634647A (en) * 1967-07-14 1972-01-11 Ernest Brock Dale Jr Evaporation of multicomponent alloys
US3515852A (en) * 1967-08-10 1970-06-02 Sylvania Electric Prod Metal-evaporating source
US3655429A (en) * 1969-04-16 1972-04-11 Westinghouse Electric Corp Method of forming thin insulating films particularly for piezoelectric transducers

Also Published As

Publication number Publication date
FR2232077A1 (ja) 1974-12-27
FR2232077B1 (ja) 1977-03-11
JPS5010288A (ja) 1975-02-01
DE2426687A1 (de) 1974-12-19
NL7407523A (ja) 1974-12-06
US3927638A (en) 1975-12-23

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