DE2134457C2 - Wäßriges galvanisches Bad für die Abscheidung von Nickel und/oder Kobalt - Google Patents
Wäßriges galvanisches Bad für die Abscheidung von Nickel und/oder KobaltInfo
- Publication number
- DE2134457C2 DE2134457C2 DE2134457A DE2134457A DE2134457C2 DE 2134457 C2 DE2134457 C2 DE 2134457C2 DE 2134457 A DE2134457 A DE 2134457A DE 2134457 A DE2134457 A DE 2134457A DE 2134457 C2 DE2134457 C2 DE 2134457C2
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- bath
- sodium
- cobalt
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title description 56
- 229910052759 nickel Inorganic materials 0.000 title description 27
- 239000010941 cobalt Substances 0.000 title description 23
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 title description 23
- 229910017052 cobalt Inorganic materials 0.000 title description 22
- 230000008021 deposition Effects 0.000 title description 20
- 238000009713 electroplating Methods 0.000 title description 10
- -1 hydroxysulfonate compound Chemical class 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 230000001153 anti-wrinkle effect Effects 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 2
- 239000000337 buffer salt Substances 0.000 claims description 2
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 2
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 2
- 229910001453 nickel ion Inorganic materials 0.000 claims description 2
- 239000000654 additive Substances 0.000 description 29
- 239000011701 zinc Substances 0.000 description 20
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 19
- 238000000151 deposition Methods 0.000 description 19
- 229910052725 zinc Inorganic materials 0.000 description 18
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 15
- 239000000203 mixture Substances 0.000 description 12
- UOULCEYHQNCFFH-UHFFFAOYSA-M sodium;hydroxymethanesulfonate Chemical compound [Na+].OCS([O-])(=O)=O UOULCEYHQNCFFH-UHFFFAOYSA-M 0.000 description 11
- 229910001369 Brass Inorganic materials 0.000 description 9
- 238000007792 addition Methods 0.000 description 9
- 239000010951 brass Substances 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000004070 electrodeposition Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 6
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 241000080590 Niso Species 0.000 description 5
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- LLMXFMUOEUKUON-UHFFFAOYSA-L disodium;1-hydroxypropane-1,3-disulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C(O)CCS([O-])(=O)=O LLMXFMUOEUKUON-UHFFFAOYSA-L 0.000 description 5
- PEDCQBHIVMGVHV-UHFFFAOYSA-N glycerol Substances OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 5
- 239000004615 ingredient Substances 0.000 description 5
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 4
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000002932 luster Substances 0.000 description 4
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 3
- CHLCPTJLUJHDBO-UHFFFAOYSA-M sodium;benzenesulfinate Chemical compound [Na+].[O-]S(=O)C1=CC=CC=C1 CHLCPTJLUJHDBO-UHFFFAOYSA-M 0.000 description 3
- YUCTUWYCFFUCOR-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC YUCTUWYCFFUCOR-UHFFFAOYSA-N 0.000 description 2
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 241001676573 Minium Species 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- IMLUMMDFXRZWGY-UHFFFAOYSA-L disodium 2-hydroxy-2-sulfoacetate Chemical compound [Na+].[Na+].[O-]C(=O)C(O)S(O)(=O)=O.[O-]C(=O)C(O)S(O)(=O)=O IMLUMMDFXRZWGY-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229940035423 ethyl ether Drugs 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 2
- 229940081974 saccharin Drugs 0.000 description 2
- 235000019204 saccharin Nutrition 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 2
- 239000013589 supplement Substances 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 2
- 229910000368 zinc sulfate Inorganic materials 0.000 description 2
- 229960001763 zinc sulfate Drugs 0.000 description 2
- SPKKUSPQPHBCEZ-UHFFFAOYSA-M 2,4,6-trimethyl-1-prop-2-ynylpyridin-1-ium;bromide Chemical compound [Br-].CC1=CC(C)=[N+](CC#C)C(C)=C1 SPKKUSPQPHBCEZ-UHFFFAOYSA-M 0.000 description 1
- XNMQEEKYCVKGBD-UHFFFAOYSA-N 2-butyne Chemical compound CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 1
- GDMJHPRLSACEJC-UHFFFAOYSA-M 2-methyl-1-prop-2-enylquinolin-1-ium;bromide Chemical compound [Br-].C1=CC=CC2=[N+](CC=C)C(C)=CC=C21 GDMJHPRLSACEJC-UHFFFAOYSA-M 0.000 description 1
- NDVLTZFQVDXFAN-UHFFFAOYSA-N 3-(2-cyanoethylsulfanyl)propanenitrile Chemical compound N#CCCSCCC#N NDVLTZFQVDXFAN-UHFFFAOYSA-N 0.000 description 1
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 1
- XLHVGHOFZSWBQJ-UHFFFAOYSA-L B(O)(O)O.S(=O)(=O)([O-])[O-].[Ni+2] Chemical compound B(O)(O)O.S(=O)(=O)([O-])[O-].[Ni+2] XLHVGHOFZSWBQJ-UHFFFAOYSA-L 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241000530268 Lycaena heteronea Species 0.000 description 1
- 229910001229 Pot metal Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- XMXZJUHGOGNHMO-UHFFFAOYSA-N [Na].C(C#CCO)O Chemical compound [Na].C(C#CCO)O XMXZJUHGOGNHMO-UHFFFAOYSA-N 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- VHRZTXBWRMMPMP-UHFFFAOYSA-J boric acid dichloronickel nickel(2+) disulfamate Chemical compound B(O)(O)O.[Ni](Cl)Cl.S(N)([O-])(=O)=O.[Ni+2].S(N)([O-])(=O)=O VHRZTXBWRMMPMP-UHFFFAOYSA-J 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- OVQABVAKPIYHIG-UHFFFAOYSA-N n-(benzenesulfonyl)benzenesulfonamide Chemical compound C=1C=CC=CC=1S(=O)(=O)NS(=O)(=O)C1=CC=CC=C1 OVQABVAKPIYHIG-UHFFFAOYSA-N 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- UNYWISZSMFIKJI-UHFFFAOYSA-N prop-2-ene-1-sulfonamide Chemical compound NS(=O)(=O)CC=C UNYWISZSMFIKJI-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- SOUHUMACVWVDME-UHFFFAOYSA-N safranin O Chemical compound [Cl-].C12=CC(N)=CC=C2N=C2C=CC(N)=CC2=[N+]1C1=CC=CC=C1 SOUHUMACVWVDME-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000001612 separation test Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- YSJZWXFVNXMVCR-UHFFFAOYSA-M sodium;3-chlorobut-2-ene-1-sulfonate Chemical compound [Na+].CC(Cl)=CCS([O-])(=O)=O YSJZWXFVNXMVCR-UHFFFAOYSA-M 0.000 description 1
- LDHXNOAOCJXPAH-UHFFFAOYSA-M sodium;prop-2-yne-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC#C LDHXNOAOCJXPAH-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- NVBFHJWHLNUMCV-UHFFFAOYSA-N sulfamide Chemical compound NS(N)(=O)=O NVBFHJWHLNUMCV-UHFFFAOYSA-N 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- NJPKYOIXTSGVAN-UHFFFAOYSA-K trisodium;naphthalene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 NJPKYOIXTSGVAN-UHFFFAOYSA-K 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5595970A | 1970-07-17 | 1970-07-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2134457A1 DE2134457A1 (de) | 1972-01-20 |
| DE2134457C2 true DE2134457C2 (de) | 1982-06-03 |
Family
ID=22001238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2134457A Expired DE2134457C2 (de) | 1970-07-17 | 1971-07-09 | Wäßriges galvanisches Bad für die Abscheidung von Nickel und/oder Kobalt |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US3697391A (OSRAM) |
| JP (1) | JPS564635B1 (OSRAM) |
| BE (1) | BE769960A (OSRAM) |
| BR (1) | BR7104498D0 (OSRAM) |
| CA (1) | CA995619A (OSRAM) |
| CH (1) | CH557887A (OSRAM) |
| DE (1) | DE2134457C2 (OSRAM) |
| FR (1) | FR2099425B1 (OSRAM) |
| GB (2) | GB1366713A (OSRAM) |
| NL (1) | NL7109852A (OSRAM) |
| SE (1) | SE7408254L (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
| DE10222962A1 (de) * | 2002-05-23 | 2003-12-11 | Atotech Deutschland Gmbh | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3969399A (en) * | 1970-07-17 | 1976-07-13 | M & T Chemicals Inc. | Electroplating processes and compositions |
| US3905776A (en) * | 1973-07-05 | 1975-09-16 | Nico Magnetics Inc | Method of making a thin, ferro-magnetic memory layer and article made thereby |
| US3878123A (en) * | 1973-10-10 | 1975-04-15 | Us Agriculture | Odor free hydroxymethanesulfonic acid |
| US3922209A (en) * | 1974-08-20 | 1975-11-25 | M & T Chemicals Inc | Electrode position of alloys of nickel, cobalt or nickel and cobalt with iron and electrolytes therefor |
| DE2943028A1 (de) * | 1978-11-01 | 1980-05-08 | M & T Chemicals Inc | Galvanisches nickelbad |
| US4252619A (en) * | 1979-10-24 | 1981-02-24 | Oxy Metal Industries Corporation | Brightener for zinc electroplating solutions and process |
| DK422181A (da) * | 1980-10-23 | 1982-04-24 | Hooker Chemicals Plastics Corp | Bad og fremgangsmaade til hoejhastigheds-nikkelelektroplettering |
| US4430171A (en) | 1981-08-24 | 1984-02-07 | M&T Chemicals Inc. | Electroplating baths for nickel, iron, cobalt and alloys thereof |
| DE3726518A1 (de) * | 1987-08-10 | 1989-03-09 | Hille & Mueller | Kaltband mit elektrolytisch aufgebrachter nickelbeschichtung hoher diffusionstiefe und verfahren zur herstellung des kaltbandes |
| US5049286A (en) * | 1989-12-22 | 1991-09-17 | Omi International Corporation | Process for purification of nickel plating baths |
| US20050173255A1 (en) * | 2004-02-05 | 2005-08-11 | George Bokisa | Electroplated quaternary alloys |
| US20050173254A1 (en) * | 2004-02-05 | 2005-08-11 | George Bokisa | Nickel cobalt boron ternary alloys |
| JP2007262430A (ja) * | 2006-03-27 | 2007-10-11 | C Uyemura & Co Ltd | 電気めっき方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3506548A (en) * | 1966-09-23 | 1970-04-14 | Allied Res Prod Inc | Electrodeposition of nickel |
-
1970
- 1970-07-17 US US55959A patent/US3697391A/en not_active Expired - Lifetime
-
1971
- 1971-07-01 GB GB3088271A patent/GB1366713A/en not_active Expired
- 1971-07-01 GB GB5916273A patent/GB1366714A/en not_active Expired
- 1971-07-09 DE DE2134457A patent/DE2134457C2/de not_active Expired
- 1971-07-12 FR FR7125503A patent/FR2099425B1/fr not_active Expired
- 1971-07-13 CA CA118,051A patent/CA995619A/en not_active Expired
- 1971-07-13 CH CH1031771A patent/CH557887A/xx not_active IP Right Cessation
- 1971-07-13 BE BE769960A patent/BE769960A/xx unknown
- 1971-07-13 JP JP5204071A patent/JPS564635B1/ja active Pending
- 1971-07-15 BR BR4498/71A patent/BR7104498D0/pt unknown
- 1971-07-16 NL NL7109852A patent/NL7109852A/xx not_active Application Discontinuation
-
1974
- 1974-06-24 SE SE7408254A patent/SE7408254L/xx unknown
Non-Patent Citations (1)
| Title |
|---|
| NICHTS-ERMITTELT |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
| US6919014B2 (en) | 2000-05-19 | 2005-07-19 | Atotech Deutschland Gmbh | Satin-finished nickel or nickel alloy coating |
| DE10222962A1 (de) * | 2002-05-23 | 2003-12-11 | Atotech Deutschland Gmbh | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
| US7361262B2 (en) | 2002-05-23 | 2008-04-22 | Atotech Deutschland Gmbh | Acid plating bath and method for the electrolytic deposition of satin nickel deposits |
Also Published As
| Publication number | Publication date |
|---|---|
| BE769960A (fr) | |
| BR7104498D0 (pt) | 1973-07-10 |
| FR2099425B1 (OSRAM) | 1977-01-21 |
| GB1366713A (en) | 1974-09-11 |
| JPS564635B1 (OSRAM) | 1981-01-31 |
| FR2099425A1 (OSRAM) | 1972-03-17 |
| NL7109852A (OSRAM) | 1972-01-19 |
| US3697391A (en) | 1972-10-10 |
| SE7408254L (OSRAM) | 1974-06-24 |
| CH557887A (de) | 1975-01-15 |
| DE2134457A1 (de) | 1972-01-20 |
| GB1366714A (en) | 1974-09-11 |
| CA995619A (en) | 1976-08-24 |
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Legal Events
| Date | Code | Title | Description |
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| OD | Request for examination | ||
| D2 | Grant after examination | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: M & T CHEMICALS, INC., WOODBRIDGE, N.J., US |
|
| 8339 | Ceased/non-payment of the annual fee |