DE1148661B - Verfahren zur Herstellung von Halbleiteranordnungen mit einlegiertem pn-UEbergang - Google Patents

Verfahren zur Herstellung von Halbleiteranordnungen mit einlegiertem pn-UEbergang

Info

Publication number
DE1148661B
DE1148661B DES63187A DES0063187A DE1148661B DE 1148661 B DE1148661 B DE 1148661B DE S63187 A DES63187 A DE S63187A DE S0063187 A DES0063187 A DE S0063187A DE 1148661 B DE1148661 B DE 1148661B
Authority
DE
Germany
Prior art keywords
semiconductor
alloyed
junction
crystal
crystal lattice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DES63187A
Other languages
German (de)
English (en)
Inventor
Dipl-Phys Dr Reimer Emeis
Dr Rer Nat Kurt Raithel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL250885D priority Critical patent/NL250885A/xx
Application filed by Siemens Corp filed Critical Siemens Corp
Priority to DES63187A priority patent/DE1148661B/de
Priority to FR822209A priority patent/FR1251866A/fr
Priority to CH535060A priority patent/CH389781A/de
Priority to GB18321/60A priority patent/GB937497A/en
Publication of DE1148661B publication Critical patent/DE1148661B/de
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/322Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B63SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
    • B63HMARINE PROPULSION OR STEERING
    • B63H11/00Marine propulsion by water jets
    • B63H11/02Marine propulsion by water jets the propulsive medium being ambient water
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B63SHIPS OR OTHER WATERBORNE VESSELS; RELATED EQUIPMENT
    • B63HMARINE PROPULSION OR STEERING
    • B63H11/00Marine propulsion by water jets
    • B63H11/02Marine propulsion by water jets the propulsive medium being ambient water
    • B63H11/04Marine propulsion by water jets the propulsive medium being ambient water by means of pumps
    • B63H11/08Marine propulsion by water jets the propulsive medium being ambient water by means of pumps of rotary type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • Ocean & Marine Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Electrodes Of Semiconductors (AREA)
DES63187A 1959-05-29 1959-05-29 Verfahren zur Herstellung von Halbleiteranordnungen mit einlegiertem pn-UEbergang Pending DE1148661B (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL250885D NL250885A (enrdf_load_stackoverflow) 1959-05-29
DES63187A DE1148661B (de) 1959-05-29 1959-05-29 Verfahren zur Herstellung von Halbleiteranordnungen mit einlegiertem pn-UEbergang
FR822209A FR1251866A (fr) 1959-05-29 1960-03-23 Procédé de fabrication de dispositifs semi-conducteurs
CH535060A CH389781A (de) 1959-05-29 1960-05-10 Verfahren zur Herstellung von Halbleiteranordnungen
GB18321/60A GB937497A (en) 1959-05-29 1960-05-24 Improvements in or relating to processes for the production of semi-conductor arrangements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES63187A DE1148661B (de) 1959-05-29 1959-05-29 Verfahren zur Herstellung von Halbleiteranordnungen mit einlegiertem pn-UEbergang

Publications (1)

Publication Number Publication Date
DE1148661B true DE1148661B (de) 1963-05-16

Family

ID=7496195

Family Applications (1)

Application Number Title Priority Date Filing Date
DES63187A Pending DE1148661B (de) 1959-05-29 1959-05-29 Verfahren zur Herstellung von Halbleiteranordnungen mit einlegiertem pn-UEbergang

Country Status (4)

Country Link
CH (1) CH389781A (enrdf_load_stackoverflow)
DE (1) DE1148661B (enrdf_load_stackoverflow)
GB (1) GB937497A (enrdf_load_stackoverflow)
NL (1) NL250885A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1266404B (de) * 1964-12-01 1968-04-18 Siemens Ag Verfahren zum Herstellen eines Halbleiterbauelementes

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1109535A (fr) * 1954-07-30 1956-01-30 Csf Perfectionnements aux procédés de fabrication des jonctions nu-p

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1109535A (fr) * 1954-07-30 1956-01-30 Csf Perfectionnements aux procédés de fabrication des jonctions nu-p

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1266404B (de) * 1964-12-01 1968-04-18 Siemens Ag Verfahren zum Herstellen eines Halbleiterbauelementes
DE1266404C2 (de) * 1964-12-01 1968-11-07 Siemens Ag Verfahren zum Herstellen eines Halbleiterbauelementes

Also Published As

Publication number Publication date
GB937497A (en) 1963-09-25
NL250885A (enrdf_load_stackoverflow)
CH389781A (de) 1965-03-31

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