DE112013002560B4 - Spektralsensor - Google Patents
Spektralsensor Download PDFInfo
- Publication number
- DE112013002560B4 DE112013002560B4 DE112013002560.4T DE112013002560T DE112013002560B4 DE 112013002560 B4 DE112013002560 B4 DE 112013002560B4 DE 112013002560 T DE112013002560 T DE 112013002560T DE 112013002560 B4 DE112013002560 B4 DE 112013002560B4
- Authority
- DE
- Germany
- Prior art keywords
- light
- filter
- layer
- receiving surface
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- 239000000758 substrate Substances 0.000 claims abstract description 79
- 238000001514 detection method Methods 0.000 claims abstract description 31
- 230000003287 optical effect Effects 0.000 claims description 58
- 238000009751 slip forming Methods 0.000 claims description 18
- 239000010410 layer Substances 0.000 description 208
- 238000001228 spectrum Methods 0.000 description 42
- 230000001681 protective effect Effects 0.000 description 29
- 239000000463 material Substances 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 229910052814 silicon oxide Inorganic materials 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 9
- 230000008878 coupling Effects 0.000 description 9
- 238000010168 coupling process Methods 0.000 description 9
- 238000005859 coupling reaction Methods 0.000 description 9
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- 229920005989 resin Polymers 0.000 description 9
- 238000005530 etching Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 230000002542 deteriorative effect Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910004541 SiN Inorganic materials 0.000 description 2
- -1 Ta 2 O 5 Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- 238000001259 photo etching Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910021418 black silicon Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
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- 229910052732 germanium Inorganic materials 0.000 description 1
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- 238000000227 grinding Methods 0.000 description 1
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- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002061 nanopillar Substances 0.000 description 1
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- 230000001590 oxidative effect Effects 0.000 description 1
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- 229920002120 photoresistant polymer Polymers 0.000 description 1
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- 238000007788 roughening Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0213—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using attenuators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2803—Investigating the spectrum using photoelectric array detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/45—Interferometric spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J2003/1226—Interference filters
- G01J2003/1234—Continuously variable IF [CVIF]; Wedge type
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Spectrometry And Color Measurement (AREA)
- Optical Filters (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012114336A JP5875936B2 (ja) | 2012-05-18 | 2012-05-18 | 分光センサ |
| JP2012-114336 | 2012-05-18 | ||
| JPJP2012114336 | 2012-05-18 | ||
| PCT/JP2013/062953 WO2013172234A1 (ja) | 2012-05-18 | 2013-05-08 | 分光センサ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE112013002560T5 DE112013002560T5 (de) | 2015-02-05 |
| DE112013002560B4 true DE112013002560B4 (de) | 2023-01-05 |
Family
ID=49583641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE112013002560.4T Active DE112013002560B4 (de) | 2012-05-18 | 2013-05-08 | Spektralsensor |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9671286B2 (https=) |
| JP (1) | JP5875936B2 (https=) |
| CN (1) | CN104272069B (https=) |
| DE (1) | DE112013002560B4 (https=) |
| WO (1) | WO2013172234A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12455191B2 (en) | 2020-11-30 | 2025-10-28 | Silios Technologies | Multispectral imager with enlarged spectral domain |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013104968B4 (de) * | 2013-05-14 | 2020-12-31 | ams Sensors Germany GmbH | Sensoranordnung mit einem siliziumbasierten optischen Sensor und einem Substrat für funktionelle Schichtsysteme |
| JP6290594B2 (ja) | 2013-10-31 | 2018-03-07 | 浜松ホトニクス株式会社 | 光検出装置 |
| JP6390117B2 (ja) * | 2014-02-26 | 2018-09-19 | セイコーエプソン株式会社 | 光学モジュール、及び電子機器 |
| JP6671860B2 (ja) * | 2015-04-28 | 2020-03-25 | 浜松ホトニクス株式会社 | 光検出装置 |
| EP4467942A3 (en) * | 2015-10-02 | 2025-01-22 | Hamamatsu Photonics K.K. | Light detection device |
| JP7039160B2 (ja) | 2016-03-09 | 2022-03-22 | 浜松ホトニクス株式会社 | 光検出装置 |
| CN119096192A (zh) * | 2021-09-03 | 2024-12-06 | 国立大学法人东北大学 | 具有分光功能的摄像元件及其制造方法、以及具备其的产品、像素化滤光器阵列的制造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02502490A (ja) | 1987-12-11 | 1990-08-09 | サンタ・バーバラ・リサーチ・センター | くさびフィルタ分光計 |
| JPH05322653A (ja) | 1992-05-26 | 1993-12-07 | Hamamatsu Photonics Kk | 半導体光検出装置 |
Family Cites Families (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4054389A (en) * | 1976-09-23 | 1977-10-18 | International Business Machines Corporation | Spectrophotometer with photodiode array |
| JPS57151830A (en) | 1981-03-13 | 1982-09-20 | Union Giken:Kk | Spectrophotometer |
| JPS58195127A (ja) * | 1982-05-10 | 1983-11-14 | Japan Spectroscopic Co | マルチチヤネル検知器及びマルチチヤネル分光測定装置 |
| JPS5972861A (ja) | 1982-10-19 | 1984-04-24 | Canon Inc | 画像読取り装置 |
| JPS62170647U (https=) * | 1986-04-17 | 1987-10-29 | ||
| JPH0814509B2 (ja) | 1986-05-15 | 1996-02-14 | ミノルタ株式会社 | 分光測定センサ |
| JPS6435325A (en) | 1987-07-31 | 1989-02-06 | Shimadzu Corp | Spectral sensor |
| US5144498A (en) | 1990-02-14 | 1992-09-01 | Hewlett-Packard Company | Variable wavelength light filter and sensor system |
| JPH076839B2 (ja) | 1991-03-29 | 1995-01-30 | 株式会社島津製作所 | 分光光度計 |
| US5784507A (en) * | 1991-04-05 | 1998-07-21 | Holm-Kennedy; James W. | Integrated optical wavelength discrimination devices and methods for fabricating same |
| JPH06120462A (ja) * | 1992-10-01 | 1994-04-28 | Matsushita Electron Corp | 固体撮像装置 |
| JP2713838B2 (ja) | 1992-10-15 | 1998-02-16 | 浜松ホトニクス株式会社 | 分光イメージングセンサ |
| JPH1078353A (ja) | 1996-09-02 | 1998-03-24 | Yokogawa Electric Corp | 分光装置および分光装置のダイクロイックミラーアレイの製造方法 |
| US6785002B2 (en) | 2001-03-16 | 2004-08-31 | Optical Coating Laboratory, Inc. | Variable filter-based optical spectrometer |
| US7015457B2 (en) | 2002-03-18 | 2006-03-21 | Honeywell International Inc. | Spectrally tunable detector |
| JPWO2003091676A1 (ja) | 2002-04-23 | 2005-09-02 | 前田 弘 | 小型パッケージ分光センサーユニット |
| JP2005037762A (ja) * | 2003-07-17 | 2005-02-10 | Sun Tec Kk | 光学素子、波長可変光フィルタ、光アドドロップモジュールおよび波長可変光源 |
| WO2006130164A2 (en) | 2004-08-19 | 2006-12-07 | University Of Pittsburgh | Chip-scale optical spectrum analyzers with enhanced resolution |
| US7310153B2 (en) | 2004-08-23 | 2007-12-18 | Palo Alto Research Center, Incorporated | Using position-sensitive detectors for wavelength determination |
| JP2006284474A (ja) * | 2005-04-04 | 2006-10-19 | Nikon Corp | フォトセンサ |
| CN1888833A (zh) | 2005-06-30 | 2007-01-03 | 天津麦索特科技发展有限公司 | 全光谱、双cmos线性成像传感器检测装置及其检测方法 |
| US7386199B2 (en) | 2005-12-22 | 2008-06-10 | Palo Alto Research Center Incorporated | Providing light to channels or portions |
| US8437582B2 (en) | 2005-12-22 | 2013-05-07 | Palo Alto Research Center Incorporated | Transmitting light with lateral variation |
| US7718948B2 (en) | 2006-12-04 | 2010-05-18 | Palo Alto Research Center Incorporated | Monitoring light pulses |
| US7852490B2 (en) | 2007-02-05 | 2010-12-14 | Palo Alto Research Center Incorporated | Implanting optical cavity structures |
| JP5230952B2 (ja) * | 2007-02-13 | 2013-07-10 | オリンパス株式会社 | 内視鏡用可変分光素子、分光装置および内視鏡システム |
| WO2008104928A1 (en) | 2007-03-01 | 2008-09-04 | Philips Intellectual Property & Standards Gmbh | Optical detector device |
| JP2008232843A (ja) | 2007-03-20 | 2008-10-02 | Casio Comput Co Ltd | 分光強度測定素子 |
| EP2132542A4 (en) | 2007-04-03 | 2014-01-08 | Mutoh Ind Ltd | Spectrophotometer and corresponding method |
| JP5074291B2 (ja) | 2008-05-15 | 2012-11-14 | 浜松ホトニクス株式会社 | 分光モジュール |
| JP5207938B2 (ja) | 2008-05-15 | 2013-06-12 | 浜松ホトニクス株式会社 | 分光モジュール及び分光モジュールの製造方法 |
| JP2011169943A (ja) | 2010-02-16 | 2011-09-01 | Seiko Epson Corp | 波長可変干渉フィルター、光センサーおよび分析機器 |
| JP5998426B2 (ja) | 2010-03-05 | 2016-09-28 | セイコーエプソン株式会社 | 光学センサー及び電子機器 |
| JP5609542B2 (ja) | 2010-10-28 | 2014-10-22 | セイコーエプソン株式会社 | 光測定装置 |
| JP5641220B2 (ja) | 2010-11-12 | 2014-12-17 | セイコーエプソン株式会社 | 波長可変干渉フィルター、光モジュール、及び光分析装置 |
| JP5707107B2 (ja) | 2010-11-22 | 2015-04-22 | 浜松ホトニクス株式会社 | 分光センサ |
| JP5634836B2 (ja) | 2010-11-22 | 2014-12-03 | 浜松ホトニクス株式会社 | 分光センサの製造方法 |
| WO2013084746A1 (ja) * | 2011-12-06 | 2013-06-13 | コニカミノルタ株式会社 | 光半導体パッケージ、マイケルソン干渉計、およびフーリエ変換分光分析装置 |
| JP5926610B2 (ja) | 2012-05-18 | 2016-05-25 | 浜松ホトニクス株式会社 | 分光センサ |
| JP6119325B2 (ja) | 2013-03-14 | 2017-04-26 | セイコーエプソン株式会社 | 干渉フィルター、干渉フィルターの製造方法、光学モジュール、電子機器、及び接合基板 |
| JP6390090B2 (ja) | 2013-11-19 | 2018-09-19 | セイコーエプソン株式会社 | 光学フィルターデバイス、光学モジュール、及び電子機器 |
-
2012
- 2012-05-18 JP JP2012114336A patent/JP5875936B2/ja active Active
-
2013
- 2013-05-08 DE DE112013002560.4T patent/DE112013002560B4/de active Active
- 2013-05-08 US US14/400,702 patent/US9671286B2/en active Active
- 2013-05-08 WO PCT/JP2013/062953 patent/WO2013172234A1/ja not_active Ceased
- 2013-05-08 CN CN201380023041.6A patent/CN104272069B/zh active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02502490A (ja) | 1987-12-11 | 1990-08-09 | サンタ・バーバラ・リサーチ・センター | くさびフィルタ分光計 |
| JPH05322653A (ja) | 1992-05-26 | 1993-12-07 | Hamamatsu Photonics Kk | 半導体光検出装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12455191B2 (en) | 2020-11-30 | 2025-10-28 | Silios Technologies | Multispectral imager with enlarged spectral domain |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104272069B (zh) | 2016-04-06 |
| JP5875936B2 (ja) | 2016-03-02 |
| WO2013172234A1 (ja) | 2013-11-21 |
| US9671286B2 (en) | 2017-06-06 |
| US20150138560A1 (en) | 2015-05-21 |
| DE112013002560T5 (de) | 2015-02-05 |
| CN104272069A (zh) | 2015-01-07 |
| JP2013242177A (ja) | 2013-12-05 |
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Legal Events
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| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final |