DE1223697B - Photopolymerisierbare Schicht - Google Patents

Photopolymerisierbare Schicht

Info

Publication number
DE1223697B
DE1223697B DEG29910A DEG0029910A DE1223697B DE 1223697 B DE1223697 B DE 1223697B DE G29910 A DEG29910 A DE G29910A DE G0029910 A DEG0029910 A DE G0029910A DE 1223697 B DE1223697 B DE 1223697B
Authority
DE
Germany
Prior art keywords
uranyl
water
vinyl
weight
soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEG29910A
Other languages
German (de)
English (en)
Inventor
Steven Levinos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Chemicals Corp
Original Assignee
General Aniline and Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Aniline and Film Corp filed Critical General Aniline and Film Corp
Publication of DE1223697B publication Critical patent/DE1223697B/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
DEG29910A 1959-06-25 1960-06-22 Photopolymerisierbare Schicht Pending DE1223697B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US822764A US3061431A (en) 1959-06-25 1959-06-25 Process of photopolymerization of compounds containing vinyl groups by means of uranium salts of organic acids as catalysts

Publications (1)

Publication Number Publication Date
DE1223697B true DE1223697B (de) 1966-08-25

Family

ID=25236902

Family Applications (1)

Application Number Title Priority Date Filing Date
DEG29910A Pending DE1223697B (de) 1959-06-25 1960-06-22 Photopolymerisierbare Schicht

Country Status (4)

Country Link
US (1) US3061431A (US20090163788A1-20090625-C00002.png)
BE (1) BE592209A (US20090163788A1-20090625-C00002.png)
DE (1) DE1223697B (US20090163788A1-20090625-C00002.png)
GB (1) GB906143A (US20090163788A1-20090625-C00002.png)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3440047A (en) * 1964-08-10 1969-04-22 Gen Aniline & Film Corp Photopolymer offset printing plates of the etch type
US3469983A (en) * 1965-07-06 1969-09-30 Gaf Corp Preparation of photopolymer lithographic offset paper plates
US3512970A (en) * 1966-06-21 1970-05-19 Gaf Corp Photopolymerization
US3856528A (en) * 1972-08-10 1974-12-24 Keuffel & Esser Co Color toned photopolymerization imaging process
DE2364850A1 (de) * 1972-12-29 1974-07-04 Atomic Energy Of Australia Verfahren zum fotoaetzen und fototiefdrucken unter verwendung von durch spaltbruchstuecken und/oder alphateilchen verursachte strahlen-aetzspuren von getonten fotographien
US11351509B2 (en) * 2013-12-06 2022-06-07 Taiwan Semiconductor Manufacturing Company, Ltd. Filter with seal treatment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2880153A (en) * 1957-01-28 1959-03-31 American Viscose Corp Photopolymerization process
US2887376A (en) * 1956-01-26 1959-05-19 Eastman Kodak Co Photographic reproduction process using light-sensitive polymers

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1963074A (en) * 1931-11-11 1934-06-19 Du Pont Vinylethinyl carbinol polymers and processes for preparing same
US2206022A (en) * 1937-11-02 1940-07-02 Dow Chemical Co Polymerization of vinylidene chloride
US2344785A (en) * 1940-08-03 1944-03-21 Dow Chemical Co Photopolymerization method
US2377752A (en) * 1940-08-03 1945-06-05 Dow Chemical Co Polymerization method
US2600683A (en) * 1947-05-08 1952-06-17 American Viscose Corp Trifluorochloroethylene-vinyl acetate copolymers
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2887376A (en) * 1956-01-26 1959-05-19 Eastman Kodak Co Photographic reproduction process using light-sensitive polymers
US2880153A (en) * 1957-01-28 1959-03-31 American Viscose Corp Photopolymerization process

Also Published As

Publication number Publication date
GB906143A (en) 1962-09-19
US3061431A (en) 1962-10-30
BE592209A (US20090163788A1-20090625-C00002.png)

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