DE2118075A1 - Verfahren zur Herstellung einer Fotomaske - Google Patents

Verfahren zur Herstellung einer Fotomaske

Info

Publication number
DE2118075A1
DE2118075A1 DE19712118075 DE2118075A DE2118075A1 DE 2118075 A1 DE2118075 A1 DE 2118075A1 DE 19712118075 DE19712118075 DE 19712118075 DE 2118075 A DE2118075 A DE 2118075A DE 2118075 A1 DE2118075 A1 DE 2118075A1
Authority
DE
Germany
Prior art keywords
iron
photomask
iron oxide
precipitation
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712118075
Other languages
German (de)
English (en)
Inventor
John Burnette Mac Stirling; OConnor Paul Bernard Plainfield; Sullivan Miles Vincent Summit; N.J. Chesney (V.StA.). P
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of DE2118075A1 publication Critical patent/DE2118075A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/406—Oxides of iron group metals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Thin Magnetic Films (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Hard Magnetic Materials (AREA)
  • Soft Magnetic Materials (AREA)
  • Compounds Of Iron (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE19712118075 1970-04-17 1971-04-14 Verfahren zur Herstellung einer Fotomaske Pending DE2118075A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2956070A 1970-04-17 1970-04-17

Publications (1)

Publication Number Publication Date
DE2118075A1 true DE2118075A1 (de) 1971-11-04

Family

ID=21849664

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712118075 Pending DE2118075A1 (de) 1970-04-17 1971-04-14 Verfahren zur Herstellung einer Fotomaske

Country Status (8)

Country Link
BE (1) BE765706A (fr)
CA (1) CA932595A (fr)
DE (1) DE2118075A1 (fr)
FR (1) FR2089818A5 (fr)
GB (1) GB1340604A (fr)
IE (1) IE35060B1 (fr)
NL (1) NL7105048A (fr)
ZA (1) ZA712438B (fr)

Also Published As

Publication number Publication date
CA932595A (en) 1973-08-28
FR2089818A5 (fr) 1972-01-07
BE765706A (fr) 1971-08-30
NL7105048A (fr) 1971-10-19
ZA712438B (en) 1972-02-23
IE35060L (en) 1971-10-17
IE35060B1 (en) 1975-10-29
GB1340604A (en) 1973-12-12

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