DE1193609B - Verfahren zum Herstellen von Halbleiterbauelementen - Google Patents

Verfahren zum Herstellen von Halbleiterbauelementen

Info

Publication number
DE1193609B
DE1193609B DEN20834A DEN0020834A DE1193609B DE 1193609 B DE1193609 B DE 1193609B DE N20834 A DEN20834 A DE N20834A DE N0020834 A DEN0020834 A DE N0020834A DE 1193609 B DE1193609 B DE 1193609B
Authority
DE
Germany
Prior art keywords
electrode material
semiconductor body
chamber
semiconductor
mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEN20834A
Other languages
German (de)
English (en)
Inventor
Willem Gerard Einthoven
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of DE1193609B publication Critical patent/DE1193609B/de
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05556Shape in side view
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01015Phosphorus [P]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01019Potassium [K]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01027Cobalt [Co]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01032Germanium [Ge]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01049Indium [In]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0105Tin [Sn]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01051Antimony [Sb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01074Tungsten [W]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/014Solder alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10252Germanium [Ge]

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Silicon Compounds (AREA)
DEN20834A 1960-11-21 1961-11-17 Verfahren zum Herstellen von Halbleiterbauelementen Pending DE1193609B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL258204 1960-11-21

Publications (1)

Publication Number Publication Date
DE1193609B true DE1193609B (de) 1965-05-26

Family

ID=19752712

Family Applications (1)

Application Number Title Priority Date Filing Date
DEN20834A Pending DE1193609B (de) 1960-11-21 1961-11-17 Verfahren zum Herstellen von Halbleiterbauelementen

Country Status (5)

Country Link
CH (1) CH411139A (enrdf_load_stackoverflow)
DE (1) DE1193609B (enrdf_load_stackoverflow)
ES (1) ES272141A1 (enrdf_load_stackoverflow)
GB (1) GB972387A (enrdf_load_stackoverflow)
NL (1) NL258204A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2238569A1 (de) * 1971-08-07 1973-02-22 Matsushita Electronics Corp Verfahren zum loeten einer halbleiterplatte

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1054583B (de) * 1957-03-05 1959-04-09 Bbc Brown Boveri & Cie Verfahren zur Herstellung von pn-UEbergaengen auf Halbleiterkoerpern
DE1110763B (de) 1956-10-11 1961-07-13 Siemens Ag Verfahren und Vorrichtung zur Herstellung von Halbleiteranordnungen mit legierten, flaechenhaften p-n-UEbergaengen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1110763B (de) 1956-10-11 1961-07-13 Siemens Ag Verfahren und Vorrichtung zur Herstellung von Halbleiteranordnungen mit legierten, flaechenhaften p-n-UEbergaengen
DE1054583B (de) * 1957-03-05 1959-04-09 Bbc Brown Boveri & Cie Verfahren zur Herstellung von pn-UEbergaengen auf Halbleiterkoerpern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2238569A1 (de) * 1971-08-07 1973-02-22 Matsushita Electronics Corp Verfahren zum loeten einer halbleiterplatte

Also Published As

Publication number Publication date
CH411139A (de) 1966-04-15
ES272141A1 (es) 1962-06-16
NL258204A (enrdf_load_stackoverflow) 1900-01-01
GB972387A (en) 1964-10-14

Similar Documents

Publication Publication Date Title
DE1279848B (de) Verfahren zum grossflaechigen Kontaktieren eines einkristallinen Siliziumkoerpers
DE2305019A1 (de) Verfahren und vorrichtung zum epitaktischen aufwachsen von halbleitermaterial aus der schmelze
DE2101028C2 (de) Verfahren zum Herstellen einer Mehrzahl von Halbleiterbauelementen
DE1106422B (de) Blattfoermig zusammengesetztes, aus mehreren Lagen bestehendes Plaettchen aus Elektrodenmaterial zum Einlegieren von p-n-UEbergaengen in Halbleiteranordnungen
DE1193609B (de) Verfahren zum Herstellen von Halbleiterbauelementen
DE1300165B (de) Mikrominiaturisierte Halbleiterdiodenanordnung
DE1272406B (de) Elektronische Miniaturkombinationseinheit
DE1112585B (de) Verfahren zum Herstellen von Halbleiteranordnungen
DE2935182C2 (enrdf_load_stackoverflow)
DE3248689A1 (de) Fluessigphasenepitaxie
DE1075223B (de) Verfahren zum Auflegicren ^mcs eutektischen Legierungsmatenals auf einen Halbleiterkörper
DE1080695B (de) Verfahren zur Herstellung eines Elektrodensystems mit einem halbleitenden Koerper und mindestens einer Legierungselektrode
DE1261252C2 (de) Elektronisches, bistabiles sperrschichtfreies Halbleiterschaltelement und Verfahren zu seiner Herstellung
DE1142969B (de) Verfahren zum Herstellen von einlegierten Elektroden von Halbleiteranordnungen
DE1090769B (de) Verfahren zur Herstellung von Leitfaehigkeits- oder pn-UEbergaengen in Halbleiterkoerpern nach dem Aufschmelzverfahren
DE1176759B (de) Verfahren zum Herstellen von Halbleiteranordnungen
DE1125554B (de) Verfahren zur Herstellung von Halbleiteranordnungen
DE1219240B (de) Verfahren zur Herstellung von Halbleitervorrichtungen unter Verwendung eines Elektrodenmaterials auf Indium-, Zinn-, Blei- oder Wismut-Basis
DE1139923B (de) Legierungsform fuer Halbleiteranordnungen
DE1167453B (de) Verfahren zur Herstellung von Halbleiterdioden
DE1192325B (de) Verfahren zur Herstellung eines Drifttransistors
DE1614249A1 (de) Sockel fuer Halbleitervorrichtung
DE1194107B (de) Verfahren und Vorrichtung zur Herstellung eines mit mindestens einem hindurchgehenden elektrischen Leiter versehenen Glasgegenstandes
AT254268B (de) Verfahren zum gleichzeitigen Herstellen von mindestens zwei Halbleiterbauelementen aus einem scheibenförmigen Halbleiterkristall
DE1235434B (de) Verfahren zum Ausbilden eines Kurzschlusses zwischen der Emitterzone und der benachbarten Zone entgegengesetzten Leitungstyps eines steuerbaren Siliziumgleichrichterelementes