JPS5018401B1 - - Google Patents

Info

Publication number
JPS5018401B1
JPS5018401B1 JP46045382A JP4538271A JPS5018401B1 JP S5018401 B1 JPS5018401 B1 JP S5018401B1 JP 46045382 A JP46045382 A JP 46045382A JP 4538271 A JP4538271 A JP 4538271A JP S5018401 B1 JPS5018401 B1 JP S5018401B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46045382A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46045382A priority Critical patent/JPS5018401B1/ja
Priority to FR7222326A priority patent/FR2143173B1/fr
Priority to CA145,353A priority patent/CA962508A/en
Priority to DE2230936A priority patent/DE2230936C3/de
Priority to US00265888A priority patent/US3804628A/en
Publication of JPS5018401B1 publication Critical patent/JPS5018401B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/685—Compositions containing spiro-condensed pyran compounds or derivatives thereof, as photosensitive substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP46045382A 1971-06-23 1971-06-23 Pending JPS5018401B1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP46045382A JPS5018401B1 (ja) 1971-06-23 1971-06-23
FR7222326A FR2143173B1 (ja) 1971-06-23 1972-06-21
CA145,353A CA962508A (en) 1971-06-23 1972-06-21 Photosensitive compositions
DE2230936A DE2230936C3 (de) 1971-06-23 1972-06-23 Lichtempfindliches Gemisch
US00265888A US3804628A (en) 1971-06-23 1972-06-23 Photosensitive compositions comprising a photosensitive polymer and a photochromic compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46045382A JPS5018401B1 (ja) 1971-06-23 1971-06-23

Publications (1)

Publication Number Publication Date
JPS5018401B1 true JPS5018401B1 (ja) 1975-06-28

Family

ID=12717705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46045382A Pending JPS5018401B1 (ja) 1971-06-23 1971-06-23

Country Status (5)

Country Link
US (1) US3804628A (ja)
JP (1) JPS5018401B1 (ja)
CA (1) CA962508A (ja)
DE (1) DE2230936C3 (ja)
FR (1) FR2143173B1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3923761A (en) * 1972-07-18 1975-12-02 Western Litho Plate & Supply Photopolymers
US3909269A (en) * 1972-07-18 1975-09-30 Western Litho Plate & Supply Lithographic plate comprising a light-sensitive polymer
FR2211673B1 (ja) * 1972-12-22 1976-04-23 Robillard Jean
JPS505032A (ja) * 1972-12-29 1975-01-20
US3947337A (en) * 1973-05-10 1976-03-30 The Upjohn Company α,ω-Diarylpolyene photosensitizers for sulfonylazide polymers
JPS52117985A (en) * 1976-03-30 1977-10-03 Hitachi Chem Co Ltd Photosensitive polymer composition
JPS6022346B2 (ja) * 1976-12-23 1985-06-01 富士通株式会社 フオトマスクのパタ−ン修正方法
US4225661A (en) * 1978-05-10 1980-09-30 The Richardson Company Photoreactive coating compositions and photomechanical plates produced therewith
US4239848A (en) * 1979-02-26 1980-12-16 Eastman Kodak Company Photocrosslinkable carbonyl-containing polymeric composition and element with cobalt complex
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
US20040259975A1 (en) * 2003-06-18 2004-12-23 Robillard Jean J. System and method for forming photobleachable ink compositions

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3357831A (en) * 1965-06-21 1967-12-12 Harris Intertype Corp Photopolymer
GB1278775A (en) * 1968-07-01 1972-06-21 Agfa Gevaert Light-sensitive photographic material
GB1273746A (en) * 1968-10-03 1972-05-10 Agfa Gevaert Unsaturated photochromic monomers and polymers prepared therefrom

Also Published As

Publication number Publication date
US3804628A (en) 1974-04-16
FR2143173B1 (ja) 1978-03-03
CA962508A (en) 1975-02-11
DE2230936B2 (ja) 1979-11-22
DE2230936C3 (de) 1980-08-14
FR2143173A1 (ja) 1973-02-02
DE2230936A1 (de) 1973-02-08

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