DE112022007374T5 - Leistungshalbleitervorrichtung - Google Patents

Leistungshalbleitervorrichtung Download PDF

Info

Publication number
DE112022007374T5
DE112022007374T5 DE112022007374.8T DE112022007374T DE112022007374T5 DE 112022007374 T5 DE112022007374 T5 DE 112022007374T5 DE 112022007374 T DE112022007374 T DE 112022007374T DE 112022007374 T5 DE112022007374 T5 DE 112022007374T5
Authority
DE
Germany
Prior art keywords
region
semiconductor
active region
semiconductor region
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112022007374.8T
Other languages
German (de)
English (en)
Inventor
Hiroya Hamada
Tsuyoshi OSAGA
Rui Konishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of DE112022007374T5 publication Critical patent/DE112022007374T5/de
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411Insulated-gate bipolar transistors [IGBT]
    • H10D12/441Vertical IGBTs
    • H10D12/461Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
    • H10D12/481Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions having gate structures on slanted surfaces, on vertical surfaces, or in grooves, e.g. trench gate IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • H10D64/511Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/519Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00Arrangements for thermal protection or thermal control
    • H10W40/10Arrangements for heating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411Insulated-gate bipolar transistors [IGBT]
    • H10D12/415Insulated-gate bipolar transistors [IGBT] having edge termination structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
    • H10D30/665Vertical DMOS [VDMOS] FETs having edge termination structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
    • H10D30/668Vertical DMOS [VDMOS] FETs having trench gate electrodes, e.g. UMOS transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/076Connecting or disconnecting of strap connectors
    • H10W72/07651Connecting or disconnecting of strap connectors characterised by changes in properties of the strap connectors during connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/60Strap connectors, e.g. thick copper clips for grounding of power devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/736Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
DE112022007374.8T 2022-06-15 2022-06-15 Leistungshalbleitervorrichtung Pending DE112022007374T5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/023945 WO2023242991A1 (ja) 2022-06-15 2022-06-15 電力用半導体装置

Publications (1)

Publication Number Publication Date
DE112022007374T5 true DE112022007374T5 (de) 2025-04-10

Family

ID=89192441

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112022007374.8T Pending DE112022007374T5 (de) 2022-06-15 2022-06-15 Leistungshalbleitervorrichtung

Country Status (5)

Country Link
US (1) US20250287624A1 (https=)
JP (1) JPWO2023242991A1 (https=)
CN (1) CN119384878A (https=)
DE (1) DE112022007374T5 (https=)
WO (1) WO2023242991A1 (https=)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004363327A (ja) * 2003-06-04 2004-12-24 Fuji Electric Device Technology Co Ltd 半導体装置
JP5561922B2 (ja) * 2008-05-20 2014-07-30 三菱電機株式会社 パワー半導体装置
JP2010123873A (ja) * 2008-11-21 2010-06-03 Sanyo Electric Co Ltd 絶縁ゲート型半導体装置
JP6817777B2 (ja) * 2015-12-16 2021-01-20 ローム株式会社 半導体装置
CN110462838B (zh) * 2017-10-18 2023-07-14 富士电机株式会社 半导体装置

Also Published As

Publication number Publication date
US20250287624A1 (en) 2025-09-11
JPWO2023242991A1 (https=) 2023-12-21
WO2023242991A1 (ja) 2023-12-21
CN119384878A (zh) 2025-01-28

Similar Documents

Publication Publication Date Title
DE102019202117B4 (de) Halbleitervorrichtung und Verfahren zum Herstellen einer Halbleitervorrichtung
DE112014006895B4 (de) Halbleiteranordnung
DE112019003465T5 (de) SiC-HALBLEITERVORRICHTUNG
DE112012005981B4 (de) Halbleitervorrichtungen
DE102017104715B4 (de) Schaltvorrichtung
DE102010043567B4 (de) Hochspannungshalbleitervorrichtung
DE102019202108B4 (de) Halbleitervorrichtung
DE102017104713B4 (de) Schaltvorrichtung
DE112014006692B4 (de) Halbleiteranordnung
DE102014104061B4 (de) Bipolartransistor mit isolierter gateelektrode mit emitterkurzschlussbereichen
DE102018208437B4 (de) Halbleitervorrichtung
DE102021123451A1 (de) Halbleitervorrichtung
DE112020000206T5 (de) Halbleitermodul-Schaltkreisstruktur
DE102018104060A1 (de) Halbleitervorrichtung
DE102020203247B4 (de) Halbleitervorrichtung
DE102023120092A1 (de) Halbleitervorrichtung
DE112019003399B4 (de) Halbleitervorrichtung
DE112014005534T5 (de) Halbleitereinrichtung des vertikalen Typs
DE112022007374T5 (de) Leistungshalbleitervorrichtung
DE102021128828B4 (de) Halbleitervorrichtung
DE102023128722A1 (de) Halbleitervorrichtung
DE102024204435A1 (de) Halbleitervorrichtung
DE112015004738T5 (de) Halbleitermodul
DE102019128394A1 (de) Halbleiter-die, halbleitervorrichtung und igbt-modul
DE112023000796T5 (de) Halbleiterbauelement und verfahren zum herstellen eines halbleiterbauelements

Legal Events

Date Code Title Description
R012 Request for examination validly filed