DE2022957A1 - Hochfrequenz-Spruehvorrichtung - Google Patents
Hochfrequenz-SpruehvorrichtungInfo
- Publication number
- DE2022957A1 DE2022957A1 DE19702022957 DE2022957A DE2022957A1 DE 2022957 A1 DE2022957 A1 DE 2022957A1 DE 19702022957 DE19702022957 DE 19702022957 DE 2022957 A DE2022957 A DE 2022957A DE 2022957 A1 DE2022957 A1 DE 2022957A1
- Authority
- DE
- Germany
- Prior art keywords
- electrode
- electrode structure
- electrodes
- frequency
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007921 spray Substances 0.000 title claims description 15
- 238000010411 cooking Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 12
- 239000013077 target material Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000007667 floating Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 240000004808 Saccharomyces cerevisiae Species 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83224669A | 1969-06-11 | 1969-06-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2022957A1 true DE2022957A1 (de) | 1970-12-17 |
Family
ID=25261097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19702022957 Pending DE2022957A1 (de) | 1969-06-11 | 1970-05-12 | Hochfrequenz-Spruehvorrichtung |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS4820707B1 (enExample) |
| CA (1) | CA918601A (enExample) |
| CH (1) | CH517833A (enExample) |
| DE (1) | DE2022957A1 (enExample) |
| FR (1) | FR2049999A5 (enExample) |
| GB (1) | GB1308243A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4022708A1 (de) * | 1990-07-17 | 1992-04-02 | Balzers Hochvakuum | Aetz- oder beschichtungsanlagen |
| DE4042417A1 (de) * | 1990-07-17 | 1992-05-14 | Balzers Hochvakuum | Aetz- oder beschichtungsanlagen |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5375213U (enExample) * | 1976-11-26 | 1978-06-23 |
-
1970
- 1970-05-12 DE DE19702022957 patent/DE2022957A1/de active Pending
- 1970-06-03 GB GB2687770A patent/GB1308243A/en not_active Expired
- 1970-06-04 CA CA084677A patent/CA918601A/en not_active Expired
- 1970-06-05 FR FR7020763A patent/FR2049999A5/fr not_active Expired
- 1970-06-10 JP JP4959870A patent/JPS4820707B1/ja active Pending
- 1970-09-09 CH CH865570A patent/CH517833A/de not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4022708A1 (de) * | 1990-07-17 | 1992-04-02 | Balzers Hochvakuum | Aetz- oder beschichtungsanlagen |
| DE4042417A1 (de) * | 1990-07-17 | 1992-05-14 | Balzers Hochvakuum | Aetz- oder beschichtungsanlagen |
| US5460707A (en) * | 1990-07-17 | 1995-10-24 | Balzers Aktiengesellschaft | Etching or coating method and a plant therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2049999A5 (enExample) | 1971-03-26 |
| CH517833A (de) | 1972-01-15 |
| JPS4820707B1 (enExample) | 1973-06-22 |
| GB1308243A (en) | 1973-02-21 |
| CA918601A (en) | 1973-01-09 |
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