DE1093912B - Verfahren zur Herstellung von Kristallgleichrichtern und Kristallverstaerkern - Google Patents
Verfahren zur Herstellung von Kristallgleichrichtern und KristallverstaerkernInfo
- Publication number
- DE1093912B DE1093912B DEST8480A DEST008480A DE1093912B DE 1093912 B DE1093912 B DE 1093912B DE ST8480 A DEST8480 A DE ST8480A DE ST008480 A DEST008480 A DE ST008480A DE 1093912 B DE1093912 B DE 1093912B
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor
- crystal
- rectifiers
- sheets
- conducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title claims description 15
- 238000000034 method Methods 0.000 title claims description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 38
- 239000002184 metal Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 238000002844 melting Methods 0.000 claims description 6
- 230000008018 melting Effects 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 239000011888 foil Substances 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 description 10
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000007373 indentation Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/40—Resistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
- H10D62/834—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge further characterised by the dopants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEST8480A DE1093912B (de) | 1954-07-21 | 1954-07-21 | Verfahren zur Herstellung von Kristallgleichrichtern und Kristallverstaerkern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEST8480A DE1093912B (de) | 1954-07-21 | 1954-07-21 | Verfahren zur Herstellung von Kristallgleichrichtern und Kristallverstaerkern |
Publications (2)
Publication Number | Publication Date |
---|---|
DE1093912B true DE1093912B (de) | 1960-12-01 |
DE1093912C2 DE1093912C2 (en, 2012) | 1961-05-25 |
Family
ID=7454506
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEST8480A Granted DE1093912B (de) | 1954-07-21 | 1954-07-21 | Verfahren zur Herstellung von Kristallgleichrichtern und Kristallverstaerkern |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE1093912B (en, 2012) |
-
1954
- 1954-07-21 DE DEST8480A patent/DE1093912B/de active Granted
Non-Patent Citations (1)
Title |
---|
None * |
Also Published As
Publication number | Publication date |
---|---|
DE1093912C2 (en, 2012) | 1961-05-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2312413A1 (de) | Verfahren zur herstellung von matrixkreisen mit in serie geschalteten gattern | |
DE2215357A1 (de) | Verfahren zum Herstellen eines intermetallischen Kontakts an einem Halbleiterbauteil | |
DE3046358C2 (de) | Feldeffekttransistor in Dünnfilmausbildung | |
DE1614148A1 (de) | Verfahren zum Herstellen einer Elektrode fuer Halbleiterbauelemente | |
DE3346833C2 (de) | Halbleiterelement | |
EP0071916B1 (de) | Leistungs-MOS-Feldeffekttransistor und Verfahren zu seiner Herstellung | |
DE2117365A1 (de) | Integrierte Schaltung und Verfahren zu ihrer Herstellung | |
DE2500235C2 (de) | Ein-PN-Übergang-Planartransistor | |
DE1093912B (de) | Verfahren zur Herstellung von Kristallgleichrichtern und Kristallverstaerkern | |
DE3232336A1 (de) | Thermoelektrische halbleitereinrichtung | |
DE102019219310A1 (de) | Halbleitervorrichtung | |
DE1639177C3 (de) | Monolithisch integrierte Gleichrichterschaltung | |
DE1130525B (de) | Flaechentransistor mit einem scheibenfoermigen Halbleiterkoerper eines bestimmten Leitungstyps | |
DE1262388B (de) | Verfahren zur Erzeugung eines nicht-gleichrichtenden UEbergangs zwischen einer Elektrode und einem dotierten thermoelelktrischen Halbleiter fuer ein thermoelektrisches Geraet | |
DE2952318C2 (de) | Integrierte Schaltungsanordnung und Verfahren zu ihrer Herstellung | |
DE1116829B (de) | Verfahren zur Herstellung einer Halbleiteranordnung | |
DE3710503A1 (de) | Integrierte halbleiterschaltungsvorrichtung | |
DE1800193A1 (de) | Verfahren zum Herstellen von Kontakten | |
DE2917082C2 (en, 2012) | ||
DE19613409A1 (de) | Leistungsbauelementanordnung | |
DE1539333C (de) | Thermoelektrische Anordnung und Verfahren zu ihrer Herstellung | |
DE1764834C3 (de) | Verfahren zur Herstellung eines Feldeffekt-Transistors | |
DE1040700B (de) | Verfahren zur Herstellung eines Diffusionstransistors | |
DE1163977B (de) | Sperrfreier Kontakt an einer Zone des Halbleiterkoerpers eines Halbleiterbauelementes | |
DE1957774C (de) | Verfahren zum Herstellen einer gleichrichtenden Halbleiteranordnung |