DE10203580A1 - Verfahren und Vorrichtung zum Aufbringen von Teilchen auf Oberflächen - Google Patents
Verfahren und Vorrichtung zum Aufbringen von Teilchen auf OberflächenInfo
- Publication number
- DE10203580A1 DE10203580A1 DE10203580A DE10203580A DE10203580A1 DE 10203580 A1 DE10203580 A1 DE 10203580A1 DE 10203580 A DE10203580 A DE 10203580A DE 10203580 A DE10203580 A DE 10203580A DE 10203580 A1 DE10203580 A1 DE 10203580A1
- Authority
- DE
- Germany
- Prior art keywords
- line
- flow
- aerosol
- coating
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000002245 particle Substances 0.000 title claims abstract description 124
- 238000000034 method Methods 0.000 title description 10
- 238000000576 coating method Methods 0.000 claims abstract description 117
- 239000011248 coating agent Substances 0.000 claims abstract description 115
- 239000000443 aerosol Substances 0.000 claims abstract description 105
- 239000000758 substrate Substances 0.000 claims abstract description 3
- 239000007788 liquid Substances 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 3
- 238000011144 upstream manufacturing Methods 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims 14
- 230000001934 delay Effects 0.000 abstract 1
- 239000011324 bead Substances 0.000 description 22
- 235000012431 wafers Nutrition 0.000 description 11
- 238000000889 atomisation Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 241001397173 Kali <angiosperm> Species 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006199 nebulizer Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0266—Investigating particle size or size distribution with electrical classification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/0012—Apparatus for achieving spraying before discharge from the apparatus
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0255—Investigating particle size or size distribution with mechanical, e.g. inertial, classification, and investigation of sorted collections
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0272—Investigating particle size or size distribution with screening; with classification by filtering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0255—Investigating particle size or size distribution with mechanical, e.g. inertial, classification, and investigation of sorted collections
- G01N2015/0261—Investigating particle size or size distribution with mechanical, e.g. inertial, classification, and investigation of sorted collections using impactors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N2015/0288—Sorting the particles
Landscapes
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Dispersion Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Nozzles (AREA)
- Sampling And Sample Adjustment (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/772,688 US6607597B2 (en) | 2001-01-30 | 2001-01-30 | Method and apparatus for deposition of particles on surfaces |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10203580A1 true DE10203580A1 (de) | 2002-08-01 |
Family
ID=25095874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10203580A Ceased DE10203580A1 (de) | 2001-01-30 | 2002-01-30 | Verfahren und Vorrichtung zum Aufbringen von Teilchen auf Oberflächen |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6607597B2 (enExample) |
| JP (1) | JP4139112B2 (enExample) |
| DE (1) | DE10203580A1 (enExample) |
Families Citing this family (53)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7045015B2 (en) | 1998-09-30 | 2006-05-16 | Optomec Design Company | Apparatuses and method for maskless mesoscale material deposition |
| US7938079B2 (en) * | 1998-09-30 | 2011-05-10 | Optomec Design Company | Annular aerosol jet deposition using an extended nozzle |
| US7108894B2 (en) | 1998-09-30 | 2006-09-19 | Optomec Design Company | Direct Write™ System |
| US20050156991A1 (en) * | 1998-09-30 | 2005-07-21 | Optomec Design Company | Maskless direct write of copper using an annular aerosol jet |
| US8110247B2 (en) | 1998-09-30 | 2012-02-07 | Optomec Design Company | Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials |
| US20070044513A1 (en) * | 1999-08-18 | 2007-03-01 | Kear Bernard H | Shrouded-plasma process and apparatus for the production of metastable nanostructured materials |
| US6833028B1 (en) * | 2001-02-09 | 2004-12-21 | The Scatter Works Inc. | Particle deposition system with enhanced speed and diameter accuracy |
| JP2005510690A (ja) * | 2001-04-27 | 2005-04-21 | マイクロリス コーポレイション | マスフローコントローラおよびマスフローメータにおける出力をフィルタリングするためのシステムおよび方法 |
| US7008481B2 (en) * | 2002-05-24 | 2006-03-07 | Innovative Thin Films, Ltd. | Method and apparatus for depositing a homogeneous pyrolytic coating on substrates |
| US7534363B2 (en) * | 2002-12-13 | 2009-05-19 | Lam Research Corporation | Method for providing uniform removal of organic material |
| US7169231B2 (en) * | 2002-12-13 | 2007-01-30 | Lam Research Corporation | Gas distribution system with tuning gas |
| US20040112540A1 (en) * | 2002-12-13 | 2004-06-17 | Lam Research Corporation | Uniform etch system |
| US9360249B2 (en) * | 2004-01-16 | 2016-06-07 | Ihi E&C International Corporation | Gas conditioning process for the recovery of LPG/NGL (C2+) from LNG |
| KR100567788B1 (ko) * | 2004-02-13 | 2006-04-05 | 주식회사 현대교정인증기술원 | 입자측정기 및 입자측정방법 |
| JP4421393B2 (ja) * | 2004-06-22 | 2010-02-24 | 東京エレクトロン株式会社 | 基板処理装置 |
| US20060280866A1 (en) * | 2004-10-13 | 2006-12-14 | Optomec Design Company | Method and apparatus for mesoscale deposition of biological materials and biomaterials |
| US7882799B2 (en) * | 2004-10-18 | 2011-02-08 | Msp Corporation | Method and apparatus for generating charged particles for deposition on a surface |
| US7938341B2 (en) | 2004-12-13 | 2011-05-10 | Optomec Design Company | Miniature aerosol jet and aerosol jet array |
| US20080013299A1 (en) * | 2004-12-13 | 2008-01-17 | Optomec, Inc. | Direct Patterning for EMI Shielding and Interconnects Using Miniature Aerosol Jet and Aerosol Jet Array |
| US7674671B2 (en) | 2004-12-13 | 2010-03-09 | Optomec Design Company | Aerodynamic jetting of aerosolized fluids for fabrication of passive structures |
| US20070020115A1 (en) * | 2005-07-01 | 2007-01-25 | The Boc Group, Inc. | Integrated pump apparatus for semiconductor processing |
| US7387038B2 (en) * | 2005-07-29 | 2008-06-17 | Horiba Instruments, Inc. | Wide range constant concentration particle generating system |
| AT502207B1 (de) * | 2005-08-05 | 2007-11-15 | Univ Wien | Verfahren zum klassifizieren und trennen von teilchen sowie vorrichtung zur durchführung dieses verfahrens |
| ATE532585T1 (de) * | 2005-08-24 | 2011-11-15 | Brother Ind Ltd | Fimbildungsvorrichtung und strahldüse |
| US7932181B2 (en) | 2006-06-20 | 2011-04-26 | Lam Research Corporation | Edge gas injection for critical dimension uniformity improvement |
| US8499581B2 (en) * | 2006-10-06 | 2013-08-06 | Ihi E&C International Corporation | Gas conditioning method and apparatus for the recovery of LPG/NGL(C2+) from LNG |
| KR100901193B1 (ko) | 2007-07-12 | 2009-06-04 | 한양대학교 산학협력단 | 파티클 입자 증착 설비 |
| US20090029064A1 (en) * | 2007-07-25 | 2009-01-29 | Carlton Maurice Truesdale | Apparatus and method for making nanoparticles using a hot wall reactor |
| TWI482662B (zh) | 2007-08-30 | 2015-05-01 | Optomec Inc | 機械上一體式及緊密式耦合之列印頭以及噴霧源 |
| TWI538737B (zh) | 2007-08-31 | 2016-06-21 | 阿普托麥克股份有限公司 | 材料沉積總成 |
| US8887658B2 (en) | 2007-10-09 | 2014-11-18 | Optomec, Inc. | Multiple sheath multiple capillary aerosol jet |
| JP4521062B2 (ja) * | 2007-10-16 | 2010-08-11 | パナソニック株式会社 | 成膜方法および成膜装置 |
| FI122502B (fi) * | 2007-12-20 | 2012-02-29 | Beneq Oy | Menetelmä ja laite lasin pinnoittamiseksi |
| US8573034B2 (en) * | 2008-01-22 | 2013-11-05 | Ct Associates, Inc. | Residue concentration measurement technology |
| FI20080264A7 (fi) * | 2008-04-03 | 2009-10-04 | Beneq Oy | Pinnoitusmenetelmä ja -laite |
| DE102009007800A1 (de) * | 2009-02-06 | 2010-08-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Aerosol-Drucker, dessen Verwendung und Verfahren zur Herstellung von Linienunterbrechungen bei kontinuierlichen Aerosol-Druckverfahren |
| FI20090319A0 (fi) * | 2009-09-03 | 2009-09-03 | Beneq Oy | Prosessinsäätömenetelmä |
| KR100964144B1 (ko) * | 2010-01-22 | 2010-06-17 | 한국에스티기술(주) | 정전기발생에 의한 수직형 미연탄소분 분리장치 |
| US9239279B1 (en) | 2011-06-03 | 2016-01-19 | Arkansas State University—Jonesboro | Sequential differential mobility analyzer and method of using same |
| WO2016130709A1 (en) | 2015-02-10 | 2016-08-18 | Optomec, Inc. | Fabrication of three-dimensional structures by in-flight curing of aerosols |
| EP3463677A4 (en) * | 2016-06-01 | 2020-02-05 | Arizona Board of Regents on behalf of Arizona State University | SYSTEM AND METHODS FOR SPRAYING BY DEPOSITION OF PARTICULATE COATINGS |
| EP3421947B1 (en) | 2017-06-30 | 2019-08-07 | Sensirion AG | Operation method for flow sensor device |
| EP3258241B1 (en) * | 2017-09-14 | 2019-12-25 | Sensirion AG | Particulate matter sensor device |
| EP3723909B1 (en) * | 2017-11-13 | 2023-10-25 | Optomec, Inc. | Shuttering of aerosol streams |
| NL2022412B1 (en) * | 2019-01-17 | 2020-08-18 | Vsparticle Holding B V | Switching device, deposition device comprising the switching device, method for switching a fluid flow, and method for depositing particles onto a substrate |
| US11754635B2 (en) * | 2019-07-12 | 2023-09-12 | Rai Strategic Holdings, Inc. | Power unit test system and method |
| US11441974B2 (en) * | 2019-08-01 | 2022-09-13 | Applied Materials, Inc. | Detection of surface particles on chamber components with carbon dioxide |
| CN112033913B (zh) * | 2020-08-25 | 2024-03-22 | 中国科学院合肥物质科学研究院 | 基于表面等离激元共振成像的纳米单颗粒物含水量测量装置及方法 |
| CN112519417B (zh) * | 2020-11-28 | 2022-03-29 | 厦门理工学院 | 一种双鞘气气溶胶喷印方法及喷印头 |
| CN113199776B (zh) * | 2021-03-15 | 2023-04-28 | 厦门理工学院 | 一种纳米颗粒气溶胶喷印方法及装置 |
| TW202247905A (zh) | 2021-04-29 | 2022-12-16 | 美商阿普托麥克股份有限公司 | 用於氣溶膠噴射裝置之高可靠性鞘護輸送路徑 |
| JP7517277B2 (ja) * | 2021-07-14 | 2024-07-17 | トヨタ自動車株式会社 | 電極製造装置 |
| JP2024064401A (ja) * | 2022-10-28 | 2024-05-14 | 株式会社島津製作所 | 質量分析装置 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4284495A (en) | 1979-12-10 | 1981-08-18 | Newton William A | Coating apparatus and method |
| US4301002A (en) | 1980-03-27 | 1981-11-17 | The United States Of America As Represented By The United States Department Of Energy | High efficiency virtual impactor |
| ATE75167T1 (de) | 1984-02-13 | 1992-05-15 | Jerome J Schmitt Iii | Verfahren und vorrichtung fuer gasstrahlniederschlag von leitfaehigen und dielektrischen duennen festfilmen und so hergestellte erzeugnisse. |
| US4610760A (en) * | 1984-08-24 | 1986-09-09 | General Foods Corporation | Three-fluid atomizing nozzle and method of utilization thereof |
| DE3521529A1 (de) | 1985-06-15 | 1987-01-02 | Harald Dipl Chem Dr Berndt | Vorrichtung zum zerstaeuben von probenfluessigkeit fuer spektroskopische zwecke |
| US4794086A (en) * | 1985-11-25 | 1988-12-27 | Liquid Air Corporation | Method for measurement of impurities in liquids |
| JPH0663961B2 (ja) * | 1986-03-24 | 1994-08-22 | 日本科学工業株式会社 | 液中不純物測定方法とその測定装置 |
| US4670135A (en) | 1986-06-27 | 1987-06-02 | Regents Of The University Of Minnesota | High volume virtual impactor |
| US4767524A (en) | 1987-08-05 | 1988-08-30 | Lovelace Medical Foundation | Virtual impactor |
| US5614252A (en) | 1988-12-27 | 1997-03-25 | Symetrix Corporation | Method of fabricating barium strontium titanate |
| US5456945A (en) | 1988-12-27 | 1995-10-10 | Symetrix Corporation | Method and apparatus for material deposition |
| US5316579A (en) | 1988-12-27 | 1994-05-31 | Symetrix Corporation | Apparatus for forming a thin film with a mist forming means |
| US5688565A (en) | 1988-12-27 | 1997-11-18 | Symetrix Corporation | Misted deposition method of fabricating layered superlattice materials |
| US4990740A (en) | 1989-03-06 | 1991-02-05 | The Dow Chemical Company | Intra-microspray ICP torch |
| US4996080A (en) | 1989-04-05 | 1991-02-26 | Olin Hunt Specialty Products Inc. | Process for coating a photoresist composition onto a substrate |
| FR2658913B1 (fr) | 1990-02-27 | 1992-04-30 | Commissariat Energie Atomique | Procede et dispositif d'etalonnage d'un compteur de particules. |
| US5364562A (en) | 1990-04-17 | 1994-11-15 | Xingwu Wang | Aerosol-plasma deposition of insulating oxide powder |
| US5171360A (en) | 1990-08-30 | 1992-12-15 | University Of Southern California | Method for droplet stream manufacturing |
| US5203547A (en) * | 1990-11-29 | 1993-04-20 | Canon Kabushiki Kaisha | Vacuum attraction type substrate holding device |
| US5962085A (en) * | 1991-02-25 | 1999-10-05 | Symetrix Corporation | Misted precursor deposition apparatus and method with improved mist and mist flow |
| US5229171A (en) | 1991-12-23 | 1993-07-20 | Research Triangle Institute | Apparatus and method for uniformly coating a substrate in an evacuable chamber |
| US5306345A (en) | 1992-08-25 | 1994-04-26 | Particle Solutions | Deposition chamber for deposition of particles on semiconductor wafers |
| US5534309A (en) | 1994-06-21 | 1996-07-09 | Msp Corporation | Method and apparatus for depositing particles on surfaces |
| US5916640A (en) | 1996-09-06 | 1999-06-29 | Msp Corporation | Method and apparatus for controlled particle deposition on surfaces |
| US5807435A (en) | 1997-03-13 | 1998-09-15 | Thomson Consumer Electronics, Inc. | Spray module having shielding means and collecting means |
-
2001
- 2001-01-30 US US09/772,688 patent/US6607597B2/en not_active Expired - Lifetime
-
2002
- 2002-01-30 DE DE10203580A patent/DE10203580A1/de not_active Ceased
- 2002-01-30 JP JP2002021269A patent/JP4139112B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002355584A (ja) | 2002-12-10 |
| US20020100416A1 (en) | 2002-08-01 |
| JP4139112B2 (ja) | 2008-08-27 |
| US6607597B2 (en) | 2003-08-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee | ||
| R003 | Refusal decision now final |