DE102010008162B4 - Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel - Google Patents
Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel Download PDFInfo
- Publication number
- DE102010008162B4 DE102010008162B4 DE102010008162.0A DE102010008162A DE102010008162B4 DE 102010008162 B4 DE102010008162 B4 DE 102010008162B4 DE 102010008162 A DE102010008162 A DE 102010008162A DE 102010008162 B4 DE102010008162 B4 DE 102010008162B4
- Authority
- DE
- Germany
- Prior art keywords
- quartz glass
- granules
- silica
- sio
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 145
- 238000000034 method Methods 0.000 title claims abstract description 60
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000008187 granular material Substances 0.000 claims abstract description 68
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 32
- 238000005245 sintering Methods 0.000 claims abstract description 26
- 239000002245 particle Substances 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 19
- 238000002844 melting Methods 0.000 claims abstract description 17
- 230000008018 melting Effects 0.000 claims abstract description 17
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 15
- 239000000155 melt Substances 0.000 claims abstract description 14
- 238000000280 densification Methods 0.000 claims abstract description 11
- 238000000465 moulding Methods 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
- 238000003825 pressing Methods 0.000 claims abstract description 6
- 238000010891 electric arc Methods 0.000 claims abstract 2
- 238000005469 granulation Methods 0.000 claims description 12
- 230000003179 granulation Effects 0.000 claims description 12
- 239000012634 fragment Substances 0.000 claims description 10
- 230000005484 gravity Effects 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- 238000007906 compression Methods 0.000 claims description 4
- 230000006835 compression Effects 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 239000005350 fused silica glass Substances 0.000 abstract description 5
- 239000012535 impurity Substances 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 241000237858 Gastropoda Species 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000006004 Quartz sand Substances 0.000 description 1
- 206010039509 Scab Diseases 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009172 bursting Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002510 pyrogen Substances 0.000 description 1
- 230000001698 pyrogenic effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000005550 wet granulation Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010008162.0A DE102010008162B4 (de) | 2010-02-16 | 2010-02-16 | Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel |
| JP2012553284A JP2013519624A (ja) | 2010-02-16 | 2011-02-15 | 石英ガラスるつぼの製造法 |
| CN2011800098057A CN102753493A (zh) | 2010-02-16 | 2011-02-15 | 用于生产石英玻璃坩埚的方法 |
| PCT/EP2011/052177 WO2011101327A1 (de) | 2010-02-16 | 2011-02-15 | Verfahren zur herstellung eines quarzglastiegels |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010008162.0A DE102010008162B4 (de) | 2010-02-16 | 2010-02-16 | Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102010008162A1 DE102010008162A1 (de) | 2011-08-18 |
| DE102010008162B4 true DE102010008162B4 (de) | 2017-03-16 |
Family
ID=43857631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102010008162.0A Expired - Fee Related DE102010008162B4 (de) | 2010-02-16 | 2010-02-16 | Verfahren für die Herstellung von Quarzglas für einen Quarzglastiegel |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2013519624A (enExample) |
| CN (1) | CN102753493A (enExample) |
| DE (1) | DE102010008162B4 (enExample) |
| WO (1) | WO2011101327A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011113130B3 (de) * | 2011-09-14 | 2013-01-24 | Heraeus Quarzglas Gmbh & Co. Kg | Solarstrahlungsempfänger mit einem Eintrittsfenster aus Quarzglas |
| EP3006606B1 (en) | 2013-05-31 | 2020-01-15 | Sumco Corporation | Silica glass crucible for use in pulling up of silicon single crystal, and method for manufacturing same |
| JP6208080B2 (ja) * | 2014-05-22 | 2017-10-04 | クアーズテック株式会社 | 石英ガラスルツボ |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698894A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| CN108779015B (zh) * | 2015-12-18 | 2021-10-26 | 贺利氏石英玻璃有限两合公司 | 从二氧化硅粉末制备石英玻璃体 |
| EP3339256A1 (de) * | 2016-12-23 | 2018-06-27 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von opakem quarzglas, und rohling aus dem opaken quarzglas |
| JP6941042B2 (ja) | 2017-12-12 | 2021-09-29 | 信越石英株式会社 | モールド及び石英ガラスるつぼの製造方法 |
| JP7141844B2 (ja) * | 2018-04-06 | 2022-09-26 | 信越石英株式会社 | 石英ガラスるつぼの製造方法 |
| JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
| CN115246704A (zh) * | 2021-04-27 | 2022-10-28 | 新沂市中鑫光电科技有限公司 | 一种石英坩埚透明层消除杂质元素方法 |
| CN113415978B (zh) * | 2021-07-03 | 2022-06-24 | 四川神光石英科技有限公司 | 一种耐辐照石英玻璃的制备方法及制备用坩埚和料架 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2578110A (en) * | 1942-04-13 | 1951-12-11 | Owens Corning Fiberglass Corp | Production of glass |
| DE10243953A1 (de) * | 2002-09-21 | 2004-04-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas |
| WO2007085511A1 (en) * | 2006-01-25 | 2007-08-02 | Evonik Degussa Gmbh | Pyrogenically prepared silicon dioxide compacted to give crusts |
| DE102007031633A1 (de) * | 2007-07-06 | 2009-01-08 | Evonik Degussa Gmbh | Verfahren zur Herstellung von hochreinem Siliciumdioxidgranulat |
| EP2014622A1 (de) * | 2007-07-06 | 2009-01-14 | Evonik Degussa GmbH | Kieselglasgranulat |
| DE102007049158A1 (de) * | 2007-10-13 | 2009-04-16 | Evonik Degussa Gmbh | Verwendung von Kieselglasgranulaten |
| DE102008030310B3 (de) * | 2008-06-30 | 2009-06-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglastiegels |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6246904A (ja) * | 1985-08-23 | 1987-02-28 | Sintokogio Ltd | 複酸化物粉末の製造方法 |
| JPS6451333A (en) * | 1987-08-17 | 1989-02-27 | Nippon Sheet Glass Co Ltd | Production of granulated material for raw glass material |
| JPH01107999A (ja) * | 1987-10-21 | 1989-04-25 | Kawasaki Heavy Ind Ltd | 粉体成形機 |
| JP2933404B2 (ja) * | 1990-06-25 | 1999-08-16 | 信越石英 株式会社 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
| DE19600299A1 (de) * | 1996-01-05 | 1997-07-10 | Gruenzweig & Hartmann | Formlinge sowie Verfahren und Vorrichtung zu deren Herstellung |
| DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
| DE10114484C2 (de) * | 2001-03-24 | 2003-10-16 | Heraeus Quarzglas | Verfahren für die Herstellung eines Komposit-Werkstoffs mit einem SiO¶2¶-Gehalt von mindestens 99 Gew.-%, und Verwendung des nach dem Verfahren erhaltenen Komposit-Werkstoffs |
| JP4300334B2 (ja) * | 2002-08-15 | 2009-07-22 | ジャパンスーパークォーツ株式会社 | 石英ガラスルツボの再生方法 |
| JP2006096616A (ja) * | 2004-09-29 | 2006-04-13 | Toshiba Ceramics Co Ltd | シリカガラスルツボ、シリカガラスルツボの製造方法 |
| JP5080764B2 (ja) * | 2005-08-08 | 2012-11-21 | 信越石英株式会社 | 石英ガラス坩堝の製造方法 |
| DE102008033945B4 (de) * | 2008-07-19 | 2012-03-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von mit Stickstoff dotiertem Quarzglas sowie zur Durchführung des Verfahrens geeignete Quarzglaskörnung, Verfahren zur Herstellung eines Quarzglasstrangs und Verfahren zur Herstellung eines Quarzglastiegels |
| JP2011157260A (ja) * | 2010-01-07 | 2011-08-18 | Mitsubishi Materials Corp | 合成非晶質シリカ粉末及びその製造方法 |
-
2010
- 2010-02-16 DE DE102010008162.0A patent/DE102010008162B4/de not_active Expired - Fee Related
-
2011
- 2011-02-15 WO PCT/EP2011/052177 patent/WO2011101327A1/de not_active Ceased
- 2011-02-15 JP JP2012553284A patent/JP2013519624A/ja active Pending
- 2011-02-15 CN CN2011800098057A patent/CN102753493A/zh active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2578110A (en) * | 1942-04-13 | 1951-12-11 | Owens Corning Fiberglass Corp | Production of glass |
| DE10243953A1 (de) * | 2002-09-21 | 2004-04-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Bauteils aus opakem Quarzglas |
| WO2007085511A1 (en) * | 2006-01-25 | 2007-08-02 | Evonik Degussa Gmbh | Pyrogenically prepared silicon dioxide compacted to give crusts |
| DE102007031633A1 (de) * | 2007-07-06 | 2009-01-08 | Evonik Degussa Gmbh | Verfahren zur Herstellung von hochreinem Siliciumdioxidgranulat |
| EP2014622A1 (de) * | 2007-07-06 | 2009-01-14 | Evonik Degussa GmbH | Kieselglasgranulat |
| DE102007049158A1 (de) * | 2007-10-13 | 2009-04-16 | Evonik Degussa Gmbh | Verwendung von Kieselglasgranulaten |
| DE102008030310B3 (de) * | 2008-06-30 | 2009-06-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Quarzglastiegels |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102753493A (zh) | 2012-10-24 |
| JP2013519624A (ja) | 2013-05-30 |
| WO2011101327A1 (de) | 2011-08-25 |
| DE102010008162A1 (de) | 2011-08-18 |
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| R082 | Change of representative |
Representative=s name: STAUDT, ARMIN, DIPL.-ING. (UNIV.), DE |
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| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |