CA962508A - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
CA962508A
CA962508A CA145,353A CA145353A CA962508A CA 962508 A CA962508 A CA 962508A CA 145353 A CA145353 A CA 145353A CA 962508 A CA962508 A CA 962508A
Authority
CA
Canada
Prior art keywords
photosensitive compositions
photosensitive
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA145,353A
Other versions
CA145353S (en
Inventor
Chiaki Osada
Masato Satomura
Hisatake Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of CA962508A publication Critical patent/CA962508A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
CA145,353A 1971-06-23 1972-06-21 Photosensitive compositions Expired CA962508A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46045382A JPS5018401B1 (en) 1971-06-23 1971-06-23

Publications (1)

Publication Number Publication Date
CA962508A true CA962508A (en) 1975-02-11

Family

ID=12717705

Family Applications (1)

Application Number Title Priority Date Filing Date
CA145,353A Expired CA962508A (en) 1971-06-23 1972-06-21 Photosensitive compositions

Country Status (5)

Country Link
US (1) US3804628A (en)
JP (1) JPS5018401B1 (en)
CA (1) CA962508A (en)
DE (1) DE2230936C3 (en)
FR (1) FR2143173B1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3909269A (en) * 1972-07-18 1975-09-30 Western Litho Plate & Supply Lithographic plate comprising a light-sensitive polymer
US3923761A (en) * 1972-07-18 1975-12-02 Western Litho Plate & Supply Photopolymers
FR2211673B1 (en) * 1972-12-22 1976-04-23 Robillard Jean
JPS505032A (en) * 1972-12-29 1975-01-20
US3947337A (en) * 1973-05-10 1976-03-30 The Upjohn Company α,ω-Diarylpolyene photosensitizers for sulfonylazide polymers
JPS52117985A (en) * 1976-03-30 1977-10-03 Hitachi Chem Co Ltd Photosensitive polymer composition
JPS6022346B2 (en) * 1976-12-23 1985-06-01 富士通株式会社 How to modify photomask patterns
US4225661A (en) * 1978-05-10 1980-09-30 The Richardson Company Photoreactive coating compositions and photomechanical plates produced therewith
US4239848A (en) * 1979-02-26 1980-12-16 Eastman Kodak Company Photocrosslinkable carbonyl-containing polymeric composition and element with cobalt complex
JPS5971048A (en) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd Photopolymerizable photosensitive composition
US20040259975A1 (en) * 2003-06-18 2004-12-23 Robillard Jean J. System and method for forming photobleachable ink compositions

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
GB1278775A (en) * 1968-07-01 1972-06-21 Agfa Gevaert Light-sensitive photographic material
GB1273746A (en) * 1968-10-03 1972-05-10 Agfa Gevaert Unsaturated photochromic monomers and polymers prepared therefrom

Also Published As

Publication number Publication date
DE2230936A1 (en) 1973-02-08
JPS5018401B1 (en) 1975-06-28
DE2230936B2 (en) 1979-11-22
FR2143173A1 (en) 1973-02-02
DE2230936C3 (en) 1980-08-14
FR2143173B1 (en) 1978-03-03
US3804628A (en) 1974-04-16

Similar Documents

Publication Publication Date Title
CA999466A (en) Developer composition
CA983855A (en) Hygienic-cosmetic compositions
CA979270A (en) Light-sensitive copying composition
CA984210A (en) Photopolymerisable composition
CA956166A (en) Photosensitive compositions for relief structures
AU4228872A (en) Photosensitive compositions
CA976289A (en) Zwitterion-containing compositions
AU451514B2 (en) Photosensitive compositions
AU463173B2 (en) Reodorant compositions
CA978790A (en) Imaging compositions
CA962508A (en) Photosensitive compositions
CA977897A (en) Photosensitive composition
CA988353A (en) Photoresist compositions
CA999467A (en) Photographic developer compositions
JPS5494024A (en) Photosensitive composition
AU4295872A (en) Compositions
CA958273A (en) Photosensitive composition
CA993252A (en) Solvent-developed type photosensitive composition
CA993135A (en) Reflex-reflecting compositions
CA978013A (en) Positive-acting photosensitive composition
CA875503A (en) Photosensitive compositions
CA981100A (en) Photosensitive composition
AU469775B2 (en) Photopolymerisable composition
AU463655B2 (en) Photopolymerisable composition
CA881440A (en) Photosensitive elements containing novel photo-oxidants