CA958273A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
CA958273A
CA958273A CA144,506A CA144506A CA958273A CA 958273 A CA958273 A CA 958273A CA 144506 A CA144506 A CA 144506A CA 958273 A CA958273 A CA 958273A
Authority
CA
Canada
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA144,506A
Other versions
CA144506S (en
Inventor
Hisatake Ono
Masato Satomura
Chiaki Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of CA958273A publication Critical patent/CA958273A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
CA144,506A 1971-06-15 1972-06-13 Photosensitive composition Expired CA958273A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4274871A JPS51481B1 (en) 1971-06-15 1971-06-15

Publications (1)

Publication Number Publication Date
CA958273A true CA958273A (en) 1974-11-26

Family

ID=12644621

Family Applications (1)

Application Number Title Priority Date Filing Date
CA144,506A Expired CA958273A (en) 1971-06-15 1972-06-13 Photosensitive composition

Country Status (5)

Country Link
JP (1) JPS51481B1 (en)
CA (1) CA958273A (en)
DE (1) DE2229302A1 (en)
FR (1) FR2141902A1 (en)
GB (1) GB1392076A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2549303B2 (en) * 1988-09-21 1996-10-30 富士写真フイルム株式会社 Photosensitive composition
US7271283B2 (en) * 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom
CN101613276B (en) * 2009-06-23 2012-12-26 苏州苏大欧罗新材料科技有限公司 Color photoresist for color filter

Also Published As

Publication number Publication date
GB1392076A (en) 1975-04-23
JPS51481B1 (en) 1976-01-08
DE2229302A1 (en) 1973-01-11
FR2141902A1 (en) 1973-01-26

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