DE2153781C3 - Lichtvernetzbares Gemisch - Google Patents

Lichtvernetzbares Gemisch

Info

Publication number
DE2153781C3
DE2153781C3 DE2153781A DE2153781A DE2153781C3 DE 2153781 C3 DE2153781 C3 DE 2153781C3 DE 2153781 A DE2153781 A DE 2153781A DE 2153781 A DE2153781 A DE 2153781A DE 2153781 C3 DE2153781 C3 DE 2153781C3
Authority
DE
Germany
Prior art keywords
crosslinkable
light
photo
photosensitive component
cyclized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2153781A
Other languages
German (de)
English (en)
Other versions
DE2153781A1 (de
DE2153781B2 (de
Inventor
Michael Wilford South Burlington Vt. MacIntyre
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2153781A1 publication Critical patent/DE2153781A1/de
Publication of DE2153781B2 publication Critical patent/DE2153781B2/de
Application granted granted Critical
Publication of DE2153781C3 publication Critical patent/DE2153781C3/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/27—Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds
    • C08K5/28—Azides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE2153781A 1970-10-28 1971-10-28 Lichtvernetzbares Gemisch Expired DE2153781C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8483370A 1970-10-28 1970-10-28

Publications (3)

Publication Number Publication Date
DE2153781A1 DE2153781A1 (de) 1972-05-04
DE2153781B2 DE2153781B2 (de) 1981-06-25
DE2153781C3 true DE2153781C3 (de) 1982-03-25

Family

ID=22187498

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2153781A Expired DE2153781C3 (de) 1970-10-28 1971-10-28 Lichtvernetzbares Gemisch

Country Status (5)

Country Link
US (1) US3669669A (https=)
JP (1) JPS5240241B1 (https=)
DE (1) DE2153781C3 (https=)
FR (1) FR2109786A5 (https=)
GB (1) GB1374607A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3948667A (en) * 1971-06-21 1976-04-06 Japan Synthetic Rubber Company Limited Photosensitive compositions
JPS57171331A (en) * 1981-04-10 1982-10-21 Hunt Chem Corp Philip A Composition of negative photo-resist forming cyclic rubber film

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition

Also Published As

Publication number Publication date
DE2153781A1 (de) 1972-05-04
US3669669A (en) 1972-06-13
DE2153781B2 (de) 1981-06-25
GB1374607A (en) 1974-11-20
JPS5240241B1 (https=) 1977-10-11
FR2109786A5 (https=) 1972-05-26

Similar Documents

Publication Publication Date Title
DE69013945T2 (de) Photographische Bildaufzeichnungszusammensetzung.
DE2655455C2 (de) Verfahren zum Herstellen einer Maske und Lackstruktur zur Verwendung bei dem Verfahren
EP0164620B1 (de) Positiv-arbeitende strahlungsempfindliche Beschichtungslösung
DE3788440T2 (de) Lichtabsorbierende Beschichtung.
EP0019770B1 (de) Positiv arbeitendes Schichtübertragungsmittel
DE69126586T2 (de) Verfahren zur Herstellung einer Vorrichtung
DE3382699T2 (de) Verfahren zur Bildkontrasterhöhung und Materialien dazu.
EP0019122B1 (de) Verfahren zur phototechnischen Herstellung von Reliefstrukturen
DE2641624C3 (de) Verfahren zur Herstellung eines positiven Resistbildes unter Anwendung von Elektronenstrahlen
EP0388482B1 (de) Lichtempfindliches Gemisch
DE2950212A1 (de) Negative tiefultraviolette abdeckung und verfahren zum herstellen eines abdeckungsmusters
DE2927838A1 (de) Verfahren zur ausbildung eines negativen resistmusters
DE68913082T2 (de) Lichtempfindliche, semi-wässrig entwickelbare, keramische Beschichtungszusammensetzung.
DE1797255A1 (de) Verfahren zum Verhindern des Schaeumens bei der Herstellung von Photoresistmustern
DE69021119T2 (de) Bildherstellungsverfahren mittels einer elektrisch leitfähigen Zusammensetzung.
DE69030836T2 (de) Material und Verfahren zur Herstellung von Mikromustern
DE3808927A1 (de) Negativ-fotoresists von polyimid-typ mit 1,2-disulfonen
DE3337315A1 (de) Zweifach-lichtempfindliche zusammensetzungen und verfahren zur erzeugung bildmustergemaesser photoresistschichten
DE2153781C3 (de) Lichtvernetzbares Gemisch
DE2151068A1 (de) Photolackzusammensetzung
DE2203732A1 (de) Lichtempfindliche mischpolymerisate und diese enthaltende kopiermassen
DE3443400A1 (de) Verfahren zur erzeugung eines bildes
DE3685766T2 (de) Photolackbildherstellungsverfahren.
EP0226741B1 (de) Verfahren zur Herstellung eines positiv arbeitenden Photoresists
DE2536300A1 (de) Verfahren zur herstellung eines resistbildes

Legal Events

Date Code Title Description
OD Request for examination
C3 Grant after two publication steps (3rd publication)
8339 Ceased/non-payment of the annual fee