FR2232077B1 - - Google Patents

Info

Publication number
FR2232077B1
FR2232077B1 FR7419236A FR7419236A FR2232077B1 FR 2232077 B1 FR2232077 B1 FR 2232077B1 FR 7419236 A FR7419236 A FR 7419236A FR 7419236 A FR7419236 A FR 7419236A FR 2232077 B1 FR2232077 B1 FR 2232077B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7419236A
Other languages
French (fr)
Other versions
FR2232077A1 (ja
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Publication of FR2232077A1 publication Critical patent/FR2232077A1/fr
Application granted granted Critical
Publication of FR2232077B1 publication Critical patent/FR2232077B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Photoreceptors In Electrophotography (AREA)
FR7419236A 1973-06-04 1974-06-04 Expired FR2232077B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48061799A JPS5234039B2 (ja) 1973-06-04 1973-06-04

Publications (2)

Publication Number Publication Date
FR2232077A1 FR2232077A1 (ja) 1974-12-27
FR2232077B1 true FR2232077B1 (ja) 1977-03-11

Family

ID=13181497

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7419236A Expired FR2232077B1 (ja) 1973-06-04 1974-06-04

Country Status (5)

Country Link
US (1) US3927638A (ja)
JP (1) JPS5234039B2 (ja)
DE (1) DE2426687A1 (ja)
FR (1) FR2232077B1 (ja)
NL (1) NL7407523A (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943873A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発材料収容器
JPS6286155A (ja) * 1985-10-11 1987-04-20 Mitsubishi Electric Corp 溶融物質の蒸気噴出装置
US5182567A (en) * 1990-10-12 1993-01-26 Custom Metallizing Services, Inc. Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means
DE4104415C1 (ja) * 1991-02-14 1992-06-04 4P Verpackungen Ronsberg Gmbh, 8951 Ronsberg, De
JP3508484B2 (ja) * 1997-07-14 2004-03-22 松下電器産業株式会社 機能性薄膜の形成方法及び形成装置
JP4593008B2 (ja) * 2001-05-23 2010-12-08 キヤノンアネルバ株式会社 蒸着源並びにそれを用いた薄膜形成方法及び形成装置
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
US7431807B2 (en) * 2005-01-07 2008-10-07 Universal Display Corporation Evaporation method using infrared guiding heater
EP1978563A3 (en) * 2007-03-23 2012-10-24 FUJIFILM Corporation Radiation detector and method for producing photoconductive layer for recording thereof
US20130160712A1 (en) * 2010-09-01 2013-06-27 Sharp Kabushiki Kaisha Evaporation cell and vacuum deposition system the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3057282A (en) * 1959-04-06 1962-10-09 Eastman Kodak Co Fluid treating device for sheet or strip materials
GB1172230A (en) * 1965-12-16 1969-11-26 Matsushita Electronics Corp A Method of Manufacturing Semiconductor Device
US3634647A (en) * 1967-07-14 1972-01-11 Ernest Brock Dale Jr Evaporation of multicomponent alloys
US3515852A (en) * 1967-08-10 1970-06-02 Sylvania Electric Prod Metal-evaporating source
US3655429A (en) * 1969-04-16 1972-04-11 Westinghouse Electric Corp Method of forming thin insulating films particularly for piezoelectric transducers

Also Published As

Publication number Publication date
JPS5234039B2 (ja) 1977-09-01
DE2426687A1 (de) 1974-12-19
NL7407523A (ja) 1974-12-06
JPS5010288A (ja) 1975-02-01
US3927638A (en) 1975-12-23
FR2232077A1 (ja) 1974-12-27

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Legal Events

Date Code Title Description
ST Notification of lapse