DE102008054582A1 - Mikrolithographische Projektionsbelichtungsanlage - Google Patents

Mikrolithographische Projektionsbelichtungsanlage Download PDF

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Publication number
DE102008054582A1
DE102008054582A1 DE102008054582A DE102008054582A DE102008054582A1 DE 102008054582 A1 DE102008054582 A1 DE 102008054582A1 DE 102008054582 A DE102008054582 A DE 102008054582A DE 102008054582 A DE102008054582 A DE 102008054582A DE 102008054582 A1 DE102008054582 A1 DE 102008054582A1
Authority
DE
Germany
Prior art keywords
projection exposure
mirror
mirror array
mma
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102008054582A
Other languages
German (de)
English (en)
Inventor
Michael Layh
Markus DEGÜNTHER
Michael Patra
Johannes Wangler
Manfred Maul
Damian Fiolka
Gundula Weiss
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102008054582A priority Critical patent/DE102008054582A1/de
Publication of DE102008054582A1 publication Critical patent/DE102008054582A1/de
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
DE102008054582A 2007-12-21 2008-12-12 Mikrolithographische Projektionsbelichtungsanlage Withdrawn DE102008054582A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE102008054582A DE102008054582A1 (de) 2007-12-21 2008-12-12 Mikrolithographische Projektionsbelichtungsanlage

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US1591807P 2007-12-21 2007-12-21
US61/015,918 2007-12-21
DE102008008019.5 2008-02-07
DE102008008019 2008-02-07
DE102008054582A DE102008054582A1 (de) 2007-12-21 2008-12-12 Mikrolithographische Projektionsbelichtungsanlage

Publications (1)

Publication Number Publication Date
DE102008054582A1 true DE102008054582A1 (de) 2009-07-09

Family

ID=40719529

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102008054582A Withdrawn DE102008054582A1 (de) 2007-12-21 2008-12-12 Mikrolithographische Projektionsbelichtungsanlage

Country Status (8)

Country Link
US (4) US8891057B2 (https=)
EP (1) EP2238515B1 (https=)
JP (1) JP5366970B2 (https=)
KR (2) KR101681858B1 (https=)
CN (2) CN103558738B (https=)
DE (1) DE102008054582A1 (https=)
TW (1) TWI450049B (https=)
WO (1) WO2009080279A1 (https=)

Cited By (1)

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WO2018024872A1 (de) 2016-08-05 2018-02-08 Karlsruher Institut für Technologie Verfahren und vorrichtung zur lithographischen erzeugung einer zielstruktur an einer nicht-planaren ausgangsstruktur

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DE102008054582A1 (de) 2007-12-21 2009-07-09 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
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DE102011081825B4 (de) 2011-08-30 2013-10-10 Oculus Optikgeräte GmbH Ophthalmologisches Analysegerät und Verfahren
DE102011081827A1 (de) 2011-08-30 2013-02-28 Oculus Optikgeräte GmbH Ophthalmologisches Analysegerät und Verfahren
DE102012216284A1 (de) * 2011-09-27 2013-03-28 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage
CN104220931B (zh) * 2012-03-29 2016-10-12 卡尔蔡司Smt有限责任公司 补偿微光刻投射曝光系统的通道缺陷的设备及方法
CN102654734B (zh) * 2012-04-06 2014-06-04 北京理工大学 双吸收层交替相移l/s掩模锥形衍射场的计算方法
DE102012211846A1 (de) 2012-07-06 2013-08-01 Carl Zeiss Smt Gmbh Verfahren zum Messen einer winkelaufgelösten Intensitätsverteilung sowie Projektionsbelichtungsanlage
DE102012212758A1 (de) 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Systemkorrektur aus langen Zeitskalen
KR101591155B1 (ko) 2012-10-08 2016-02-02 칼 짜이스 에스엠티 게엠베하 마이크로리소그래픽 투영 노광 장치의 조명 시스템
EP2720072A1 (en) * 2012-10-12 2014-04-16 Vision Engineering Limited Optical instrument with diffractive element
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JP6183635B2 (ja) * 2012-12-25 2017-08-23 株式会社ニコン オプティカルインテグレータ、照明ユニット、伝送光学系、照明光学系、露光装置、およびデバイス製造方法
DE102013212613B4 (de) 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
JP6435131B2 (ja) * 2014-08-07 2018-12-05 株式会社Ｓｃｒｅｅｎホールディングス 光照射装置、描画装置および位相差生成器
DE102014219112A1 (de) 2014-09-23 2016-03-24 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie sowie Hohlwellenleiter-Komponente hierfür
CN107592919B (zh) 2015-05-13 2019-12-24 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备的照明系统
US10133187B2 (en) * 2015-05-29 2018-11-20 SCREEN Holdings Co., Ltd. Light irradiation apparatus and drawing apparatus
CN106547172B (zh) * 2015-09-17 2018-11-13 上海微电子装备（集团）股份有限公司 一种曝光装置
CN105589305B (zh) * 2015-12-21 2017-10-03 中国科学院长春光学精密机械与物理研究所 微缩投影系统波像差检测过程中的视场点定位方法
US10025093B2 (en) * 2016-04-13 2018-07-17 Microsoft Technology Licensing, Llc Waveguide-based displays with exit pupil expander
EP3559747B1 (de) * 2016-12-20 2026-03-18 EV Group E. Thallner GmbH Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht
US11079564B2 (en) * 2017-07-20 2021-08-03 Cymer, Llc Methods and apparatuses for aligning and diagnosing a laser beam
CN107179653B (zh) * 2017-07-20 2018-10-19 武汉华星光电技术有限公司 一种曝光机及其发光装置
EP3470872B1 (en) * 2017-10-11 2021-09-08 Melexis Technologies NV Sensor device
DE102017220586A1 (de) * 2017-11-17 2019-05-23 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage
KR102704440B1 (ko) * 2018-06-27 2024-09-09 삼성디스플레이 주식회사 빔 성형 광학 시스템 및 빔 성형 방법
CN111460652B (zh) * 2020-03-31 2023-09-22 齐鲁工业大学 一种实现目标面任意照度分布的方法
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CN116414010B (zh) * 2023-04-06 2024-04-26 上海镭望光学科技有限公司 一种自由光瞳产生装置及其产生自由光瞳照明的方法

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Publication number Priority date Publication date Assignee Title
WO2018024872A1 (de) 2016-08-05 2018-02-08 Karlsruher Institut für Technologie Verfahren und vorrichtung zur lithographischen erzeugung einer zielstruktur an einer nicht-planaren ausgangsstruktur
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US11630394B2 (en) 2016-08-05 2023-04-18 Karlsruhe Institute Of Technology Method and device for lithographically producing a target structure on a non-planar initial structure

Also Published As

Publication number Publication date
CN103558738B (zh) 2016-06-29
JP5366970B2 (ja) 2013-12-11
EP2238515A1 (en) 2010-10-13
US8891057B2 (en) 2014-11-18
CN103558738A (zh) 2014-02-05
EP2238515B1 (en) 2013-05-01
JP2011507293A (ja) 2011-03-03
US20100283985A1 (en) 2010-11-11
CN101946212B (zh) 2013-11-27
KR101681858B1 (ko) 2016-12-12
TWI450049B (zh) 2014-08-21
KR20100107014A (ko) 2010-10-04
US8724086B2 (en) 2014-05-13
KR101571181B1 (ko) 2015-12-04
KR20150082662A (ko) 2015-07-15
US20100283984A1 (en) 2010-11-11
US20140211188A1 (en) 2014-07-31
US20150177623A1 (en) 2015-06-25
WO2009080279A1 (en) 2009-07-02
TW200935187A (en) 2009-08-16
US10146135B2 (en) 2018-12-04
CN101946212A (zh) 2011-01-12

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Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE

R005 Application deemed withdrawn due to failure to request examination