DE1565881B2 - Verfahren und Anordnung zum gesteuer ten Erwarmen eines Targetmatenals in einem Hochvakuum Elektronenstrahlofen - Google Patents
Verfahren und Anordnung zum gesteuer ten Erwarmen eines Targetmatenals in einem Hochvakuum ElektronenstrahlofenInfo
- Publication number
- DE1565881B2 DE1565881B2 DE19661565881 DE1565881A DE1565881B2 DE 1565881 B2 DE1565881 B2 DE 1565881B2 DE 19661565881 DE19661565881 DE 19661565881 DE 1565881 A DE1565881 A DE 1565881A DE 1565881 B2 DE1565881 B2 DE 1565881B2
- Authority
- DE
- Germany
- Prior art keywords
- coils
- electron beams
- magnetic field
- devices
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title claims description 60
- 239000013077 target material Substances 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 12
- 238000010438 heat treatment Methods 0.000 title claims description 7
- 230000005291 magnetic effect Effects 0.000 claims description 62
- 230000004907 flux Effects 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 230000008878 coupling Effects 0.000 claims 3
- 238000010168 coupling process Methods 0.000 claims 3
- 238000005859 coupling reaction Methods 0.000 claims 3
- 230000005611 electricity Effects 0.000 claims 2
- 230000035699 permeability Effects 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Vapour Deposition (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
- Detergent Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US463190A US3394217A (en) | 1965-06-11 | 1965-06-11 | Method and apparatus for controlling plural electron beams |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE1565881A1 DE1565881A1 (de) | 1970-03-19 |
| DE1565881B2 true DE1565881B2 (de) | 1971-01-21 |
Family
ID=23839207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19661565881 Pending DE1565881B2 (de) | 1965-06-11 | 1966-06-10 | Verfahren und Anordnung zum gesteuer ten Erwarmen eines Targetmatenals in einem Hochvakuum Elektronenstrahlofen |
Country Status (11)
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3475542A (en) * | 1967-09-13 | 1969-10-28 | Air Reduction | Apparatus for heating a target in an electron beam furnace |
| US3535428A (en) * | 1968-07-17 | 1970-10-20 | Air Reduction | Apparatus for producing and directing an electron beam |
| FR2244014B1 (enrdf_load_stackoverflow) * | 1973-09-17 | 1976-10-08 | Bosch Gmbh Robert | |
| IT1037702B (it) * | 1975-04-29 | 1979-11-20 | Varian Associates | Apparecchiatura di rescaldamento e o di evaporazione a fascio elettronico |
| US3999097A (en) * | 1975-06-30 | 1976-12-21 | International Business Machines Corporation | Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system |
| SU782571A1 (ru) * | 1976-05-12 | 1983-09-23 | Институт ядерной физики СО АН СССР | Способ радиационной обработки изделий круглого сечени |
| DD204947A1 (de) * | 1982-04-20 | 1983-12-14 | Manfred Neumann | Einrichtung zum elektronenstrahlbedampfen breiter baender |
| US5136171A (en) * | 1990-03-02 | 1992-08-04 | Varian Associates, Inc. | Charge neutralization apparatus for ion implantation system |
| EP0487656B1 (en) * | 1990-03-02 | 1995-08-02 | Varian Associates, Inc. | Charge neutralization apparatus for ion implantation system |
| JP3275166B2 (ja) * | 1997-02-28 | 2002-04-15 | 住友重機械工業株式会社 | プラズマビームの偏り修正機構を備えた真空成膜装置 |
| US6476340B1 (en) | 1999-04-14 | 2002-11-05 | The Boc Group, Inc. | Electron beam gun with grounded shield to prevent arc-down and gas bleed to protect the filament |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3046936A (en) * | 1958-06-04 | 1962-07-31 | Nat Res Corp | Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof |
| US3105275A (en) * | 1960-05-27 | 1963-10-01 | Stauffer Chemical Co | Electron-beam furnace with double-coil magnetic beam guidance |
| FR1374335A (fr) * | 1962-12-13 | 1964-10-09 | Electronique & Physique | Dispositif pour fabriquer une lame en matériau à grande pureté |
-
1965
- 1965-06-11 US US463190A patent/US3394217A/en not_active Expired - Lifetime
-
1966
- 1966-05-19 GB GB22233/66A patent/GB1141594A/en not_active Expired
- 1966-05-31 BE BE681839D patent/BE681839A/xx unknown
- 1966-06-03 AT AT527966A patent/AT278187B/de active
- 1966-06-06 LU LU51261A patent/LU51261A1/xx unknown
- 1966-06-08 NO NO163344A patent/NO117547B/no unknown
- 1966-06-09 CH CH830066A patent/CH452731A/de unknown
- 1966-06-10 NL NL6608065A patent/NL6608065A/xx unknown
- 1966-06-10 DE DE19661565881 patent/DE1565881B2/de active Pending
- 1966-06-10 SE SE7971/66A patent/SE346196B/xx unknown
- 1966-06-10 DK DK299966AA patent/DK117649B/da unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AT278187B (de) | 1970-01-26 |
| SE346196B (enrdf_load_stackoverflow) | 1972-06-26 |
| CH452731A (de) | 1968-03-15 |
| DK117649B (da) | 1970-05-19 |
| GB1141594A (en) | 1969-01-29 |
| NL6608065A (enrdf_load_stackoverflow) | 1966-12-12 |
| US3394217A (en) | 1968-07-23 |
| LU51261A1 (enrdf_load_stackoverflow) | 1966-08-16 |
| DE1565881A1 (de) | 1970-03-19 |
| BE681839A (enrdf_load_stackoverflow) | 1966-10-31 |
| NO117547B (enrdf_load_stackoverflow) | 1969-08-25 |
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