DE1207920B - Verfahren zum Herstellen sauerstofffreier, verwerfungsfreier Halbleitereinkristalle durch Ziehen aus einer tiegellosen Schmelze - Google Patents
Verfahren zum Herstellen sauerstofffreier, verwerfungsfreier Halbleitereinkristalle durch Ziehen aus einer tiegellosen SchmelzeInfo
- Publication number
- DE1207920B DE1207920B DEG25999A DEG0025999A DE1207920B DE 1207920 B DE1207920 B DE 1207920B DE G25999 A DEG25999 A DE G25999A DE G0025999 A DEG0025999 A DE G0025999A DE 1207920 B DE1207920 B DE 1207920B
- Authority
- DE
- Germany
- Prior art keywords
- free
- melt
- crystal
- semiconductor
- support body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title claims description 39
- 239000004065 semiconductor Substances 0.000 title claims description 23
- 238000000034 method Methods 0.000 title claims description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000155 melt Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 5
- 239000006187 pill Substances 0.000 claims description 3
- 230000006698 induction Effects 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010575 fractional recrystallization Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/901—Levitation, reduced gravity, microgravity, space
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/901—Levitation, reduced gravity, microgravity, space
- Y10S117/902—Specified orientation, shape, crystallography, or size of seed or substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US705685A US2961305A (en) | 1957-12-27 | 1957-12-27 | Method of growing semiconductor crystals |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1207920B true DE1207920B (de) | 1965-12-30 |
Family
ID=24834518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEG25999A Pending DE1207920B (de) | 1957-12-27 | 1958-12-20 | Verfahren zum Herstellen sauerstofffreier, verwerfungsfreier Halbleitereinkristalle durch Ziehen aus einer tiegellosen Schmelze |
Country Status (4)
Country | Link |
---|---|
US (1) | US2961305A (en, 2012) |
DE (1) | DE1207920B (en, 2012) |
GB (1) | GB838770A (en, 2012) |
NL (1) | NL234451A (en, 2012) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL126240C (en, 2012) * | 1958-02-19 | |||
US3041058A (en) * | 1958-11-19 | 1962-06-26 | Straumann Inst Ag | Heat treatment apparatus |
NL133150C (en, 2012) * | 1959-12-23 | |||
US3279896A (en) * | 1960-10-26 | 1966-10-18 | Itt | Crucible seal |
BE613793A (en, 2012) * | 1961-04-14 | |||
US3447902A (en) * | 1966-04-04 | 1969-06-03 | Motorola Inc | Single crystal silicon rods |
DE1519902C3 (de) * | 1966-09-24 | 1975-07-10 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Vorrichtung zum tiegelfreien Zonenschmelzen eines kristallinen Stabes, insbesondere Halbleiterstabes |
US3776703A (en) * | 1970-11-30 | 1973-12-04 | Texas Instruments Inc | Method of growing 1-0-0 orientation high perfection single crystal silicon by adjusting a focus coil |
US4121965A (en) * | 1976-07-16 | 1978-10-24 | The United States Of America As Represented By The Administrator Of The National Aeronautics & Space Administration | Method of controlling defect orientation in silicon crystal ribbon growth |
US4324610A (en) * | 1978-03-20 | 1982-04-13 | Motorola, Inc. | Method for the controlled melting of semiconductor bodies |
DE4318184A1 (de) * | 1993-06-01 | 1994-12-08 | Wacker Chemitronic | Verfahren und Vorrichtung zum Ziehen von Einkristallen |
JP2008156166A (ja) * | 2006-12-25 | 2008-07-10 | Sumco Solar Corp | シリコンインゴットの鋳造方法および切断方法 |
US8536491B2 (en) * | 2009-03-24 | 2013-09-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Rotatable and tunable heaters for semiconductor furnace |
JP5484589B2 (ja) | 2009-11-24 | 2014-05-07 | フォルシュングスフェアブント ベルリン エー ファウ | 半導体材料から単結晶を製造する方法および装置 |
DE102010040464A1 (de) | 2010-09-09 | 2012-03-15 | Wacker Chemie Ag | Verfahren zur Herstellung eines versetzungsfreien einkristallinen Stabes aus Silicium |
RU182737U1 (ru) * | 2016-12-29 | 2018-08-29 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Северо-Кавказский горно-металлургический институт (государственный технологический университет)" (СКГМИ (ГТУ) | Устройство для получения высокочистого монокристалла зонной плавкой |
CN111115636B (zh) * | 2020-01-10 | 2022-09-30 | 昆明理工大学 | 一种用于冶金级硅电磁悬浮处理的电磁悬浮线圈和方法 |
WO2025093146A1 (en) * | 2023-10-31 | 2025-05-08 | University Of Latvia | A technique for replenishing molten, levitating material by growing monocrystalline, polycrystalline, or other solid-state structures under electromagnetic levitation conditions |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1107076A (fr) * | 1953-02-14 | 1955-12-28 | Siemens Ag | Procédé et dispositif pour le traitement d'un montage à cristal semi-conducteur |
DE1014332B (de) * | 1952-12-17 | 1957-08-22 | Western Electric Co | Verfahren und Vorrichtung zum fraktionierten Umkristallisieren von unter Mischkristallbildung erstarrenden Legierungen und Halbleiterausgangsstoffen durch Zonenschmelzen |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686864A (en) * | 1951-01-17 | 1954-08-17 | Westinghouse Electric Corp | Magnetic levitation and heating of conductive materials |
US2747971A (en) * | 1953-07-20 | 1956-05-29 | Westinghouse Electric Corp | Preparation of pure crystalline silicon |
US2793103A (en) * | 1954-02-24 | 1957-05-21 | Siemens Ag | Method for producing rod-shaped bodies of crystalline material |
US2743199A (en) * | 1955-03-30 | 1956-04-24 | Westinghouse Electric Corp | Process of zone refining an elongated body of metal |
-
0
- NL NL234451D patent/NL234451A/xx unknown
-
1957
- 1957-12-27 US US705685A patent/US2961305A/en not_active Expired - Lifetime
-
1958
- 1958-12-20 DE DEG25999A patent/DE1207920B/de active Pending
- 1958-12-23 GB GB41472/58A patent/GB838770A/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1014332B (de) * | 1952-12-17 | 1957-08-22 | Western Electric Co | Verfahren und Vorrichtung zum fraktionierten Umkristallisieren von unter Mischkristallbildung erstarrenden Legierungen und Halbleiterausgangsstoffen durch Zonenschmelzen |
FR1107076A (fr) * | 1953-02-14 | 1955-12-28 | Siemens Ag | Procédé et dispositif pour le traitement d'un montage à cristal semi-conducteur |
Also Published As
Publication number | Publication date |
---|---|
NL234451A (en, 2012) | |
GB838770A (en) | 1960-06-22 |
US2961305A (en) | 1960-11-22 |
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