DE102008058436B4 - Kantenemittierender Halbleiterlaserchip - Google Patents
Kantenemittierender Halbleiterlaserchip Download PDFInfo
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- DE102008058436B4 DE102008058436B4 DE102008058436.3A DE102008058436A DE102008058436B4 DE 102008058436 B4 DE102008058436 B4 DE 102008058436B4 DE 102008058436 A DE102008058436 A DE 102008058436A DE 102008058436 B4 DE102008058436 B4 DE 102008058436B4
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
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- H01S5/1017—Waveguide having a void for insertion of materials to change optical properties
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- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
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- H01S5/00—Semiconductor lasers
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
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- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
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- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
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- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
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- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Acoustics & Sound (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008058436.3A DE102008058436B4 (de) | 2008-11-21 | 2008-11-21 | Kantenemittierender Halbleiterlaserchip |
| EP09765010.5A EP2347482B1 (de) | 2008-11-21 | 2009-10-21 | Kantenemittierender halbleiterlaserchip |
| CN2009801468590A CN102224647B (zh) | 2008-11-21 | 2009-10-21 | 边发射半导体激光器芯片 |
| JP2011536734A JP5528465B2 (ja) | 2008-11-21 | 2009-10-21 | エッジ発光型半導体レーザチップ |
| PL09765010T PL2347482T3 (pl) | 2008-11-21 | 2009-10-21 | Półprzewodnikowy chip laserowy z emisją krawędziową |
| KR1020117014107A KR101637054B1 (ko) | 2008-11-21 | 2009-10-21 | 에지방출형 반도체 레이저칩 |
| PCT/DE2009/001482 WO2010057455A2 (de) | 2008-11-21 | 2009-10-21 | Kantenemittierender halbleiterlaserchip |
| US13/127,887 US8831061B2 (en) | 2008-11-21 | 2009-10-21 | Edge emitting semiconductor laser chip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008058436.3A DE102008058436B4 (de) | 2008-11-21 | 2008-11-21 | Kantenemittierender Halbleiterlaserchip |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102008058436A1 DE102008058436A1 (de) | 2010-05-27 |
| DE102008058436B4 true DE102008058436B4 (de) | 2019-03-07 |
Family
ID=42114520
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102008058436.3A Active DE102008058436B4 (de) | 2008-11-21 | 2008-11-21 | Kantenemittierender Halbleiterlaserchip |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8831061B2 (https=) |
| EP (1) | EP2347482B1 (https=) |
| JP (1) | JP5528465B2 (https=) |
| KR (1) | KR101637054B1 (https=) |
| CN (1) | CN102224647B (https=) |
| DE (1) | DE102008058436B4 (https=) |
| PL (1) | PL2347482T3 (https=) |
| WO (1) | WO2010057455A2 (https=) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009056387B9 (de) | 2009-10-30 | 2020-05-07 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaser mit einem Phasenstrukturbereich zur Selektion lateraler Lasermoden |
| DE102011075502A1 (de) * | 2011-05-09 | 2012-11-15 | Forschungsverbund Berlin E.V. | Breitstreifen-Diodenlaser mit hoher Effizienz und geringer Fernfelddivergenz |
| DE102011111604B4 (de) * | 2011-08-25 | 2023-01-19 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlungsemittierendes Halbleiterbauelement |
| DE102011055891B9 (de) | 2011-11-30 | 2017-09-14 | Osram Opto Semiconductors Gmbh | Halbleiterlaserdiode |
| DE102012110613A1 (de) * | 2012-11-06 | 2014-05-08 | Osram Opto Semiconductors Gmbh | Optoelektronisches Halbleiterbauelement |
| CN103557445A (zh) * | 2013-08-26 | 2014-02-05 | 中国科学院苏州纳米技术与纳米仿生研究所 | 侧边发射半导体发光器件、背光模组及面发光光源 |
| US9800020B2 (en) * | 2015-06-17 | 2017-10-24 | Ii-Vi Laser Enterprise Gmbh | Broad area laser including anti-guiding regions for higher-order lateral mode suppression |
| DE102016110790B4 (de) * | 2016-06-13 | 2022-01-13 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterlaserdiode |
| DE102016125430A1 (de) * | 2016-12-22 | 2018-06-28 | Osram Opto Semiconductors Gmbh | Oberflächenmontierbarer Halbleiterlaser, Anordnung mit einem solchen Halbleiterlaser und Betriebsverfahren hierfür |
| DE102017103789B4 (de) * | 2017-02-23 | 2024-02-22 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Laserdiode |
| DE102017122330B4 (de) * | 2017-09-26 | 2023-04-27 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiterlaserdiode und Halbleiterbauelement |
| CN110021877B (zh) * | 2018-01-10 | 2021-02-23 | 中国科学院苏州纳米技术与纳米仿生研究所 | 一种脊形波导半导体激光器及其制备方法 |
| RU2685434C1 (ru) * | 2018-02-05 | 2019-04-18 | Российская Федерация, от имени которой выступает ФОНД ПЕРСПЕКТИВНЫХ ИССЛЕДОВАНИЙ | Инжекционный лазер |
| DE102018123019A1 (de) * | 2018-09-19 | 2020-03-19 | Osram Opto Semiconductors Gmbh | Gewinngeführter halbleiterlaser und herstellungsverfahren hierfür |
| WO2020092290A1 (en) | 2018-10-30 | 2020-05-07 | Exceutas Canada, Inc. | Low inductance laser driver packaging using lead-frame and thin dielectric layer mask pad definition |
| WO2020092287A1 (en) | 2018-11-01 | 2020-05-07 | Excelitas Canada, Inc. | Quad flat no-leads package for side emitting laser diode |
| CN111361781A (zh) * | 2018-12-25 | 2020-07-03 | 海太半导体(无锡)有限公司 | 一种宽带激光器带再包装保存方法 |
| DE102019106805A1 (de) * | 2019-03-18 | 2020-09-24 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlungsemittierender halbleiterchip und strahlungsemittierendes halbleiterbauelement |
| DE102020108941B4 (de) * | 2020-03-31 | 2022-05-25 | Ferdinand-Braun-Institut gGmbH, Leibniz- Institut für Höchstfrequenztechnik | Diodenlaser mit verrringerter Strahldivergenz |
| CN115172331B (zh) * | 2021-04-06 | 2025-05-27 | 芯恩(青岛)集成电路有限公司 | 晶圆对准标记、制作方法、晶圆对准装置及晶圆对准方法 |
| DE102021122145A1 (de) * | 2021-08-26 | 2023-03-02 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung mindestens eines Laserchips und Laserchip |
| WO2023049297A1 (en) * | 2021-09-23 | 2023-03-30 | Freedom Photonics Llc | Segmented contact for current control in semiconductor lasers and optical amplifiers |
| CN120749530B (zh) * | 2025-09-02 | 2025-11-18 | 深圳市星汉激光科技股份有限公司 | 一种集成量子点阵列的可调谐激光芯片及制备方法 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4694459A (en) | 1985-05-31 | 1987-09-15 | Xerox Corporation | Hybrid gain/index guided semiconductor lasers and array lasers |
| US5272711A (en) | 1992-05-12 | 1993-12-21 | Trw Inc. | High-power semiconductor laser diode |
| US6122299A (en) | 1997-12-31 | 2000-09-19 | Sdl, Inc. | Angled distributed reflector optical device with enhanced light confinement |
| US20030147445A1 (en) | 2000-06-15 | 2003-08-07 | Zeitner Uwe Detlef | Laser resonators comprising mode-selective phase structures |
| US20030219053A1 (en) | 2002-05-21 | 2003-11-27 | The Board Of Trustees Of The University Of Illinois | Index guided laser structure |
| DE69730872T2 (de) | 1997-01-27 | 2005-09-29 | International Business Machines Corp. | Laservorrichtung |
| US20060193353A1 (en) | 2005-02-28 | 2006-08-31 | Samsung Electro-Mechanics Co., Ltd. | High power single mode semiconductor laser device and fabrication method thereof |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5513152B2 (https=) * | 1972-11-10 | 1980-04-07 | ||
| JPS5029283A (https=) * | 1973-07-19 | 1975-03-25 | ||
| CA2011155C (en) | 1989-03-06 | 1994-04-19 | Misuzu Sagawa | Semiconductor laser device |
| US5513200A (en) * | 1992-09-22 | 1996-04-30 | Xerox Corporation | Monolithic array of independently addressable diode lasers |
| JPH10215024A (ja) * | 1997-01-29 | 1998-08-11 | Alps Electric Co Ltd | 半導体レ−ザ |
| JPH11191654A (ja) * | 1997-12-26 | 1999-07-13 | Hitachi Ltd | 半導体レーザ装置及びその製造方法 |
| KR100580241B1 (ko) * | 1999-01-23 | 2006-05-16 | 삼성전자주식회사 | 표면광 레이저 어레이 및 그 제조방법 |
| UA73736C2 (en) | 1999-04-29 | 2005-09-15 | Euro Celtic S A | Method for alleviating or preventing insomnia and inducing anesthesia |
| US6757313B1 (en) * | 1999-11-12 | 2004-06-29 | Trumpf Photonics Inc. | Control of current spreading in semiconductor laser diodes |
| GB2397692B (en) | 2000-02-21 | 2004-09-22 | Sony Corp | Semiconductor laser emitting apparatus |
| JP4126878B2 (ja) | 2001-01-31 | 2008-07-30 | 日亜化学工業株式会社 | 窒化ガリウム系化合物半導体レーザ |
| JP2002305352A (ja) * | 2001-04-05 | 2002-10-18 | Fuji Photo Film Co Ltd | 半導体レーザ素子 |
| US7190843B2 (en) | 2002-02-01 | 2007-03-13 | Siemens Corporate Research, Inc. | Integrated approach to brightness and contrast normalization in appearance-based object detection |
| DE10208463B4 (de) | 2002-02-27 | 2012-04-05 | Osram Opto Semiconductors Gmbh | Halbleiterlaservorrichtung und Verfahren zu deren Herstellung |
| US7315559B2 (en) * | 2002-06-26 | 2008-01-01 | Ammono Sp. Z O.O. | Nitride semiconductor laser device and a method for improving its performance |
| KR100489479B1 (ko) * | 2003-02-17 | 2005-05-17 | 엘지전자 주식회사 | 반도체 레이저 다이오드 어레이 및 그 제조 방법 |
| US7512167B2 (en) * | 2004-09-24 | 2009-03-31 | Sanyo Electric Co., Ltd. | Integrated semiconductor laser device and method of fabricating the same |
| US7310358B2 (en) * | 2004-12-17 | 2007-12-18 | Palo Alto Research Center Incorporated | Semiconductor lasers |
| DE102006046297A1 (de) * | 2006-09-29 | 2008-04-03 | Osram Opto Semiconductors Gmbh | Halbleiterlaser |
| US7542496B2 (en) * | 2006-11-10 | 2009-06-02 | Ricoh Company, Ltd. | Semiconductor laser device, light scanner, and image forming apparatus |
| JP4817255B2 (ja) * | 2006-12-14 | 2011-11-16 | 富士通株式会社 | 光半導体素子及びその製造方法 |
| DE102008012859B4 (de) | 2007-12-21 | 2023-10-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Laserlichtquelle mit einer Filterstruktur |
| DE102008014093B4 (de) | 2007-12-27 | 2020-02-06 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaserchip mit zumindest einer Strombarriere |
| DE102008014092A1 (de) | 2007-12-27 | 2009-07-02 | Osram Opto Semiconductors Gmbh | Kantenemittierender Halbleiterlaserchip mit einem strukturierten Kontaktstreifen |
-
2008
- 2008-11-21 DE DE102008058436.3A patent/DE102008058436B4/de active Active
-
2009
- 2009-10-21 JP JP2011536734A patent/JP5528465B2/ja active Active
- 2009-10-21 KR KR1020117014107A patent/KR101637054B1/ko active Active
- 2009-10-21 PL PL09765010T patent/PL2347482T3/pl unknown
- 2009-10-21 US US13/127,887 patent/US8831061B2/en active Active
- 2009-10-21 WO PCT/DE2009/001482 patent/WO2010057455A2/de not_active Ceased
- 2009-10-21 EP EP09765010.5A patent/EP2347482B1/de active Active
- 2009-10-21 CN CN2009801468590A patent/CN102224647B/zh active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4694459A (en) | 1985-05-31 | 1987-09-15 | Xerox Corporation | Hybrid gain/index guided semiconductor lasers and array lasers |
| US5272711A (en) | 1992-05-12 | 1993-12-21 | Trw Inc. | High-power semiconductor laser diode |
| DE69730872T2 (de) | 1997-01-27 | 2005-09-29 | International Business Machines Corp. | Laservorrichtung |
| US6122299A (en) | 1997-12-31 | 2000-09-19 | Sdl, Inc. | Angled distributed reflector optical device with enhanced light confinement |
| US20030147445A1 (en) | 2000-06-15 | 2003-08-07 | Zeitner Uwe Detlef | Laser resonators comprising mode-selective phase structures |
| US20030219053A1 (en) | 2002-05-21 | 2003-11-27 | The Board Of Trustees Of The University Of Illinois | Index guided laser structure |
| US20060193353A1 (en) | 2005-02-28 | 2006-08-31 | Samsung Electro-Mechanics Co., Ltd. | High power single mode semiconductor laser device and fabrication method thereof |
Non-Patent Citations (1)
| Title |
|---|
| Baoxue et al., „Rhombus-like stripe BA InGaAs-AlGaAs-GaAs lasers", PTL 16, no. 5, 1248-1249 (2004) |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010057455A3 (de) | 2010-12-23 |
| US8831061B2 (en) | 2014-09-09 |
| EP2347482A2 (de) | 2011-07-27 |
| CN102224647A (zh) | 2011-10-19 |
| JP2012509580A (ja) | 2012-04-19 |
| EP2347482B1 (de) | 2017-01-25 |
| KR20110097856A (ko) | 2011-08-31 |
| DE102008058436A1 (de) | 2010-05-27 |
| JP5528465B2 (ja) | 2014-06-25 |
| US20110243169A1 (en) | 2011-10-06 |
| CN102224647B (zh) | 2013-09-18 |
| KR101637054B1 (ko) | 2016-07-06 |
| WO2010057455A2 (de) | 2010-05-27 |
| PL2347482T3 (pl) | 2017-07-31 |
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