DE102008000709B3 - Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung - Google Patents
Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung Download PDFInfo
- Publication number
- DE102008000709B3 DE102008000709B3 DE200810000709 DE102008000709A DE102008000709B3 DE 102008000709 B3 DE102008000709 B3 DE 102008000709B3 DE 200810000709 DE200810000709 DE 200810000709 DE 102008000709 A DE102008000709 A DE 102008000709A DE 102008000709 B3 DE102008000709 B3 DE 102008000709B3
- Authority
- DE
- Germany
- Prior art keywords
- hydrogen
- cleaning
- euv lithography
- heating wire
- cleaning module
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 71
- 238000001900 extreme ultraviolet lithography Methods 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims description 11
- 239000001257 hydrogen Substances 0.000 claims abstract description 33
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 33
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 30
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 claims abstract description 29
- 238000010438 heat treatment Methods 0.000 claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 3
- 238000001816 cooling Methods 0.000 claims description 6
- 230000005684 electric field Effects 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 abstract description 19
- 238000011109 contamination Methods 0.000 description 12
- 238000010884 ion-beam technique Methods 0.000 description 11
- 230000005855 radiation Effects 0.000 description 10
- -1 hydrogen ions Chemical class 0.000 description 8
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000029305 taxis Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200810000709 DE102008000709B3 (de) | 2008-03-17 | 2008-03-17 | Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung |
| JP2011500136A JP5010047B2 (ja) | 2008-03-17 | 2009-02-05 | 洗浄モジュール，ｅｕｖリソグラフィ装置及びそれらの洗浄方法 |
| PCT/EP2009/051330 WO2009115370A1 (de) | 2008-03-17 | 2009-02-05 | Reinigungsmodul, euv-lithographievorrichtung und verfahren zu ihrer reinigung |
| US12/883,247 US9046794B2 (en) | 2008-03-17 | 2010-09-16 | Cleaning module, EUV lithography device and method for the cleaning thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200810000709 DE102008000709B3 (de) | 2008-03-17 | 2008-03-17 | Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102008000709B3 true DE102008000709B3 (de) | 2009-11-26 |
Family
ID=40635823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE200810000709 Expired - Fee Related DE102008000709B3 (de) | 2008-03-17 | 2008-03-17 | Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9046794B2 (ja) |
| JP (1) | JP5010047B2 (ja) |
| DE (1) | DE102008000709B3 (ja) |
| WO (1) | WO2009115370A1 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010030023A1 (de) * | 2010-06-14 | 2011-12-15 | Carl Zeiss Smt Gmbh | Optisches System |
| DE102012107105A1 (de) * | 2012-08-02 | 2013-09-19 | Asml Netherlands B.V. | Reinigungsverfahren für projektionsbelichtungsanlagen und entsprechend ausgebildete projektionsbelichtungsanlagen |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010044970A1 (de) * | 2010-09-10 | 2011-12-22 | Carl Zeiss Smt Gmbh | Reinigungsmodul für Komponenten von Halbleiterlithographieanlagen und Halbleiterlithographieanlagen |
| US8399868B2 (en) * | 2011-02-15 | 2013-03-19 | Sematech Inc. | Tools, methods and devices for mitigating extreme ultraviolet optics contamination |
| JP5302450B2 (ja) * | 2012-09-20 | 2013-10-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学面から汚染層を除去するための方法、洗浄ガスを生成するための方法、ならびに対応する洗浄および洗浄ガス生成の構造 |
| US9776218B2 (en) | 2015-08-06 | 2017-10-03 | Asml Netherlands B.V. | Controlled fluid flow for cleaning an optical element |
| DE102016208850A1 (de) * | 2016-05-23 | 2017-12-07 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Halbleiterlithographie mit Elementen zur Plasmakonditionierung |
| DE102017216679A1 (de) | 2017-09-20 | 2019-03-21 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage |
| US10656539B2 (en) * | 2017-11-21 | 2020-05-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Radiation source for lithography process |
| EP3533900A1 (en) * | 2018-03-02 | 2019-09-04 | Stichting Nederlandse Wetenschappelijk Onderzoek Instituten | Method and apparatus for forming a patterned layer of carbon |
| KR20200133126A (ko) * | 2019-05-17 | 2020-11-26 | 삼성전자주식회사 | 소스 용기용 잔류물 제거 장치 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040011381A1 (en) * | 2002-07-17 | 2004-01-22 | Klebanoff Leonard E. | Method for removing carbon contamination from optic surfaces |
| US20060115771A1 (en) * | 2004-10-04 | 2006-06-01 | Asml Netherlands B.V. | Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
| US20060163500A1 (en) * | 2005-01-24 | 2006-07-27 | Ushiodenki Kabushiki Kaisha | Extreme UV radiation source device and method for eliminating debris which forms within the device |
| US20060175558A1 (en) * | 2005-02-07 | 2006-08-10 | Asml Netherlands B.V. | Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| WO2008034582A2 (en) * | 2006-09-19 | 2008-03-27 | Carl Zeiss Smt Ag | Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3458743A (en) * | 1966-12-19 | 1969-07-29 | Radiation Dynamics | Positive ion source for use with a duoplasmatron |
| US4737637A (en) * | 1986-10-15 | 1988-04-12 | Hughes Aircraft Company | Mass separator for ionized cluster beam |
| JPH05279884A (ja) | 1992-04-02 | 1993-10-26 | Sumitomo Electric Ind Ltd | シンクロトロン放射光用の鏡の清浄方法 |
| US6192897B1 (en) * | 1999-01-27 | 2001-02-27 | Euv Llc | Apparatus and method for in-situ cleaning of resist outgassing windows |
| US20020053353A1 (en) * | 2000-03-13 | 2002-05-09 | Shintaro Kawata | Methods and apparatus for cleaning an object using an electron beam, and device-fabrication apparatus comprising same |
| US7150811B2 (en) * | 2002-11-26 | 2006-12-19 | Pei Company | Ion beam for target recovery |
| DE60323927D1 (de) * | 2002-12-13 | 2008-11-20 | Asml Netherlands Bv | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
| EP1429189B1 (en) * | 2002-12-13 | 2008-10-08 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR100737759B1 (ko) * | 2002-12-20 | 2007-07-10 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 투영장치의 구성요소의 표면을 세정하는 방법, 리소그래피 투영장치, 디바이스 제조방법, 및 세정장치 |
| SG135934A1 (en) * | 2002-12-20 | 2007-10-29 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| WO2004104707A2 (de) * | 2003-05-22 | 2004-12-02 | Philips Intellectual Property & Standards Gmbh | Verfahren und vorrichtung zum reinigen mindestens einer optischen komponente |
| EP1896904B1 (en) | 2005-06-21 | 2012-09-19 | Philips Intellectual Property & Standards GmbH | Method of cleaning optical surfaces of an irradiation unit in a two-step process |
| US7372058B2 (en) | 2005-09-27 | 2008-05-13 | Asml Netherlands B.V. | Ex-situ removal of deposition on an optical element |
| US7372049B2 (en) | 2005-12-02 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus including a cleaning device and method for cleaning an optical element |
| US7495239B2 (en) | 2005-12-22 | 2009-02-24 | Asml Netherlands B.V. | Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
| JP2007220949A (ja) * | 2006-02-17 | 2007-08-30 | Ushio Inc | 極端紫外光光源装置および極端紫外光光源装置における集光光学手段の汚染抑制方法 |
| US7671347B2 (en) * | 2006-10-10 | 2010-03-02 | Asml Netherlands B.V. | Cleaning method, apparatus and cleaning system |
| KR20140097574A (ko) * | 2007-11-06 | 2014-08-06 | 칼 짜이스 에스엠티 게엠베하 | 광학면으로부터 오염층을 제거하는 방법, 세정 가스를 생성하는 방법 및 대응하는 세정 및 세정 가스 생성 장치들 |
| WO2009121385A1 (en) * | 2008-04-03 | 2009-10-08 | Carl Zeiss Smt Ag | Cleaning module and euv lithography device with cleaning module |
| DE102008028868A1 (de) * | 2008-06-19 | 2009-12-24 | Carl Zeiss Smt Ag | Optische Baugruppe |
-
2008
- 2008-03-17 DE DE200810000709 patent/DE102008000709B3/de not_active Expired - Fee Related
-
2009
- 2009-02-05 JP JP2011500136A patent/JP5010047B2/ja not_active Expired - Fee Related
- 2009-02-05 WO PCT/EP2009/051330 patent/WO2009115370A1/de active Application Filing
-
2010
- 2010-09-16 US US12/883,247 patent/US9046794B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040011381A1 (en) * | 2002-07-17 | 2004-01-22 | Klebanoff Leonard E. | Method for removing carbon contamination from optic surfaces |
| US20060115771A1 (en) * | 2004-10-04 | 2006-06-01 | Asml Netherlands B.V. | Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
| US20060163500A1 (en) * | 2005-01-24 | 2006-07-27 | Ushiodenki Kabushiki Kaisha | Extreme UV radiation source device and method for eliminating debris which forms within the device |
| US20060175558A1 (en) * | 2005-02-07 | 2006-08-10 | Asml Netherlands B.V. | Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| WO2008034582A2 (en) * | 2006-09-19 | 2008-03-27 | Carl Zeiss Smt Ag | Optical arrangement, in particular projection exposure apparatus for euv lithography, as well as reflective optical element with reduced contamination |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010030023A1 (de) * | 2010-06-14 | 2011-12-15 | Carl Zeiss Smt Gmbh | Optisches System |
| US8546776B2 (en) | 2010-06-14 | 2013-10-01 | Carl Zeiss Smt Gmbh | Optical system for EUV lithography with a charged-particle source |
| DE102012107105A1 (de) * | 2012-08-02 | 2013-09-19 | Asml Netherlands B.V. | Reinigungsverfahren für projektionsbelichtungsanlagen und entsprechend ausgebildete projektionsbelichtungsanlagen |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5010047B2 (ja) | 2012-08-29 |
| WO2009115370A1 (de) | 2009-09-24 |
| US20110043774A1 (en) | 2011-02-24 |
| JP2011514687A (ja) | 2011-05-06 |
| US9046794B2 (en) | 2015-06-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE |
|
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |