DE2256025C2 - Wäßriges saures Bad zur galvanischen Abscheidung von Zinn/Blei-Legierungsniederschlägen - Google Patents
Wäßriges saures Bad zur galvanischen Abscheidung von Zinn/Blei-LegierungsniederschlägenInfo
- Publication number
- DE2256025C2 DE2256025C2 DE19722256025 DE2256025A DE2256025C2 DE 2256025 C2 DE2256025 C2 DE 2256025C2 DE 19722256025 DE19722256025 DE 19722256025 DE 2256025 A DE2256025 A DE 2256025A DE 2256025 C2 DE2256025 C2 DE 2256025C2
- Authority
- DE
- Germany
- Prior art keywords
- tin
- bath
- lead
- lead alloy
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims description 29
- 229910000978 Pb alloy Inorganic materials 0.000 title claims description 12
- 229910001128 Sn alloy Inorganic materials 0.000 title claims description 12
- 230000008021 deposition Effects 0.000 title claims description 9
- 239000011260 aqueous acid Substances 0.000 title claims 2
- 229920000570 polyether Polymers 0.000 claims description 14
- -1 tin (II) ions Chemical class 0.000 claims description 12
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 11
- 150000002500 ions Chemical class 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 7
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 5
- 239000004327 boric acid Substances 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 229940125782 compound 2 Drugs 0.000 claims 1
- 239000002244 precipitate Substances 0.000 description 12
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 150000004780 naphthols Chemical class 0.000 description 4
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- LINPIYWFGCPVIE-UHFFFAOYSA-N 2,4,6-trichlorophenol Chemical compound OC1=C(Cl)C=C(Cl)C=C1Cl LINPIYWFGCPVIE-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- DFQICHCWIIJABH-UHFFFAOYSA-N naphthalene-2,7-diol Chemical compound C1=CC(O)=CC2=CC(O)=CC=C21 DFQICHCWIIJABH-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- PPTXVXKCQZKFBN-UHFFFAOYSA-N (S)-(-)-1,1'-Bi-2-naphthol Chemical compound C1=CC=C2C(C3=C4C=CC=CC4=CC=C3O)=C(O)C=CC2=C1 PPTXVXKCQZKFBN-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
- H05K3/3473—Plating of solder
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US21014871A | 1971-12-20 | 1971-12-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2256025A1 DE2256025A1 (de) | 1973-07-05 |
| DE2256025C2 true DE2256025C2 (de) | 1982-03-25 |
Family
ID=22781767
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722256025 Expired DE2256025C2 (de) | 1971-12-20 | 1972-11-15 | Wäßriges saures Bad zur galvanischen Abscheidung von Zinn/Blei-Legierungsniederschlägen |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5729553B2 (enrdf_load_stackoverflow) |
| AU (1) | AU473877B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2256025C2 (enrdf_load_stackoverflow) |
| FR (1) | FR2164591B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1411970A (enrdf_load_stackoverflow) |
| IT (1) | IT970631B (enrdf_load_stackoverflow) |
| NL (1) | NL7217385A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0143919A1 (de) * | 1983-11-02 | 1985-06-12 | Degussa Aktiengesellschaft | Alkalisch-cyanidisches Bad zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3312550C3 (de) * | 1983-04-07 | 1995-04-20 | Hagen Ag Accu Fab Wilhelm | Negative Elektrode für Bleiakkumulatoren und Verfahren zu deren Herstellung |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2734025A (en) * | 1954-02-04 | 1956-02-07 | Twatktnw att | |
| FR1539596A (fr) * | 1967-10-06 | 1968-09-13 | Hyogo Prefectural Government | Procédé de revêtement électrolytique par un alliage brillant étain-plomb et nouveaux produits ainsi obtenus |
| NL134759C (enrdf_load_stackoverflow) * | 1968-10-16 |
-
1972
- 1972-10-30 AU AU48285/72A patent/AU473877B2/en not_active Expired
- 1972-11-15 DE DE19722256025 patent/DE2256025C2/de not_active Expired
- 1972-11-28 FR FR7242195A patent/FR2164591B1/fr not_active Expired
- 1972-12-19 GB GB5862772A patent/GB1411970A/en not_active Expired
- 1972-12-19 IT IT980272A patent/IT970631B/it active
- 1972-12-20 JP JP12808672A patent/JPS5729553B2/ja not_active Expired
- 1972-12-20 NL NL7217385A patent/NL7217385A/xx active Search and Examination
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0143919A1 (de) * | 1983-11-02 | 1985-06-12 | Degussa Aktiengesellschaft | Alkalisch-cyanidisches Bad zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2164591B1 (enrdf_load_stackoverflow) | 1977-01-14 |
| IT970631B (it) | 1974-04-20 |
| JPS4869732A (enrdf_load_stackoverflow) | 1973-09-21 |
| DE2256025A1 (de) | 1973-07-05 |
| JPS5729553B2 (enrdf_load_stackoverflow) | 1982-06-23 |
| GB1411970A (en) | 1975-10-29 |
| NL7217385A (enrdf_load_stackoverflow) | 1973-06-22 |
| AU473877B2 (en) | 1976-07-08 |
| AU4828572A (en) | 1974-05-02 |
| FR2164591A1 (enrdf_load_stackoverflow) | 1973-08-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1621180C3 (de) | Bad zur galvanischen Abscheidung von Gold und Goldlegierungen | |
| DE2256845A1 (de) | Verfahren und zusammensetzung zur galvanischen abscheidung einer zinn/bleilegierung | |
| DE2255584C2 (de) | Saures Kupfergalvanisierbad | |
| DE2255728A1 (de) | Elektrochemische zubereitungen und verfahren | |
| DE1496916B1 (de) | Cyanidfreies,galvanisches Bad und Verfahren zum Abscheiden galvanischer UEberzuege | |
| DE832982C (de) | Elektrolyt und Verfahren zur elektrolytischen Abscheidung von Kupfer | |
| DE2039831B2 (de) | Saures Bad zur galvanischen Abscheidung glänzender Kupferüberzüge | |
| DE2417952A1 (de) | Verfahren zur galvanischen abscheidung von nickel und/oder kobalt | |
| DE2830441A1 (de) | Waessriges bad zur galvanischen abscheidung von zink und dessen verwendung | |
| DE2630980C2 (enrdf_load_stackoverflow) | ||
| DE2231988A1 (de) | Verfahren zur galvanischen abscheidung von zinn | |
| DE2537065C2 (enrdf_load_stackoverflow) | ||
| DE2835539C2 (enrdf_load_stackoverflow) | ||
| DE2256025C2 (de) | Wäßriges saures Bad zur galvanischen Abscheidung von Zinn/Blei-Legierungsniederschlägen | |
| DE3889667T2 (de) | Elektroniederschlag von zinn-wismut-legierungen. | |
| DE2215737C3 (de) | Wäßriges saures galvanisches Halbglanznickelbad | |
| DE2352970A1 (de) | Korrosionsbestaendige metallueberzuege, die galvanisch abgeschiedenes nickel und mikroporoeses chrom enthalten | |
| DE3149043A1 (de) | "bad zur galvanischen abscheidung duenner weisser palladiumueberzuege und verfahren zur herstellung solcher ueberzuege unter verwendung des bades" | |
| DE4032864C2 (enrdf_load_stackoverflow) | ||
| DE2251285C3 (de) | Alkalisches Bad für die galvanische Abscheidung von Goldlegierungen | |
| DE2333096C3 (de) | Galvanisch aufgebrachter mehrschichtiger Metallüberzug und Verfahren zu seiner Herstellung | |
| DE3027982C2 (de) | Wäßriges Bad und Verfahren für die galvanische Abscheidung einer schwarzen Nickelschicht | |
| DE1952218A1 (de) | Verfahren und Mittel zum galvanischen Verzinnen | |
| DE2511119A1 (de) | Zusatzmittel fuer die elektroplattierung | |
| DE2221159B2 (de) | Waessriges alkalisches bad und verfahren zur galvanischen abscheidung von gold-kupfer-cadmium-legierungen |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| 8125 | Change of the main classification |
Ipc: C25D 3/60 |
|
| 8126 | Change of the secondary classification |
Ipc: C25D 3/56 |
|
| D2 | Grant after examination | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: M & T CHEMICALS, INC., WOODBRIDGE, N.J., US |
|
| 8339 | Ceased/non-payment of the annual fee |