DE2221600A1 - Vorrichtung zum beschichten von substraten durch kathodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaess - Google Patents
Vorrichtung zum beschichten von substraten durch kathodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaessInfo
- Publication number
- DE2221600A1 DE2221600A1 DE19722221600 DE2221600A DE2221600A1 DE 2221600 A1 DE2221600 A1 DE 2221600A1 DE 19722221600 DE19722221600 DE 19722221600 DE 2221600 A DE2221600 A DE 2221600A DE 2221600 A1 DE2221600 A1 DE 2221600A1
- Authority
- DE
- Germany
- Prior art keywords
- electrodes
- substrate
- target
- electrode
- vacuum vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims description 94
- 238000000576 coating method Methods 0.000 title claims description 16
- 239000011248 coating agent Substances 0.000 title claims description 15
- 238000004140 cleaning Methods 0.000 title claims description 10
- 239000013077 target material Substances 0.000 claims description 13
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 238000000889 atomisation Methods 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 7
- 238000000992 sputter etching Methods 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 3
- 210000002381 plasma Anatomy 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000002826 coolant Substances 0.000 description 3
- 241000656145 Thyrsites atun Species 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD15697371 | 1971-08-04 | ||
| GB1611472A GB1391842A (en) | 1971-08-04 | 1972-04-07 | Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2221600A1 true DE2221600A1 (de) | 1973-02-15 |
Family
ID=25747417
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722221600 Pending DE2221600A1 (de) | 1971-08-04 | 1972-05-03 | Vorrichtung zum beschichten von substraten durch kathodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaess |
Country Status (4)
| Country | Link |
|---|---|
| CH (1) | CH553259A (enExample) |
| DE (1) | DE2221600A1 (enExample) |
| FR (1) | FR2148245B1 (enExample) |
| GB (1) | GB1391842A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2920633A1 (de) * | 1978-05-30 | 1979-12-13 | Itt Ind Gmbh Deutsche | Stromloses oberflaechenbehandlungs- und beschichtungsverfahren |
| DE3041551A1 (de) * | 1980-11-04 | 1982-06-09 | Siemens AG, 1000 Berlin und 8000 München | Elektroden fuer plasma-aetzanlage |
| DE3306738A1 (de) * | 1983-02-25 | 1984-08-30 | Berna AG Olten, Olten | Vorrichtung und verfahren zur beschichtung von substraten mittels glimmentladung, sowie deren anwendung |
| KR20190016111A (ko) * | 2016-07-12 | 2019-02-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 스퍼터 증착 소스, 스퍼터 증착 장치 및 스퍼터 증착 소스를 동작시키는 방법 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2371777A1 (fr) * | 1976-11-18 | 1978-06-16 | Loic Henry | Procede de fabrication d'une barriere de diffusion en nitrure de silicium sur un substrat de semiconducteur, en particulier du type iii-v |
| US4194962A (en) * | 1978-12-20 | 1980-03-25 | Advanced Coating Technology, Inc. | Cathode for sputtering |
| DD153497A3 (de) * | 1980-02-08 | 1982-01-13 | Georg Rudakoff | Verfahren und vorrichtung zum plasmaaetzen oder zur plasma cvd |
| DE3404880A1 (de) * | 1984-02-11 | 1985-08-14 | Glyco-Metall-Werke Daelen & Loos Gmbh, 6200 Wiesbaden | Verfahren zum herstellen von schichtwerkstoff oder schichtwerkstuecken |
| DE19853943B4 (de) * | 1997-11-26 | 2006-04-20 | Vapor Technologies, Inc. (Delaware Corporation), Longmont | Katode zur Zerstäubung oder Bogenaufdampfung sowie Vorrichtung zur Beschichtung oder Ionenimplantation mit einer solchen Katode |
| US9175383B2 (en) | 2008-01-16 | 2015-11-03 | Applied Materials, Inc. | Double-coating device with one process chamber |
| EP2081212B1 (en) * | 2008-01-16 | 2016-03-23 | Applied Materials, Inc. | Double-Coating Device with one Process Chamber |
| GB202119151D0 (en) * | 2021-12-31 | 2022-02-16 | Spts Technologies Ltd | Method of operating a pvd apparatus |
-
1972
- 1972-04-07 GB GB1611472A patent/GB1391842A/en not_active Expired
- 1972-05-03 DE DE19722221600 patent/DE2221600A1/de active Pending
- 1972-06-08 CH CH853472A patent/CH553259A/xx not_active IP Right Cessation
- 1972-08-03 FR FR7228084A patent/FR2148245B1/fr not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2920633A1 (de) * | 1978-05-30 | 1979-12-13 | Itt Ind Gmbh Deutsche | Stromloses oberflaechenbehandlungs- und beschichtungsverfahren |
| DE3041551A1 (de) * | 1980-11-04 | 1982-06-09 | Siemens AG, 1000 Berlin und 8000 München | Elektroden fuer plasma-aetzanlage |
| DE3306738A1 (de) * | 1983-02-25 | 1984-08-30 | Berna AG Olten, Olten | Vorrichtung und verfahren zur beschichtung von substraten mittels glimmentladung, sowie deren anwendung |
| KR20190016111A (ko) * | 2016-07-12 | 2019-02-15 | 어플라이드 머티어리얼스, 인코포레이티드 | 스퍼터 증착 소스, 스퍼터 증착 장치 및 스퍼터 증착 소스를 동작시키는 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1391842A (en) | 1975-04-23 |
| CH553259A (de) | 1974-08-30 |
| FR2148245B1 (enExample) | 1976-05-14 |
| FR2148245A1 (enExample) | 1973-03-11 |
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