JP4139112B2 - 粒子を表面上に堆積させる堆積装置 - Google Patents

粒子を表面上に堆積させる堆積装置 Download PDF

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Publication number
JP4139112B2
JP4139112B2 JP2002021269A JP2002021269A JP4139112B2 JP 4139112 B2 JP4139112 B2 JP 4139112B2 JP 2002021269 A JP2002021269 A JP 2002021269A JP 2002021269 A JP2002021269 A JP 2002021269A JP 4139112 B2 JP4139112 B2 JP 4139112B2
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flow
particles
aerosol
deposition
flow path
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Japanese (ja)
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JP2002355584A (ja
JP2002355584A5 (enExample
Inventor
ジェームズ・ジェイ・サン
ベンジャミン・ワイ・エイチ・リュー
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エムエスピー・コーポレーション
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0266—Investigating particle size or size distribution with electrical classification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/0012—Apparatus for achieving spraying before discharge from the apparatus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0255—Investigating particle size or size distribution with mechanical, e.g. inertial, classification, and investigation of sorted collections
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0272—Investigating particle size or size distribution with screening; with classification by filtering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0255—Investigating particle size or size distribution with mechanical, e.g. inertial, classification, and investigation of sorted collections
    • G01N2015/0261—Investigating particle size or size distribution with mechanical, e.g. inertial, classification, and investigation of sorted collections using impactors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N2015/0288—Sorting the particles

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  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Nozzles (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2002021269A 2001-01-30 2002-01-30 粒子を表面上に堆積させる堆積装置 Expired - Fee Related JP4139112B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/772688 2001-01-30
US09/772,688 US6607597B2 (en) 2001-01-30 2001-01-30 Method and apparatus for deposition of particles on surfaces

Publications (3)

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JP2002355584A JP2002355584A (ja) 2002-12-10
JP2002355584A5 JP2002355584A5 (enExample) 2005-08-11
JP4139112B2 true JP4139112B2 (ja) 2008-08-27

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JP2002021269A Expired - Fee Related JP4139112B2 (ja) 2001-01-30 2002-01-30 粒子を表面上に堆積させる堆積装置

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US (1) US6607597B2 (enExample)
JP (1) JP4139112B2 (enExample)
DE (1) DE10203580A1 (enExample)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7045015B2 (en) 1998-09-30 2006-05-16 Optomec Design Company Apparatuses and method for maskless mesoscale material deposition
US7938079B2 (en) * 1998-09-30 2011-05-10 Optomec Design Company Annular aerosol jet deposition using an extended nozzle
US7108894B2 (en) 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US20050156991A1 (en) * 1998-09-30 2005-07-21 Optomec Design Company Maskless direct write of copper using an annular aerosol jet
US8110247B2 (en) 1998-09-30 2012-02-07 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
US20070044513A1 (en) * 1999-08-18 2007-03-01 Kear Bernard H Shrouded-plasma process and apparatus for the production of metastable nanostructured materials
US6833028B1 (en) * 2001-02-09 2004-12-21 The Scatter Works Inc. Particle deposition system with enhanced speed and diameter accuracy
JP2005510690A (ja) * 2001-04-27 2005-04-21 マイクロリス コーポレイション マスフローコントローラおよびマスフローメータにおける出力をフィルタリングするためのシステムおよび方法
US7008481B2 (en) * 2002-05-24 2006-03-07 Innovative Thin Films, Ltd. Method and apparatus for depositing a homogeneous pyrolytic coating on substrates
US7534363B2 (en) * 2002-12-13 2009-05-19 Lam Research Corporation Method for providing uniform removal of organic material
US7169231B2 (en) * 2002-12-13 2007-01-30 Lam Research Corporation Gas distribution system with tuning gas
US20040112540A1 (en) * 2002-12-13 2004-06-17 Lam Research Corporation Uniform etch system
US9360249B2 (en) * 2004-01-16 2016-06-07 Ihi E&C International Corporation Gas conditioning process for the recovery of LPG/NGL (C2+) from LNG
KR100567788B1 (ko) * 2004-02-13 2006-04-05 주식회사 현대교정인증기술원 입자측정기 및 입자측정방법
JP4421393B2 (ja) * 2004-06-22 2010-02-24 東京エレクトロン株式会社 基板処理装置
US20060280866A1 (en) * 2004-10-13 2006-12-14 Optomec Design Company Method and apparatus for mesoscale deposition of biological materials and biomaterials
US7882799B2 (en) * 2004-10-18 2011-02-08 Msp Corporation Method and apparatus for generating charged particles for deposition on a surface
US7938341B2 (en) 2004-12-13 2011-05-10 Optomec Design Company Miniature aerosol jet and aerosol jet array
US20080013299A1 (en) * 2004-12-13 2008-01-17 Optomec, Inc. Direct Patterning for EMI Shielding and Interconnects Using Miniature Aerosol Jet and Aerosol Jet Array
US7674671B2 (en) 2004-12-13 2010-03-09 Optomec Design Company Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
US20070020115A1 (en) * 2005-07-01 2007-01-25 The Boc Group, Inc. Integrated pump apparatus for semiconductor processing
US7387038B2 (en) * 2005-07-29 2008-06-17 Horiba Instruments, Inc. Wide range constant concentration particle generating system
AT502207B1 (de) * 2005-08-05 2007-11-15 Univ Wien Verfahren zum klassifizieren und trennen von teilchen sowie vorrichtung zur durchführung dieses verfahrens
ATE532585T1 (de) * 2005-08-24 2011-11-15 Brother Ind Ltd Fimbildungsvorrichtung und strahldüse
US7932181B2 (en) 2006-06-20 2011-04-26 Lam Research Corporation Edge gas injection for critical dimension uniformity improvement
US8499581B2 (en) * 2006-10-06 2013-08-06 Ihi E&C International Corporation Gas conditioning method and apparatus for the recovery of LPG/NGL(C2+) from LNG
KR100901193B1 (ko) 2007-07-12 2009-06-04 한양대학교 산학협력단 파티클 입자 증착 설비
US20090029064A1 (en) * 2007-07-25 2009-01-29 Carlton Maurice Truesdale Apparatus and method for making nanoparticles using a hot wall reactor
TWI482662B (zh) 2007-08-30 2015-05-01 Optomec Inc 機械上一體式及緊密式耦合之列印頭以及噴霧源
TWI538737B (zh) 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
US8887658B2 (en) 2007-10-09 2014-11-18 Optomec, Inc. Multiple sheath multiple capillary aerosol jet
JP4521062B2 (ja) * 2007-10-16 2010-08-11 パナソニック株式会社 成膜方法および成膜装置
FI122502B (fi) * 2007-12-20 2012-02-29 Beneq Oy Menetelmä ja laite lasin pinnoittamiseksi
US8573034B2 (en) * 2008-01-22 2013-11-05 Ct Associates, Inc. Residue concentration measurement technology
FI20080264A7 (fi) * 2008-04-03 2009-10-04 Beneq Oy Pinnoitusmenetelmä ja -laite
DE102009007800A1 (de) * 2009-02-06 2010-08-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Aerosol-Drucker, dessen Verwendung und Verfahren zur Herstellung von Linienunterbrechungen bei kontinuierlichen Aerosol-Druckverfahren
FI20090319A0 (fi) * 2009-09-03 2009-09-03 Beneq Oy Prosessinsäätömenetelmä
KR100964144B1 (ko) * 2010-01-22 2010-06-17 한국에스티기술(주) 정전기발생에 의한 수직형 미연탄소분 분리장치
US9239279B1 (en) 2011-06-03 2016-01-19 Arkansas State University—Jonesboro Sequential differential mobility analyzer and method of using same
WO2016130709A1 (en) 2015-02-10 2016-08-18 Optomec, Inc. Fabrication of three-dimensional structures by in-flight curing of aerosols
EP3463677A4 (en) * 2016-06-01 2020-02-05 Arizona Board of Regents on behalf of Arizona State University SYSTEM AND METHODS FOR SPRAYING BY DEPOSITION OF PARTICULATE COATINGS
EP3421947B1 (en) 2017-06-30 2019-08-07 Sensirion AG Operation method for flow sensor device
EP3258241B1 (en) * 2017-09-14 2019-12-25 Sensirion AG Particulate matter sensor device
EP3723909B1 (en) * 2017-11-13 2023-10-25 Optomec, Inc. Shuttering of aerosol streams
NL2022412B1 (en) * 2019-01-17 2020-08-18 Vsparticle Holding B V Switching device, deposition device comprising the switching device, method for switching a fluid flow, and method for depositing particles onto a substrate
US11754635B2 (en) * 2019-07-12 2023-09-12 Rai Strategic Holdings, Inc. Power unit test system and method
US11441974B2 (en) * 2019-08-01 2022-09-13 Applied Materials, Inc. Detection of surface particles on chamber components with carbon dioxide
CN112033913B (zh) * 2020-08-25 2024-03-22 中国科学院合肥物质科学研究院 基于表面等离激元共振成像的纳米单颗粒物含水量测量装置及方法
CN112519417B (zh) * 2020-11-28 2022-03-29 厦门理工学院 一种双鞘气气溶胶喷印方法及喷印头
CN113199776B (zh) * 2021-03-15 2023-04-28 厦门理工学院 一种纳米颗粒气溶胶喷印方法及装置
TW202247905A (zh) 2021-04-29 2022-12-16 美商阿普托麥克股份有限公司 用於氣溶膠噴射裝置之高可靠性鞘護輸送路徑
JP7517277B2 (ja) * 2021-07-14 2024-07-17 トヨタ自動車株式会社 電極製造装置
JP2024064401A (ja) * 2022-10-28 2024-05-14 株式会社島津製作所 質量分析装置

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4284495A (en) 1979-12-10 1981-08-18 Newton William A Coating apparatus and method
US4301002A (en) 1980-03-27 1981-11-17 The United States Of America As Represented By The United States Department Of Energy High efficiency virtual impactor
ATE75167T1 (de) 1984-02-13 1992-05-15 Jerome J Schmitt Iii Verfahren und vorrichtung fuer gasstrahlniederschlag von leitfaehigen und dielektrischen duennen festfilmen und so hergestellte erzeugnisse.
US4610760A (en) * 1984-08-24 1986-09-09 General Foods Corporation Three-fluid atomizing nozzle and method of utilization thereof
DE3521529A1 (de) 1985-06-15 1987-01-02 Harald Dipl Chem Dr Berndt Vorrichtung zum zerstaeuben von probenfluessigkeit fuer spektroskopische zwecke
US4794086A (en) * 1985-11-25 1988-12-27 Liquid Air Corporation Method for measurement of impurities in liquids
JPH0663961B2 (ja) * 1986-03-24 1994-08-22 日本科学工業株式会社 液中不純物測定方法とその測定装置
US4670135A (en) 1986-06-27 1987-06-02 Regents Of The University Of Minnesota High volume virtual impactor
US4767524A (en) 1987-08-05 1988-08-30 Lovelace Medical Foundation Virtual impactor
US5614252A (en) 1988-12-27 1997-03-25 Symetrix Corporation Method of fabricating barium strontium titanate
US5456945A (en) 1988-12-27 1995-10-10 Symetrix Corporation Method and apparatus for material deposition
US5316579A (en) 1988-12-27 1994-05-31 Symetrix Corporation Apparatus for forming a thin film with a mist forming means
US5688565A (en) 1988-12-27 1997-11-18 Symetrix Corporation Misted deposition method of fabricating layered superlattice materials
US4990740A (en) 1989-03-06 1991-02-05 The Dow Chemical Company Intra-microspray ICP torch
US4996080A (en) 1989-04-05 1991-02-26 Olin Hunt Specialty Products Inc. Process for coating a photoresist composition onto a substrate
FR2658913B1 (fr) 1990-02-27 1992-04-30 Commissariat Energie Atomique Procede et dispositif d'etalonnage d'un compteur de particules.
US5364562A (en) 1990-04-17 1994-11-15 Xingwu Wang Aerosol-plasma deposition of insulating oxide powder
US5171360A (en) 1990-08-30 1992-12-15 University Of Southern California Method for droplet stream manufacturing
US5203547A (en) * 1990-11-29 1993-04-20 Canon Kabushiki Kaisha Vacuum attraction type substrate holding device
US5962085A (en) * 1991-02-25 1999-10-05 Symetrix Corporation Misted precursor deposition apparatus and method with improved mist and mist flow
US5229171A (en) 1991-12-23 1993-07-20 Research Triangle Institute Apparatus and method for uniformly coating a substrate in an evacuable chamber
US5306345A (en) 1992-08-25 1994-04-26 Particle Solutions Deposition chamber for deposition of particles on semiconductor wafers
US5534309A (en) 1994-06-21 1996-07-09 Msp Corporation Method and apparatus for depositing particles on surfaces
US5916640A (en) 1996-09-06 1999-06-29 Msp Corporation Method and apparatus for controlled particle deposition on surfaces
US5807435A (en) 1997-03-13 1998-09-15 Thomson Consumer Electronics, Inc. Spray module having shielding means and collecting means

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Publication number Publication date
JP2002355584A (ja) 2002-12-10
DE10203580A1 (de) 2002-08-01
US20020100416A1 (en) 2002-08-01
US6607597B2 (en) 2003-08-19

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