DE2230936B2 - - Google Patents

Info

Publication number
DE2230936B2
DE2230936B2 DE2230936A DE2230936A DE2230936B2 DE 2230936 B2 DE2230936 B2 DE 2230936B2 DE 2230936 A DE2230936 A DE 2230936A DE 2230936 A DE2230936 A DE 2230936A DE 2230936 B2 DE2230936 B2 DE 2230936B2
Authority
DE
Germany
Prior art keywords
photosensitive
group
compound
benzopyran
nitro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE2230936A
Other languages
German (de)
English (en)
Other versions
DE2230936C3 (de
DE2230936A1 (de
Inventor
Hisatake Ono
Chiaki Osada
Masato Satomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2230936A1 publication Critical patent/DE2230936A1/de
Publication of DE2230936B2 publication Critical patent/DE2230936B2/de
Application granted granted Critical
Publication of DE2230936C3 publication Critical patent/DE2230936C3/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE2230936A 1971-06-23 1972-06-23 Lichtempfindliches Gemisch Expired DE2230936C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46045382A JPS5018401B1 (pt) 1971-06-23 1971-06-23

Publications (3)

Publication Number Publication Date
DE2230936A1 DE2230936A1 (de) 1973-02-08
DE2230936B2 true DE2230936B2 (pt) 1979-11-22
DE2230936C3 DE2230936C3 (de) 1980-08-14

Family

ID=12717705

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2230936A Expired DE2230936C3 (de) 1971-06-23 1972-06-23 Lichtempfindliches Gemisch

Country Status (5)

Country Link
US (1) US3804628A (pt)
JP (1) JPS5018401B1 (pt)
CA (1) CA962508A (pt)
DE (1) DE2230936C3 (pt)
FR (1) FR2143173B1 (pt)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3909269A (en) * 1972-07-18 1975-09-30 Western Litho Plate & Supply Lithographic plate comprising a light-sensitive polymer
US3923761A (en) * 1972-07-18 1975-12-02 Western Litho Plate & Supply Photopolymers
FR2211673B1 (pt) * 1972-12-22 1976-04-23 Robillard Jean
JPS505032A (pt) * 1972-12-29 1975-01-20
US3947337A (en) * 1973-05-10 1976-03-30 The Upjohn Company α,ω-Diarylpolyene photosensitizers for sulfonylazide polymers
JPS52117985A (en) * 1976-03-30 1977-10-03 Hitachi Chem Co Ltd Photosensitive polymer composition
JPS6022346B2 (ja) * 1976-12-23 1985-06-01 富士通株式会社 フオトマスクのパタ−ン修正方法
US4225661A (en) * 1978-05-10 1980-09-30 The Richardson Company Photoreactive coating compositions and photomechanical plates produced therewith
US4239848A (en) * 1979-02-26 1980-12-16 Eastman Kodak Company Photocrosslinkable carbonyl-containing polymeric composition and element with cobalt complex
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
US20040259975A1 (en) * 2003-06-18 2004-12-23 Robillard Jean J. System and method for forming photobleachable ink compositions

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
GB1278775A (en) * 1968-07-01 1972-06-21 Agfa Gevaert Light-sensitive photographic material
GB1273746A (en) * 1968-10-03 1972-05-10 Agfa Gevaert Unsaturated photochromic monomers and polymers prepared therefrom

Also Published As

Publication number Publication date
JPS5018401B1 (pt) 1975-06-28
DE2230936C3 (de) 1980-08-14
FR2143173B1 (pt) 1978-03-03
US3804628A (en) 1974-04-16
CA962508A (en) 1975-02-11
DE2230936A1 (de) 1973-02-08
FR2143173A1 (pt) 1973-02-02

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8339 Ceased/non-payment of the annual fee