CA932595A - Technique for the fabrication of an iron oxide photomask - Google Patents

Technique for the fabrication of an iron oxide photomask

Info

Publication number
CA932595A
CA932595A CA099195A CA99195A CA932595A CA 932595 A CA932595 A CA 932595A CA 099195 A CA099195 A CA 099195A CA 99195 A CA99195 A CA 99195A CA 932595 A CA932595 A CA 932595A
Authority
CA
Canada
Prior art keywords
fabrication
technique
iron oxide
photomask
oxide photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA099195A
Other versions
CA99195S (en
Inventor
B. Macchesney John
B. O'connor Paul
V. Sullivan Miles
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA932595A publication Critical patent/CA932595A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/406—Oxides of iron group metals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Thin Magnetic Films (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Hard Magnetic Materials (AREA)
  • Soft Magnetic Materials (AREA)
  • Compounds Of Iron (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CA099195A 1970-04-17 1970-11-26 Technique for the fabrication of an iron oxide photomask Expired CA932595A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US2956070A 1970-04-17 1970-04-17

Publications (1)

Publication Number Publication Date
CA932595A true CA932595A (en) 1973-08-28

Family

ID=21849664

Family Applications (1)

Application Number Title Priority Date Filing Date
CA099195A Expired CA932595A (en) 1970-04-17 1970-11-26 Technique for the fabrication of an iron oxide photomask

Country Status (8)

Country Link
BE (1) BE765706A (en)
CA (1) CA932595A (en)
DE (1) DE2118075A1 (en)
FR (1) FR2089818A5 (en)
GB (1) GB1340604A (en)
IE (1) IE35060B1 (en)
NL (1) NL7105048A (en)
ZA (1) ZA712438B (en)

Also Published As

Publication number Publication date
IE35060B1 (en) 1975-10-29
GB1340604A (en) 1973-12-12
IE35060L (en) 1971-10-17
ZA712438B (en) 1972-02-23
BE765706A (en) 1971-08-30
DE2118075A1 (en) 1971-11-04
NL7105048A (en) 1971-10-19
FR2089818A5 (en) 1972-01-07

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