DE2244992B2 - Verfahren zum herstellen homogen dotierter zonen in halbleiterbauelementen - Google Patents
Verfahren zum herstellen homogen dotierter zonen in halbleiterbauelementenInfo
- Publication number
- DE2244992B2 DE2244992B2 DE19722244992 DE2244992A DE2244992B2 DE 2244992 B2 DE2244992 B2 DE 2244992B2 DE 19722244992 DE19722244992 DE 19722244992 DE 2244992 A DE2244992 A DE 2244992A DE 2244992 B2 DE2244992 B2 DE 2244992B2
- Authority
- DE
- Germany
- Prior art keywords
- doped
- doping
- semiconductor
- dopant
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 48
- 238000000034 method Methods 0.000 title claims description 31
- 238000009792 diffusion process Methods 0.000 claims description 26
- 235000012431 wafers Nutrition 0.000 claims description 21
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 18
- 229910052717 sulfur Inorganic materials 0.000 claims description 17
- 239000011593 sulfur Substances 0.000 claims description 17
- 239000002019 doping agent Substances 0.000 claims description 15
- 239000012535 impurity Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- 239000000370 acceptor Substances 0.000 claims description 8
- 229910052698 phosphorus Inorganic materials 0.000 claims description 8
- 239000011574 phosphorus Substances 0.000 claims description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 239000003708 ampul Substances 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 230000001681 protective effect Effects 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 239000007858 starting material Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 241000947853 Vibrionales Species 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- REQCZEXYDRLIBE-UHFFFAOYSA-N procainamide Chemical compound CCN(CC)CCNC(=O)C1=CC=C(N)C=C1 REQCZEXYDRLIBE-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/151—Simultaneous diffusion
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/918—Special or nonstandard dopant
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/919—Compensation doping
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Thyristors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722244992 DE2244992B2 (de) | 1972-09-14 | 1972-09-14 | Verfahren zum herstellen homogen dotierter zonen in halbleiterbauelementen |
| GB3423673A GB1445432A (en) | 1972-09-14 | 1973-07-18 | Method of producing homogeneously doped regions in semiconductor components |
| BR6340/73A BR7306340D0 (pt) | 1972-09-14 | 1973-08-17 | Um processo para produzir zonas dotadas homogeneamente de elementos de construcao semicondutores |
| SE7311976A SE387774B (sv) | 1972-09-14 | 1973-09-03 | Forfarande for framstellning av homogent dopade zoner i halvledarkomponenter |
| US00395455A US3856586A (en) | 1972-09-14 | 1973-09-10 | Method for producing homogeneously doped zones in semiconductor devices |
| FR7332820A FR2200622A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-09-14 | 1973-09-12 | |
| JP48103357A JPS5212541B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1972-09-14 | 1973-09-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722244992 DE2244992B2 (de) | 1972-09-14 | 1972-09-14 | Verfahren zum herstellen homogen dotierter zonen in halbleiterbauelementen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2244992A1 DE2244992A1 (de) | 1974-04-04 |
| DE2244992B2 true DE2244992B2 (de) | 1976-02-05 |
Family
ID=5856250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722244992 Granted DE2244992B2 (de) | 1972-09-14 | 1972-09-14 | Verfahren zum herstellen homogen dotierter zonen in halbleiterbauelementen |
Country Status (7)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2610942C2 (de) * | 1976-03-16 | 1983-04-28 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum Herstellen eines Halbleiterbauelements mit in einem Halbleiterkörper monolithisch integrierten Halbleiterelementeinheiten |
| JPS55140437A (en) * | 1979-04-17 | 1980-11-01 | Canon Inc | Sheet feeder |
| US5129965A (en) * | 1990-07-20 | 1992-07-14 | Nippon Steel Corporation | Method of producing grain oriented silicon steel sheets each having a low watt loss and a mirror surface |
| US6838321B2 (en) * | 2002-09-26 | 2005-01-04 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor substrate with defects reduced or removed and method of manufacturing the same, and semiconductor device capable of bidirectionally retaining breakdown voltage and method of manufacturing the same |
| US7592642B1 (en) | 2003-09-25 | 2009-09-22 | T-Ram Semiconductor, Inc. | Thyristor-based semiconductor device with indium-carbon implant and method of fabrication |
| US7195959B1 (en) * | 2004-10-04 | 2007-03-27 | T-Ram Semiconductor, Inc. | Thyristor-based semiconductor device and method of fabrication |
| US9595678B2 (en) * | 2010-07-23 | 2017-03-14 | Basf Se | Dye solar cell with improved stability |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2954308A (en) * | 1956-05-21 | 1960-09-27 | Ibm | Semiconductor impurity diffusion |
| US3476993A (en) * | 1959-09-08 | 1969-11-04 | Gen Electric | Five layer and junction bridging terminal switching device |
| US3573115A (en) * | 1968-04-22 | 1971-03-30 | Int Rectifier Corp | Sealed tube diffusion process |
| US3549434A (en) * | 1968-09-19 | 1970-12-22 | Gen Electric | Low resisitivity group iib-vib compounds and method of formation |
| US3798084A (en) * | 1972-08-11 | 1974-03-19 | Ibm | Simultaneous diffusion processing |
-
1972
- 1972-09-14 DE DE19722244992 patent/DE2244992B2/de active Granted
-
1973
- 1973-07-18 GB GB3423673A patent/GB1445432A/en not_active Expired
- 1973-08-17 BR BR6340/73A patent/BR7306340D0/pt unknown
- 1973-09-03 SE SE7311976A patent/SE387774B/xx unknown
- 1973-09-10 US US00395455A patent/US3856586A/en not_active Expired - Lifetime
- 1973-09-12 FR FR7332820A patent/FR2200622A1/fr not_active Withdrawn
- 1973-09-14 JP JP48103357A patent/JPS5212541B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE387774B (sv) | 1976-09-13 |
| JPS5212541B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1977-04-07 |
| FR2200622A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-04-19 |
| JPS4966276A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-06-27 |
| GB1445432A (en) | 1976-08-11 |
| BR7306340D0 (pt) | 1974-07-11 |
| DE2244992A1 (de) | 1974-04-04 |
| US3856586A (en) | 1974-12-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| E77 | Valid patent as to the heymanns-index 1977 | ||
| EF | Willingness to grant licences | ||
| 8339 | Ceased/non-payment of the annual fee |